Masahito Ishihara

Person

  • Fuchu, JP

Patents Grantslast 30 patents

  • Information Patent Grant

    Deposition apparatus

    • Patent number 10,738,380
    • Issue date Aug 11, 2020
    • Canon Anelva Corporation
    • Naoyuki Nozawa
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Electrostatic chuck device

    • Patent number 7,848,077
    • Issue date Dec 7, 2010
    • Canon Anelva Corporation
    • Shigeru Mizuno
    • H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
  • Information Patent Grant

    Electrostatic chuck device

    • Patent number 7,791,857
    • Issue date Sep 7, 2010
    • Canon Anelva Corporation
    • Shigeru Mizuno
    • H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
  • Information Patent Grant

    Electrostatic chuck device

    • Patent number 7,724,493
    • Issue date May 25, 2010
    • Canon Anelva Corporation
    • Shigeru Mizuno
    • H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
  • Information Patent Grant

    Electrostatic chuck device

    • Patent number 7,623,334
    • Issue date Nov 24, 2009
    • Canon Anelva Corporation
    • Shigeru Mizuno
    • H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
  • Information Patent Grant

    Device for fixing a gas showerhead or target plate to an electrode...

    • Patent number 7,159,537
    • Issue date Jan 9, 2007
    • Anelva Corporation
    • Sunil Wickramanayaka
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Substrate heating apparatus and multi-chamber substrate processing...

    • Patent number 7,019,263
    • Issue date Mar 28, 2006
    • Anelva Corporation
    • Masahito Ishihara
    • F27 - FURNACES KILNS OVENS RETORTS
  • Information Patent Grant

    Substrate processing apparatus

    • Patent number 6,129,046
    • Issue date Oct 10, 2000
    • Anelva Corporation
    • Shigeru Mizuno
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Substrate processing apparatus

    • Patent number 6,070,552
    • Issue date Jun 6, 2000
    • Anelva Corporation
    • Shigeru Mizuno
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Method of depositing thin films by plasma-enhanced chemical vapor d...

    • Patent number 5,956,616
    • Issue date Sep 21, 1999
    • Anelva Corporation
    • Shigeru Mizuno
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Sputtering apparatus

    • Patent number 5,944,968
    • Issue date Aug 31, 1999
    • Anelva Corporation
    • Masahiko Kobayashi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Multichamber sputtering apparatus

    • Patent number 5,925,227
    • Issue date Jul 20, 1999
    • Anelva Corporation
    • Masahiko Kobayashi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    CVD apparatus

    • Patent number 5,624,499
    • Issue date Apr 29, 1997
    • Anelva Corporation
    • Shigeru Mizuno
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

  • Information Patent Application

    DEPOSITION APPARATUS

    • Publication number 20170211179
    • Publication date Jul 27, 2017
    • Canon ANELVA Corporation
    • Naoyuki NOZAWA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Electrostatic chuck device

    • Publication number 20100046134
    • Publication date Feb 25, 2010
    • Canon ANELVA Corporation
    • Shigeru Mizuno
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Thin-Film Deposition System

    • Publication number 20090229971
    • Publication date Sep 17, 2009
    • Canon ANELVA Corporation
    • Masahito Ishihara
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Electrostatic chuck device

    • Publication number 20090122459
    • Publication date May 14, 2009
    • ANELVA CORPORATION
    • Shigeru Mizuno
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Electrostatic chuck device

    • Publication number 20090059462
    • Publication date Mar 5, 2009
    • ANELVA CORPORATION
    • Shigeru Mizuno
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Electrostatic chuck device

    • Publication number 20060158823
    • Publication date Jul 20, 2006
    • ANELVA CORPORATION
    • Shigeru Mizuno
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Thin-film deposition system

    • Publication number 20050045101
    • Publication date Mar 3, 2005
    • Masahito Ishihara
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Substrate heating apparatus and multi-chamber substrate processing...

    • Publication number 20050045616
    • Publication date Mar 3, 2005
    • Masahito Ishihara
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Device for fixing a gas showerhead or target plate to an electrode...

    • Publication number 20050028935
    • Publication date Feb 10, 2005
    • ANELVA CORPORATION
    • Sunil Wickramanayaka
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Electrostatic chuck device

    • Publication number 20040040665
    • Publication date Mar 4, 2004
    • ANELVA CORPORATION
    • Shigeru Mizuno
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    MULTICHAMBER SUBSTRATE PROCESSING APPARATUS

    • Publication number 20010052392
    • Publication date Dec 20, 2001
    • MASAHIKO NAKAMURA
    • H01 - BASIC ELECTRIC ELEMENTS