Masahito Tanabe

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Rinsing solution for lithography and method for processing substrat...
- Patent number 6,815,151
- Issue date Nov 9, 2004
- Tokyo Ohika Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist stripping liquid compositions and a method of stripping...
- Patent number 6,291,142
- Issue date Sep 18, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Post-ashing treating liquid compositions and a process for treatmen...
- Patent number 6,261,745
- Issue date Jul 17, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist stripping liquid compositions and a method of stripping...
- Patent number 6,225,034
- Issue date May 1, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Post-ashing treating method for substrates
- Patent number 6,225,030
- Issue date May 1, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist stripping liquid composition and a method of stripping...
- Patent number 6,218,087
- Issue date Apr 17, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid coating composition for use in forming antireflective film a...
- Patent number 6,136,505
- Issue date Oct 24, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating solution for forming antireflective coating film
- Patent number 6,132,928
- Issue date Oct 17, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treatment method
- Patent number 6,068,000
- Issue date May 30, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for treating a lithographic substrate and a rinse solution...
- Patent number 5,968,848
- Issue date Oct 19, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Remover solution composition for resist and method for removing res...
- Patent number 5,905,063
- Issue date May 18, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist stripping liquid compositions and a method of stripping...
- Patent number 5,795,702
- Issue date Aug 18, 1998
- Tokyo Ohka Kogyo Co, Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Remover solution composition for resist and method for removing res...
- Patent number 5,792,274
- Issue date Aug 11, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Composition of photoresist remover effective against etching residu...
- Publication number 20020146647
- Publication date Oct 10, 2002
- NEC CORPORATION, TOKYO OHKA KOGYO CO., LTD.
- Hidemitsu Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Rinsing solution for lithography and method for processing substrat...
- Publication number 20010038976
- Publication date Nov 8, 2001
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masahito Tanabe

Person

Patents Grantslast 30 patents

Rinsing solution for lithography and method for processing substrat...

Photoresist stripping liquid compositions and a method of stripping...

Post-ashing treating liquid compositions and a process for treatmen...

Photoresist stripping liquid compositions and a method of stripping...

Post-ashing treating method for substrates

Photoresist stripping liquid composition and a method of stripping...

Liquid coating composition for use in forming antireflective film a...

Coating solution for forming antireflective coating film

Substrate treatment method

Process for treating a lithographic substrate and a rinse solution...

Remover solution composition for resist and method for removing res...

Photoresist stripping liquid compositions and a method of stripping...

Remover solution composition for resist and method for removing res...

Patents Applicationslast 30 patents

Composition of photoresist remover effective against etching residu...

Rinsing solution for lithography and method for processing substrat...