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Masahito Yahagi
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Patents Grants
last 30 patents
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
12,099,298
Issue date
Sep 24, 2024
Tokyo Ohka Kogyo Co., Ltd.
Masaru Takeshita
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,693,313
Issue date
Jul 4, 2023
Tokyo Ohka Kogyo Co., Ltd.
Masahito Yahagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,656,549
Issue date
May 23, 2023
Tokyo Ohka Kogyo Co., Ltd.
Masahito Yahagi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,586,111
Issue date
Feb 21, 2023
Tokyo Ohka Kogyo Co., Ltd.
Yasuhiro Yoshii
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,392,033
Issue date
Jul 19, 2022
Tokyo Ohka Kogyo Co., Ltd.
Hitoshi Yamano
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,372,329
Issue date
Jun 28, 2022
Tokyo Ohka Kogyo Co., Ltd.
Masahito Yahagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,275,306
Issue date
Mar 15, 2022
Tokyo Ohka Kogyo Co., Ltd.
Takahiro Kojima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method for forming resist pattern
Patent number
11,204,551
Issue date
Dec 21, 2021
Tokyo Ohka Kogyo Co., Ltd.
Masahito Yahagi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,187,981
Issue date
Nov 30, 2021
Tokyo Ohka Kogyo Co., Ltd.
Yoichi Hori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition, method of forming resist pattern, and polymer c...
Patent number
10,976,661
Issue date
Apr 13, 2021
Tokyo Ohka Kogyo Co., Ltd.
Hiroto Yamazaki
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
10,606,174
Issue date
Mar 31, 2020
Tokyo Ohka Kogyo Co., Ltd.
Masahito Yahagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition, method for forming resist pattern, compound, an...
Patent number
10,394,122
Issue date
Aug 27, 2019
TOYKO OHKA KOGYO CO., LTD.
Issei Suzuki
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Resist composition and method for forming resist pattern
Patent number
10,241,406
Issue date
Mar 26, 2019
Tokyo Ohka Kogyo Co., Ltd.
Masahito Yahagi
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
10,101,658
Issue date
Oct 16, 2018
Tokyo Ohka Kogyo Co., Ltd.
Taku Hirayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of producing structure containing phase-separated structure...
Patent number
10,066,096
Issue date
Sep 4, 2018
Tokyo Ohka Kogyo Co., Ltd.
Tsuyoshi Kurosawa
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Resist pattern forming method and developer for lithography
Patent number
9,964,851
Issue date
May 8, 2018
Tokyo Ohka Kogyo Co., Ltd.
Kazufumi Sato
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of producing structure containing phase-separated structure...
Patent number
9,821,338
Issue date
Nov 21, 2017
TOKYO OHKA KOGYO., LTD.
Hitoshi Yamano
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Brush composition, and method of producing structure containing pha...
Patent number
9,776,208
Issue date
Oct 3, 2017
Tokyo Ohka Kogyo Co., Ltd.
Masahito Yahagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
8,883,396
Issue date
Nov 11, 2014
Tokyo Ohka Kogyo Co., Ltd.
Masahito Yahagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition and method of forming resist pattern
Patent number
8,586,281
Issue date
Nov 19, 2013
Tokyo Ohka Kogyo Co., Ltd.
Jun Iwashita
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20220179314
Publication date
Jun 9, 2022
Tokyo Ohka Kogyo Co., Ltd.
Rin ODASHIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20220179306
Publication date
Jun 9, 2022
Tokyo Ohka Kogyo Co., Ltd.
Rin ODASHIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20220179313
Publication date
Jun 9, 2022
Tokyo Ohka Kogyo Co., Ltd.
Masahito YAHAGI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20220121116
Publication date
Apr 21, 2022
Tokyo Ohka Kogyo Co., Ltd.
Koshi ONISHI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20220121118
Publication date
Apr 21, 2022
Tokyo Ohka Kogyo Co., Ltd.
Masahito YAHAGI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20220107565
Publication date
Apr 7, 2022
Tokyo Ohka Kogyo Co., Ltd.
Masaru TAKESHITA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210149303
Publication date
May 20, 2021
Tokyo Ohka Kogyo Co., Ltd.
Takahiro KOJIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210149302
Publication date
May 20, 2021
Tokyo Ohka Kogyo Co., Ltd.
Masahito YAHAGI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210132495
Publication date
May 6, 2021
Tokyo Ohka Kogyo Co., Ltd.
Masahito Yahagi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20200183275
Publication date
Jun 11, 2020
Tokyo Ohka Kogyo Co., Ltd.
Takahiro KOJIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20200174369
Publication date
Jun 4, 2020
Tokyo Ohka Kogyo Co., Ltd.
Yasuhiro YOSHII
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20200159118
Publication date
May 21, 2020
Tokyo Ohka Kogyo Co., Ltd.
Tatsuya FUJII
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20200150531
Publication date
May 14, 2020
Tokyo Ohka Kogyo Co., Ltd.
Yoichi HORI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20200142303
Publication date
May 7, 2020
Tokyo Ohka Kogyo Co., Ltd.
Masahito YAHAGI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20190204738
Publication date
Jul 4, 2019
Tokyo Ohka Kogyo Co., Ltd.
Hitoshi YAMANO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20190196330
Publication date
Jun 27, 2019
Tokyo Ohka Kogyo Co., Ltd.
Yoichi HORI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER C...
Publication number
20190018319
Publication date
Jan 17, 2019
Tokyo Ohka Kogyo Co., Ltd.
Hiroto YAMAZAKI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20180210338
Publication date
Jul 26, 2018
Tokyo Ohka Kogyo Co., Ltd.
Masahito YAHAGI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Publication number
20170371241
Publication date
Dec 28, 2017
Tokyo Ohka Kogyo Co., Ltd.
Masahito YAHAGI
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Publication number
20170369697
Publication date
Dec 28, 2017
Tokyo Ohka Kogyo Co., Ltd.
Masahito YAHAGI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...
Publication number
20170369698
Publication date
Dec 28, 2017
Tokyo Ohka Kogyo Co., Ltd.
Issei SUZUKI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST PATTERN FORMING METHOD AND DEVELOPER FOR LITHOGRAPHY
Publication number
20170059994
Publication date
Mar 2, 2017
Tokyo Ohka Kogyo Co., Ltd.
Kazufumi SATO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE...
Publication number
20160280906
Publication date
Sep 29, 2016
Tokyo Ohka Kogyo Co., Ltd.
Tsuyoshi KUROSAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20160209745
Publication date
Jul 21, 2016
Tokyo Ohka Kogyo Co., Ltd.
Taku HIRAYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
BRUSH COMPOSITION AND METHOD OF PRODUCING STRUCTURE CONTAINING PHAS...
Publication number
20160194524
Publication date
Jul 7, 2016
Tokyo Ohka Kogyo Co., Ltd.
Hitoshi YAMANO
B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information
Patent Application
BRUSH COMPOSITION, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHA...
Publication number
20160194751
Publication date
Jul 7, 2016
Tokyo Ohka Kogyo Co., Ltd.
Masahito YAHAGI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND HIGH-MOL...
Publication number
20140186769
Publication date
Jul 3, 2014
Tokyo Ohka Kogyo Co., Ltd.
Takaaki Kaiho
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20130337387
Publication date
Dec 19, 2013
Tokyo Ohta Kogyo Co., Ltd.
Masahito Yahagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20130137048
Publication date
May 30, 2013
Tokyo Ohka Kogyo Co., Ltd.
Masahito Yahagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN
Publication number
20130095427
Publication date
Apr 18, 2013
Tokyo Ohka Kogyo Co., Ltd.
Masahito Yahagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY