Masaki Inoue

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Seidai City, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,217,430
- Issue date Jan 4, 2022
- Tokyo Electron Limited
- Masaki Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method, method for producing semiconductor device, a...
- Patent number 9,324,572
- Issue date Apr 26, 2016
- Tokyo Electron Limited
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200135430
- Publication date Apr 30, 2020
- TOKYO ELECTRON LIMITED
- Masaki INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, A...
- Publication number 20130029494
- Publication date Jan 31, 2013
- TOKYO ELECTRON LIMITED
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS