Masaki ENZU

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Compound, thin-film forming raw material that contains said compoun...
- Patent number 12,104,245
- Issue date Oct 1, 2024
- Adeka Corporation
- Atsushi Sakurai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ruthenium compound, raw material for forming thin film, and method...
- Patent number 11,760,771
- Issue date Sep 19, 2023
- Adeka Corporation
- Tomoharu Yoshino
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for producing metallic ruthenium thin film by atomic layer d...
- Patent number 11,408,069
- Issue date Aug 9, 2022
- Adeka Corporation
- Akihiro Nishida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Diazadienyl compound, raw material for forming thin film, and metho...
- Patent number 10,920,313
- Issue date Feb 16, 2021
- Adeka Corporation
- Tomoharu Yoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Alkoxide compound, raw material for forming thin film, method for m...
- Patent number 10,351,584
- Issue date Jul 16, 2019
- Adeka Corporation
- Atsushi Sakurai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Compound, thin film-forming material, and thin film manufacturing m...
- Patent number 10,253,408
- Issue date Apr 9, 2019
- Adeka Corporation
- Tomoharu Yoshino
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Ruthenium compound, material for thin film formation, and process f...
- Patent number 10,167,304
- Issue date Jan 1, 2019
- Adeka Corporation
- Masako Hatase
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Alkoxide compound, thin film-forming starting material, and thin fi...
- Patent number 10,011,623
- Issue date Jul 3, 2018
- Adeka Corporation
- Atsushi Sakurai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Copper compound, starting material for forming thin film, and metho...
- Patent number 9,994,593
- Issue date Jun 12, 2018
- Adeka Corporation
- Tomoharu Yoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
THIN-FILM FORMING MATERIAL FOR USE IN ATOMIC LAYER DEPOSITION, THIN...
- Publication number 20250019820
- Publication date Jan 16, 2025
- ADEKA CORPORATION
- Ryota FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REACTIVE MATERIAL AND METHOD OF PRODUCING THIN-FILM
- Publication number 20240360558
- Publication date Oct 31, 2024
- ADEKA CORPORATION
- Masaki ENZU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDIUM COMPOUND, THIN-FILM FORMING RAW MATERIAL, THIN FILM, AND MET...
- Publication number 20240060177
- Publication date Feb 22, 2024
- ADEKA CORPORATION
- Keisuke TAKEDA
- C01 - INORGANIC CHEMISTRY
Information Patent Application
THIN-FILM FORMING RAW MATERIAL USED IN ATOMIC LAYER DEPOSITION METH...
- Publication number 20230151220
- Publication date May 18, 2023
- ADEKA CORPORATION
- Keisuke TAKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ZINC COMPOUND, THIN-FILM FORMING RAW MATERIAL, THIN-FILM, AND METHO...
- Publication number 20230142848
- Publication date May 11, 2023
- ADEKA CORPORATION
- Ryota FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOVEL COMPOUND, THIN-FILM FORMING RAW MATERIAL THAT CONTAINS SAID C...
- Publication number 20220389570
- Publication date Dec 8, 2022
- ADEKA CORPORATION
- Atsushi SAKURAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RUTHENIUM COMPOUND, THIN-FILM FORMING RAW MATERIAL, AND METHOD OF P...
- Publication number 20220372056
- Publication date Nov 24, 2022
- ADEKA CORPORATION
- Masaki ENZU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PRODUCING METALLIC RUTHENIUM THIN FILM BY ATOMIC LAYER D...
- Publication number 20220002867
- Publication date Jan 6, 2022
- ADEKA CORPORATION
- Akihiro NISHIDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RAW MATERIAL FOR FORMING THIN FILM BY ATOMIC LAYER DEPOSITION METHO...
- Publication number 20210155638
- Publication date May 27, 2021
- ADEKA CORPORATION
- Masaki ENZU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RUTHENIUM COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, AND METHOD...
- Publication number 20200262854
- Publication date Aug 20, 2020
- ADEKA CORPORATION
- Tomoharu YOSHINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAZADIENYL COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, AND METHO...
- Publication number 20190185994
- Publication date Jun 20, 2019
- ADEKA CORPORATION
- Tomoharu YOSHINO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALKOXIDE COMPOUND, THIN FILM-FORMING STARTING MATERIAL, THIN FILM F...
- Publication number 20180282358
- Publication date Oct 4, 2018
- ADEKA CORPORATION
- Atsushi SAKURAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOVEL COMPOUND, THIN FILM-FORMING MATERIAL, AND THIN FILM MANUFACTU...
- Publication number 20180051372
- Publication date Feb 22, 2018
- ADEKA CORPORATION
- Tomoharu YOSHINO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIAZADIENYL COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FO...
- Publication number 20180037540
- Publication date Feb 8, 2018
- ADEKA CORPORATION
- Tomoharu YOSHINO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALKOXIDE COMPOUND, THIN FILM-FORMING STARTING MATERIAL, THIN FILM F...
- Publication number 20170129912
- Publication date May 11, 2017
- ADEKA CORPORATION
- Atsushi SAKURAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALKOXIDE COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR M...
- Publication number 20170121358
- Publication date May 4, 2017
- ADEKA CORPORATION
- Atsushi SAKURAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COBALT COMPOUND, THIN FILM-FORMING RAW MATERIAL, AND METHOD FOR PRO...
- Publication number 20170050998
- Publication date Feb 23, 2017
- ADEKA CORPORATION
- Tomoharu YOSHINO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COPPER COMPOUND, STARTING MATERIAL FOR FORMING THIN FILM, AND METHO...
- Publication number 20170044188
- Publication date Feb 16, 2017
- ADEKA CORPORATION
- Tomoharu YOSHINO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RUTHENIUM COMPOUND, MATERIAL FOR THIN FILM FORMATION, AND PROCESS F...
- Publication number 20160272664
- Publication date Sep 22, 2016
- Masako HATASE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Masaki ENZU

Person

Patents Grantslast 30 patents

Compound, thin-film forming raw material that contains said compoun...

Ruthenium compound, raw material for forming thin film, and method...

Method for producing metallic ruthenium thin film by atomic layer d...

Diazadienyl compound, raw material for forming thin film, and metho...

Alkoxide compound, raw material for forming thin film, method for m...

Compound, thin film-forming material, and thin film manufacturing m...

Ruthenium compound, material for thin film formation, and process f...

Alkoxide compound, thin film-forming starting material, and thin fi...

Copper compound, starting material for forming thin film, and metho...

Patents Applicationslast 30 patents

THIN-FILM FORMING MATERIAL FOR USE IN ATOMIC LAYER DEPOSITION, THIN...

REACTIVE MATERIAL AND METHOD OF PRODUCING THIN-FILM

INDIUM COMPOUND, THIN-FILM FORMING RAW MATERIAL, THIN FILM, AND MET...

THIN-FILM FORMING RAW MATERIAL USED IN ATOMIC LAYER DEPOSITION METH...

ZINC COMPOUND, THIN-FILM FORMING RAW MATERIAL, THIN-FILM, AND METHO...

NOVEL COMPOUND, THIN-FILM FORMING RAW MATERIAL THAT CONTAINS SAID C...

RUTHENIUM COMPOUND, THIN-FILM FORMING RAW MATERIAL, AND METHOD OF P...

METHOD FOR PRODUCING METALLIC RUTHENIUM THIN FILM BY ATOMIC LAYER D...

RAW MATERIAL FOR FORMING THIN FILM BY ATOMIC LAYER DEPOSITION METHO...

RUTHENIUM COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, AND METHOD...

DIAZADIENYL COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, AND METHO...

ALKOXIDE COMPOUND, THIN FILM-FORMING STARTING MATERIAL, THIN FILM F...

NOVEL COMPOUND, THIN FILM-FORMING MATERIAL, AND THIN FILM MANUFACTU...

DIAZADIENYL COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FO...

ALKOXIDE COMPOUND, THIN FILM-FORMING STARTING MATERIAL, THIN FILM F...

ALKOXIDE COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR M...

COBALT COMPOUND, THIN FILM-FORMING RAW MATERIAL, AND METHOD FOR PRO...

COPPER COMPOUND, STARTING MATERIAL FOR FORMING THIN FILM, AND METHO...

RUTHENIUM COMPOUND, MATERIAL FOR THIN FILM FORMATION, AND PROCESS F...