Masaki Fujiwara

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Sulfonamide-containing topcoat and photoresist additive composition...
- Patent number 9,422,445
- Issue date Aug 23, 2016
- International Business Machines Corporation
- Daniel Paul Sanders
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Sulfonamide-containing photoresist compositions and methods of use
- Patent number 9,223,209
- Issue date Dec 29, 2015
- International Business Machines Corporation
- Daniel Paul Sanders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonamide-containing topcoat and photoresist additive composition...
- Patent number 9,223,217
- Issue date Dec 29, 2015
- International Business Machines Corporation
- Daniel Paul Sanders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyamide membranes with fluoroalcohol functionality
- Patent number 8,754,139
- Issue date Jun 17, 2014
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Cyclic carbonyl compounds with pendant carbonate groups, preparatio...
- Patent number 8,207,351
- Issue date Jun 26, 2012
- International Business Machines Corporation
- Masaki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymers bearing pendant pentafluorophenyl ester groups, and method...
- Patent number 8,143,369
- Issue date Mar 27, 2012
- International Business Machines Corporation
- Masaki Fujiwara
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
Sulfonamide-Containing Topcoat and Photoresist Additive Composition...
- Publication number 20160053129
- Publication date Feb 25, 2016
- CENTRAL GLASS CO., LTD.
- Daniel Paul Sanders
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CYCLIC CARBONYL COMPOUNDS WITH PENDANT CARBONATE GROUPS, PREPARATIO...
- Publication number 20110269917
- Publication date Nov 3, 2011
- Central Glass Co., Ltd.
- Masaki Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Sulfonamide-Containing Topcoat and Photoresist Additive Composition...
- Publication number 20110207051
- Publication date Aug 25, 2011
- International Business Machines Corporation
- Daniel Paul Sanders
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SULFONAMIDE-CONTAINING PHOTORESIST COMPOSITIONS AND METHODS OF USE
- Publication number 20110207052
- Publication date Aug 25, 2011
- International Business Machines Corporation
- Daniel Paul Sanders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMERS BEARING PENDANT PENTAFLUOROPHENYL ESTER GROUPS, AND METHOD...
- Publication number 20100305281
- Publication date Dec 2, 2010
- International Business Machines Corporation
- Masaki Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
INTERFACIAL POLYMERIZATION METHODS FOR MAKING FLUOROALCOHOL-CONTAIN...
- Publication number 20100216967
- Publication date Aug 26, 2010
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYAMIDE MEMBRANES WITH FLUOROALCOHOL FUNCTIONALITY
- Publication number 20100216899
- Publication date Aug 26, 2010
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF USE
- Publication number 20100203450
- Publication date Aug 12, 2010
- International Business Machines Corporation
- Masaki Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Masaki Fujiwara

Person

Patents Grantslast 30 patents

Sulfonamide-containing topcoat and photoresist additive composition...

Sulfonamide-containing photoresist compositions and methods of use

Sulfonamide-containing topcoat and photoresist additive composition...

Polyamide membranes with fluoroalcohol functionality

Cyclic carbonyl compounds with pendant carbonate groups, preparatio...

Polymers bearing pendant pentafluorophenyl ester groups, and method...

Patents Applicationslast 30 patents

Sulfonamide-Containing Topcoat and Photoresist Additive Composition...

CYCLIC CARBONYL COMPOUNDS WITH PENDANT CARBONATE GROUPS, PREPARATIO...

Sulfonamide-Containing Topcoat and Photoresist Additive Composition...

SULFONAMIDE-CONTAINING PHOTORESIST COMPOSITIONS AND METHODS OF USE

POLYMERS BEARING PENDANT PENTAFLUOROPHENYL ESTER GROUPS, AND METHOD...

INTERFACIAL POLYMERIZATION METHODS FOR MAKING FLUOROALCOHOL-CONTAIN...

POLYAMIDE MEMBRANES WITH FLUOROALCOHOL FUNCTIONALITY

PHOTORESIST COMPOSITIONS AND METHODS OF USE