Masakazu Kato

Person

Toyama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist underlayer film forming composition for lithography containi...
- Patent number 9,746,772
- Issue date Aug 29, 2017
- Nissan Chemical Industries, Ltd.
- Hiroaki Okuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film forming composition containing low molecular...
- Patent number 9,645,494
- Issue date May 9, 2017
- Nissan Chemical Industries, Ltd.
- Masakazu Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming organic hard mask layer for use in lithogra...
- Patent number 9,514,949
- Issue date Dec 6, 2016
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming a resist underlayer film including hydroxyl...
- Patent number 9,263,285
- Issue date Feb 16, 2016
- Nissan Chemical Industries, Ltd.
- Tetsuya Shinjo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive photosensitive polyimide resin composition
- Patent number 7,026,080
- Issue date Apr 11, 2006
- Nissan Chemical Industries, Ltd.
- Tomonari Nakayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINI...
- Publication number 20160320704
- Publication date Nov 3, 2016
- Nissan Chemical Industries, Ltd.
- Hiroaki OKUYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING ORGANIC HARD MASK LAYER FOR USE IN LITHOGRA...
- Publication number 20140106570
- Publication date Apr 17, 2014
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING A RESIST UNDERLAYER FILM INCLUDING HYDROXYL...
- Publication number 20130280913
- Publication date Oct 24, 2013
- Nissan Chemical Industries, Ltd.
- Tetsuya Shinjo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINI...
- Publication number 20130189533
- Publication date Jul 25, 2013
- Nissan Chemical Industries, Ltd.
- Hiroaki Okuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LOW MOLECULAR...
- Publication number 20100075253
- Publication date Mar 25, 2010
- NISSAN CHEMICAL INDUSTRIES , LTD.
- Masakazu Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photosensitive polyimide resin composition
- Publication number 20040197699
- Publication date Oct 7, 2004
- Tomonari Nakayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Masakazu Kato

Person

Patents Grantslast 30 patents

Resist underlayer film forming composition for lithography containi...

Resist underlayer film forming composition containing low molecular...

Composition for forming organic hard mask layer for use in lithogra...

Composition for forming a resist underlayer film including hydroxyl...

Positive photosensitive polyimide resin composition

Patents Applicationslast 30 patents

RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINI...

COMPOSITION FOR FORMING ORGANIC HARD MASK LAYER FOR USE IN LITHOGRA...

COMPOSITION FOR FORMING A RESIST UNDERLAYER FILM INCLUDING HYDROXYL...

RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINI...

RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LOW MOLECULAR...

Positive photosensitive polyimide resin composition