Masaki MIKAMI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing multilayer film-deposited substrate and mu...
- Patent number 10,775,692
- Issue date Sep 15, 2020
- AGC Inc.
- Yunosuke Ishikawa
- G02 - OPTICS
Information Patent Grant
Reflective mask blank for EUV lithography and process for its produ...
- Patent number 9,720,316
- Issue date Aug 1, 2017
- Asahi Glass Company, Limited
- Masaki Mikami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography, or reflective layer-coat...
- Patent number 9,448,469
- Issue date Sep 20, 2016
- Asahi Glass Company, Limited
- Masaki Mikami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography and process for its produ...
- Patent number 9,423,684
- Issue date Aug 23, 2016
- Asahi Glass Company, Limited
- Kazunobu Maeshige
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask blank for EUV lithography, and process for its prod...
- Patent number 9,207,529
- Issue date Dec 8, 2015
- Asahi Glass Company, Limited
- Takeru Kinoshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography and process for its produ...
- Patent number 9,052,601
- Issue date Jun 9, 2015
- Asahi Glass Company, Limited
- Masaki Mikami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective layer-equipped substrate for EUV lithography, reflective...
- Patent number 8,993,201
- Issue date Mar 31, 2015
- Asahi Glass Company, Limited
- Masaki Mikami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical member for EUV lithography
- Patent number 8,986,910
- Issue date Mar 24, 2015
- Asahi Glass Company, Limited
- Masaki Mikami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical member for EUV lithography, and process for production of r...
- Patent number 8,927,179
- Issue date Jan 6, 2015
- Asahi Glass Company, Limited
- Masaki Mikami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Substrate with reflective layer for EUV lithography and reflective...
- Patent number 8,828,626
- Issue date Sep 9, 2014
- Asahi Glass Company, Limited
- Masaki Mikami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multilayer mirror for EUV lithography and process for its production
- Patent number 8,580,465
- Issue date Nov 12, 2013
- Asahi Glass Company, Limited
- Masaki Mikami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 8,088,538
- Issue date Jan 3, 2012
- Asahi Glass Company, Limited
- Kazyuki Hayashi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 7,906,259
- Issue date Mar 15, 2011
- Asahi Glass Company, Limited
- Kazuyuki Hayashi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask blank for EUV lithography and substrate with functi...
- Patent number 7,833,682
- Issue date Nov 16, 2010
- Asahi Glass Company, Limited
- Kazuyuki Hayashi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask blank for EUV lithography and substrate with a cond...
- Patent number 7,736,821
- Issue date Jun 15, 2010
- Asahi Glass Company, Limited
- Kazuyuki Hayashi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Notification information display apparatus notification information...
- Patent number 6,678,866
- Issue date Jan 13, 2004
- Hakuhodo Inc.
- Hideo Sugimoto
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MANUFACTURING MULTILAYER FILM-DEPOSITED SUBSTRATE AND MU...
- Publication number 20180059530
- Publication date Mar 1, 2018
- Asahi Glass Company, Limited
- Yunosuke Ishikawa
- G02 - OPTICS
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND PROCESS FOR ITS PRODU...
- Publication number 20160109792
- Publication date Apr 21, 2016
- Asahi Glass Company, Limited
- Masaki Mikami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, OR REFLECTIVE LAYER-COAT...
- Publication number 20150160548
- Publication date Jun 11, 2015
- Asahi Glass Company, Limited
- Masaki Mikami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND PROCESS FOR ITS PRODU...
- Publication number 20140212794
- Publication date Jul 31, 2014
- Asahi Glass Company, Limited
- Kazunobu MAESHIGE
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, AND PROCESS FOR ITS PROD...
- Publication number 20140186752
- Publication date Jul 3, 2014
- Asahi Glass Company, Limited
- Takeru KINOSHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND PROCESS FOR ITS PRODU...
- Publication number 20140017601
- Publication date Jan 16, 2014
- Masaki MIKAMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH REFLECTIVE LAYER FOR EUV LITHOGRAPHY AND REFLECTIVE...
- Publication number 20130115547
- Publication date May 9, 2013
- ASAHI GLASS COMPANY, LIMITED
- Masaki Mikami
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE LAYER-EQUIPPED SUBSTRATE FOR EUV LITHOGRAPHY, REFLECTIVE...
- Publication number 20120231378
- Publication date Sep 13, 2012
- ASAHI GLASS COMPANY, LIMITED
- Masaki MIKAMI
- G02 - OPTICS
Information Patent Application
OPTICAL MEMBER FOR EUV LITHOGRAPHY
- Publication number 20120225375
- Publication date Sep 6, 2012
- ASAHI GLASS COMPANY, LIMITED
- Masaki MIKAMI
- G02 - OPTICS
Information Patent Application
OPTICAL MEMBER FOR EUV LITHOGRAPHY, AND PROCESS FOR PRODUCTION OF R...
- Publication number 20120219890
- Publication date Aug 30, 2012
- ASAHI GLASS COMPANY, LIMITED
- Masaki MIKAMI
- G02 - OPTICS
Information Patent Application
MULTILAYER MIRROR FOR EUV LITHOGRAPHY AND PROCESS FOR ITS PRODUCTION
- Publication number 20120196208
- Publication date Aug 2, 2012
- ASAHI GLASS COMPANY, LIMITED
- Masaki MIKAMI
- G02 - OPTICS
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20100035165
- Publication date Feb 11, 2010
- Asahi Glass Company, Limited
- Kazuyuki Hayashi
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20090011341
- Publication date Jan 8, 2009
- Asahi Glass Co., LTD.
- Kazuyuki Hayashi
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH FUNCTI...
- Publication number 20080318140
- Publication date Dec 25, 2008
- Asahi Glass Company, Limited
- Kazuyuki Hayashi
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH A COND...
- Publication number 20070160874
- Publication date Jul 12, 2007
- Asahi Glass Company, Limited
- Kazuyuki Hayashi
- B82 - NANO-TECHNOLOGY

Masaki MIKAMI

Person

Patents Grantslast 30 patents

Method for manufacturing multilayer film-deposited substrate and mu...

Reflective mask blank for EUV lithography and process for its produ...

Reflective mask blank for EUV lithography, or reflective layer-coat...

Reflective mask blank for EUV lithography and process for its produ...

Reflective mask blank for EUV lithography, and process for its prod...

Reflective mask blank for EUV lithography and process for its produ...

Reflective layer-equipped substrate for EUV lithography, reflective...

Optical member for EUV lithography

Optical member for EUV lithography, and process for production of r...

Substrate with reflective layer for EUV lithography and reflective...

Multilayer mirror for EUV lithography and process for its production

Reflective mask blank for EUV lithography

Reflective mask blank for EUV lithography

Reflective mask blank for EUV lithography and substrate with functi...

Reflective mask blank for EUV lithography and substrate with a cond...

Notification information display apparatus notification information...

Patents Applicationslast 30 patents

METHOD FOR MANUFACTURING MULTILAYER FILM-DEPOSITED SUBSTRATE AND MU...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND PROCESS FOR ITS PRODU...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, OR REFLECTIVE LAYER-COAT...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND PROCESS FOR ITS PRODU...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, AND PROCESS FOR ITS PROD...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND PROCESS FOR ITS PRODU...

SUBSTRATE WITH REFLECTIVE LAYER FOR EUV LITHOGRAPHY AND REFLECTIVE...

REFLECTIVE LAYER-EQUIPPED SUBSTRATE FOR EUV LITHOGRAPHY, REFLECTIVE...

OPTICAL MEMBER FOR EUV LITHOGRAPHY

OPTICAL MEMBER FOR EUV LITHOGRAPHY, AND PROCESS FOR PRODUCTION OF R...

MULTILAYER MIRROR FOR EUV LITHOGRAPHY AND PROCESS FOR ITS PRODUCTION

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH FUNCTI...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH A COND...