Masahito Hamada

Person

Koshi-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical liquid discharge mechanism, liquid processing apparatus, c...
- Patent number 10,755,952
- Issue date Aug 25, 2020
- Tokyo Electron Limited
- Norihiko Sasagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical liquid discharge mechanism, liquid processing apparatus, c...
- Patent number 10,074,548
- Issue date Sep 11, 2018
- Tokyo Electron Limited
- Norihiko Sasagawa
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Film removing device and film removing method
- Patent number 8,343,284
- Issue date Jan 1, 2013
- Tokyo Electron Limited
- Shigenori Kamei
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Coating and processing apparatus and method
- Patent number 8,277,884
- Issue date Oct 2, 2012
- Tokyo Electron Limited
- Shinji Kobayashi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Film removing device and film removing method
- Patent number 8,016,976
- Issue date Sep 13, 2011
- Tokyo Electron Limited
- Shigenori Kamei
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 7,927,657
- Issue date Apr 19, 2011
- Tokyo Electron Limited
- Shinji Kobayashi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Development processing device
- Patent number 7,819,594
- Issue date Oct 26, 2010
- Tokyo Electron Limited
- Hideo Funakoshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating and processing apparatus and method
- Patent number 7,615,117
- Issue date Nov 10, 2009
- Tokyo Electron Limited
- Shinji Kobayashi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 7,566,365
- Issue date Jul 28, 2009
- Tokyo Electron Limited
- Shinji Kobayashi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Coating treatment apparatus and coating treatment method
- Patent number 7,553,374
- Issue date Jun 30, 2009
- Tokyo Electron Limited
- Masahito Hamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Developing apparatus and method thereof
- Patent number 6,312,171
- Issue date Nov 6, 2001
- Tokyo Electron Limited
- Yuji Matsuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL LIQUID DISCHARGE MECHANISM, LIQUID PROCESSING APPARATUS, C...
- Publication number 20180350633
- Publication date Dec 6, 2018
- TOKYO ELECTRON LIMITED
- Norihiko Sasagawa
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
CHEMICAL LIQUID DISCHARGE MECHANISM, LIQUID PROCESSING APPARATUS, C...
- Publication number 20160008840
- Publication date Jan 14, 2016
- TOKYO ELECTRON LIMITED
- Norihiko Sasagawa
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
FILM REMOVING DEVICE AND FILM REMOVING METHOD
- Publication number 20110247659
- Publication date Oct 13, 2011
- TOKYO ELECTRON LIMITED
- Shigenori Kamei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING AND PROCESSING APPARATUS AND METHOD
- Publication number 20100034969
- Publication date Feb 11, 2010
- Shinji Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
- Publication number 20090263577
- Publication date Oct 22, 2009
- TOKYO ELECTRON LIMITED
- Shinji Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Development processing device
- Publication number 20080176172
- Publication date Jul 24, 2008
- TOKYO ELECTRON LIMITED
- Hideo Funakoshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM REMOVING DEVICE AND FILM REMOVING METHOD
- Publication number 20080041523
- Publication date Feb 21, 2008
- TOKYO ELECTRON LIMITED
- Shigenori Kamei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Coating treatment apparatus and coating treatment method
- Publication number 20050181127
- Publication date Aug 18, 2005
- TOKYO ELECTRON LIMITED
- Masahito Hamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid processing apparatus and liquid processing method
- Publication number 20040180142
- Publication date Sep 16, 2004
- TOKYO ELECTRON LIMITED
- Shinji Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Coating and processing apparatus and method
- Publication number 20040180141
- Publication date Sep 16, 2004
- Shinji Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masahito Hamada

Person

Patents Grantslast 30 patents

Chemical liquid discharge mechanism, liquid processing apparatus, c...

Chemical liquid discharge mechanism, liquid processing apparatus, c...

Film removing device and film removing method

Coating and processing apparatus and method

Film removing device and film removing method

Liquid processing apparatus and liquid processing method

Development processing device

Coating and processing apparatus and method

Liquid processing apparatus and liquid processing method

Coating treatment apparatus and coating treatment method

Developing apparatus and method thereof

Patents Applicationslast 30 patents

CHEMICAL LIQUID DISCHARGE MECHANISM, LIQUID PROCESSING APPARATUS, C...

CHEMICAL LIQUID DISCHARGE MECHANISM, LIQUID PROCESSING APPARATUS, C...

FILM REMOVING DEVICE AND FILM REMOVING METHOD

COATING AND PROCESSING APPARATUS AND METHOD

LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

Development processing device

FILM REMOVING DEVICE AND FILM REMOVING METHOD

Coating treatment apparatus and coating treatment method

Liquid processing apparatus and liquid processing method

Coating and processing apparatus and method