Masaki FUJII

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Shunan-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 11,658,011
- Issue date May 23, 2023
- HITACHI HIGH-TECH CORPORATION
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,600,619
- Issue date Mar 24, 2020
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 9,349,603
- Issue date May 24, 2016
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 8,828,254
- Issue date Sep 9, 2014
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200161092
- Publication date May 21, 2020
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160225587
- Publication date Aug 4, 2016
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20140349418
- Publication date Nov 27, 2014
- Yoshiharu INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20130029492
- Publication date Jan 31, 2013
- Hitachi High-Technologies Corporation
- Yoshiharu INOUE
- H01 - BASIC ELECTRIC ELEMENTS