Masaki Hirayama

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Wafer support device
- Patent number 12,119,212
- Issue date Oct 15, 2024
- Sumitomo Osaka Cement Co., Ltd.
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,087,552
- Issue date Sep 10, 2024
- Tokyo Electron Limited
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shower plate, plasma processing apparatus and plasma processing method
- Patent number 12,051,564
- Issue date Jul 30, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,990,316
- Issue date May 21, 2024
- Tokyo Electron Limited
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and lower stage
- Patent number 11,929,234
- Issue date Mar 12, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,854,772
- Issue date Dec 26, 2023
- Tokyo Electron Limited
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment device
- Patent number 11,443,927
- Issue date Sep 13, 2022
- Tokyo Electron Limited
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus having a gas-mixing manifold
- Patent number 11,118,262
- Issue date Sep 14, 2021
- ASM IP Holding B.V.
- Naoto Tsuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for controlling plasma proce...
- Patent number 10,674,595
- Issue date Jun 2, 2020
- Tokyo Electron Limited
- Masaki Hirayama
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Insulator structure for avoiding abnormal electrical discharge and...
- Patent number 10,354,844
- Issue date Jul 16, 2019
- ASM IP Holding B.V.
- Hiroshi Kondo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,196,460
- Issue date Nov 24, 2015
- Tokyo Electron Limited
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,105,450
- Issue date Aug 11, 2015
- Tohoku University
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,095,039
- Issue date Jul 28, 2015
- Tohoku University
- Masaki Hirayama
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus
- Patent number 8,733,281
- Issue date May 27, 2014
- Tokyo Electron Limited
- Masaki Hirayama
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Microwave plasma processing apparatus, dielectric window for use in...
- Patent number 8,573,151
- Issue date Nov 5, 2013
- Tokyo Electron Limited
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for using plasma processing...
- Patent number 8,568,556
- Issue date Oct 29, 2013
- Tokyo Electron Limited
- Masaki Hirayama
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,327,796
- Issue date Dec 11, 2012
- Tokyo Electron Limited
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system, plasma measurement system, plasma measure...
- Patent number 8,241,457
- Issue date Aug 14, 2012
- Tokyo Electron Limited
- Mitsuo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching device
- Patent number 8,114,245
- Issue date Feb 14, 2012
- Tokyo Electron Limited
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,092,642
- Issue date Jan 10, 2012
- Tokyo Electron Limited
- Toshiaki Hongo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Information processor, method of detecting factor influencing healt...
- Patent number 8,059,875
- Issue date Nov 15, 2011
- Hitachi Consulting Co., Ltd.
- Sayuri Uehara
- G11 - INFORMATION STORAGE
Information Patent Grant
Shower plate, plasma processing apparatus, and product manufacturin...
- Patent number 7,879,182
- Issue date Feb 1, 2011
- Foundation For Advancement of International Science
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 7,819,082
- Issue date Oct 26, 2010
- Tokyo Electron Limited
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 7,723,637
- Issue date May 25, 2010
- Tohoku University
- Tadahiro Ohmi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of forming a dielectic film that contains silicon, oxygen an...
- Patent number 7,718,484
- Issue date May 18, 2010
- Foundation fõr Advancement of International Science
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,670,454
- Issue date Mar 2, 2010
- Tokyo Electron Limited
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine-containing carbon film forming method
- Patent number 7,538,012
- Issue date May 26, 2009
- Tadahiro Ohmi
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 7,520,245
- Issue date Apr 21, 2009
- Tokyo Electron Limited
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process apparatus and its processor
- Patent number 7,478,609
- Issue date Jan 20, 2009
- Sharp Kabushiki Kaisha
- Naoko Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric film and method of forming it, semiconductor device, non...
- Patent number 7,439,121
- Issue date Oct 21, 2008
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250014864
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250014863
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER SUPPORT DEVICE
- Publication number 20240429032
- Publication date Dec 26, 2024
- Sumitomo Osaka Cement Co., Ltd.
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240321550
- Publication date Sep 26, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240242936
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240242937
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240242934
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240087849
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240071730
- Publication date Feb 29, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK
- Publication number 20230290620
- Publication date Sep 14, 2023
- Sumitomo Osaka Cement Co., Ltd.
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER SUPPORT DEVICE
- Publication number 20230223244
- Publication date Jul 13, 2023
- Sumitomo Osaka Cement Co., Ltd.
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK DEVICE
- Publication number 20230215704
- Publication date Jul 6, 2023
- Sumitomo Osaka Cement Co., Ltd.
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230019369
- Publication date Jan 19, 2023
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230010178
- Publication date Jan 12, 2023
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220165538
- Publication date May 26, 2022
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND LOWER STAGE
- Publication number 20220068603
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220037118
- Publication date Feb 3, 2022
- TOKYO ELECTRON LIMITED
- Satoru KAWAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWER PLATE, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220037117
- Publication date Feb 3, 2022
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220028666
- Publication date Jan 27, 2022
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220020569
- Publication date Jan 20, 2022
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220020574
- Publication date Jan 20, 2022
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210375588
- Publication date Dec 2, 2021
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210343501
- Publication date Nov 4, 2021
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS HAVING MANIFOLD
- Publication number 20200115797
- Publication date Apr 16, 2020
- ASM IP HOLDING B.V.
- Naoto TSUJI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Treatment Device
- Publication number 20190295828
- Publication date Sep 26, 2019
- TOKYO ELECTRON LIMITED
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING PLASMA PROCE...
- Publication number 20190246485
- Publication date Aug 8, 2019
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSULATOR STRUCTURE FOR AVOIDING ABNORMAL ELECTRICAL DISCHARGE AND...
- Publication number 20180330924
- Publication date Nov 15, 2018
- ASM IP HOLDING B.V.
- Hiroshi KONDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140368110
- Publication date Dec 18, 2014
- TOHOKU UNIVERSITY
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20140335288
- Publication date Nov 13, 2014
- TOHOKU UNIVERSITY
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140042123
- Publication date Feb 13, 2014
- TOHOKU UNIVERSITY
- Masaki Hirayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Masaki Hirayama

Person

Patents Grantslast 30 patents

Wafer support device

Plasma processing apparatus and plasma processing method

Shower plate, plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and lower stage

Plasma processing apparatus and plasma processing method

Plasma treatment device

Substrate processing apparatus having a gas-mixing manifold

Plasma processing apparatus and method for controlling plasma proce...

Insulator structure for avoiding abnormal electrical discharge and...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Microwave plasma processing apparatus, dielectric window for use in...

Plasma processing apparatus and method for using plasma processing...

Plasma processing apparatus and plasma processing method

Plasma processing system, plasma measurement system, plasma measure...

Plasma etching device

Plasma processing apparatus

Information processor, method of detecting factor influencing healt...

Shower plate, plasma processing apparatus, and product manufacturin...

Plasma processing apparatus

Plasma processing apparatus

Method of forming a dielectic film that contains silicon, oxygen an...

Plasma processing apparatus

Fluorine-containing carbon film forming method

Plasma processing apparatus

Plasma process apparatus and its processor

Dielectric film and method of forming it, semiconductor device, non...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

WAFER SUPPORT DEVICE

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

ELECTROSTATIC CHUCK

WAFER SUPPORT DEVICE

ELECTROSTATIC CHUCK DEVICE

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND LOWER STAGE

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SHOWER PLATE, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS HAVING MANIFOLD

Plasma Treatment Device

PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING PLASMA PROCE...

INSULATOR STRUCTURE FOR AVOIDING ABNORMAL ELECTRICAL DISCHARGE AND...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD