Masaki Narita

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of fabricating semiconductor device with reduced pitch
- Patent number 7,732,338
- Issue date Jun 8, 2010
- Kabushiki Kaisha Toshiba
- Masaki Narita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device including a dielectr...
- Patent number 7,208,400
- Issue date Apr 24, 2007
- Kabushiki Kaisha Toshiba
- Toshiyuki Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing system for etching a semiconduct...
- Patent number 7,067,761
- Issue date Jun 27, 2006
- Kabushiki Kaisha Toshiba
- Takanori Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing system for etching a semiconduct...
- Patent number 6,989,073
- Issue date Jan 24, 2006
- Kabushiki Kaisha Toshiba
- Takanori Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of sequentially processing a plurality of lots each includin...
- Patent number 6,911,398
- Issue date Jun 28, 2005
- Kabushiki Kaisha Toshiba
- Masaki Narita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and semiconductor device
- Patent number 6,887,802
- Issue date May 3, 2005
- Kabushiki Kaisha Toshiba
- Masaki Narita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing system for etching a semiconduct...
- Patent number 6,685,797
- Issue date Feb 3, 2004
- Kabushiki Kaisha Toshiba
- Takanori Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 6,383,942
- Issue date May 7, 2002
- Kabushiki Kaisha Toshiba
- Masaki Narita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of making gate wiring layer over semiconductor substrate
- Patent number 6,376,347
- Issue date Apr 23, 2002
- Kabushiki Kaisha Toshiba
- Mitsuhiro Ohmura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 6,368,977
- Issue date Apr 9, 2002
- Kabushiki Kaisha Toshiba
- Masaki Narita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method using electrostatic chuck...
- Patent number 6,333,246
- Issue date Dec 25, 2001
- Kabushiki Kaisha Toshiba
- Masaki Narita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wiring layer of a semiconductor integrated circuit
- Patent number 6,313,535
- Issue date Nov 6, 2001
- Kabushiki Kaisha Toshiba
- Junichiro Iba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,274,507
- Issue date Aug 14, 2001
- Kabushiki Kaisha Toshiba
- Masaki Narita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming pattern
- Patent number 6,270,948
- Issue date Aug 7, 2001
- Kabushiki Kaisha Toshiba
- Yasuhiko Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a pattern using polysilane
- Patent number 6,025,117
- Issue date Feb 15, 2000
- Kabushiki Kaisha Toshiba
- Yoshihiko Nakano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Low pressure and low power C1.sub.2 /HC1 process for sub-micron met...
- Patent number 5,976,986
- Issue date Nov 2, 1999
- International Business Machines Corp.
- Munir D. Naeem
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pattern forming method
- Patent number 5,879,863
- Issue date Mar 9, 1999
- Kabushiki Kaisha Toshiba
- Tsukasa Azuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for metal etching with reduced sidewall build up during int...
- Patent number 5,846,884
- Issue date Dec 8, 1998
- Siemens Aktiengesellschaft
- Munir D. Naeem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating apparatus and surface processing apparatus
- Patent number 5,660,744
- Issue date Aug 26, 1997
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device and surface processing device and method f...
- Patent number 5,444,207
- Issue date Aug 22, 1995
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20090104786
- Publication date Apr 23, 2009
- Kabushiki Kaisha Toshiba
- Masaki NARITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor manufacturing apparatus and manufacturing method of s...
- Publication number 20060137988
- Publication date Jun 29, 2006
- Kabushiki Kaisha Toshiba
- Katsunori Yahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20060128093
- Publication date Jun 15, 2006
- Keiichi Takenaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20060057785
- Publication date Mar 16, 2006
- Tomoya Satonaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20050215062
- Publication date Sep 29, 2005
- Osamu Miyagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20050023592
- Publication date Feb 3, 2005
- Toshiyuki Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device including trench capacitor and manufacturing m...
- Publication number 20040188739
- Publication date Sep 30, 2004
- Keiichi Takenaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device manufacturing system for etching a semiconduct...
- Publication number 20040149698
- Publication date Aug 5, 2004
- KABUSHIKI KAISHA TOSHIBA
- Takanori Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device manufacturing system for etching a semiconduct...
- Publication number 20040134609
- Publication date Jul 15, 2004
- KABUSHIKI KAISHA TOSHIBA
- Takanori Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device manufacturing system for etching a semiconduct...
- Publication number 20040137746
- Publication date Jul 15, 2004
- KABUSHIKI KAISHA TOSHIBA
- Takanori Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device manufacturing system for etching a semiconduct...
- Publication number 20040134610
- Publication date Jul 15, 2004
- KABUSHIKI KAISHA TOSHIBA
- Takanori Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device and semiconductor device
- Publication number 20040017011
- Publication date Jan 29, 2004
- Masaki Narita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device manufacturing system for etching a semiconduct...
- Publication number 20030127188
- Publication date Jul 10, 2003
- Takanori Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing
- Publication number 20020192972
- Publication date Dec 19, 2002
- Masaki Narita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of making semiconductor device
- Publication number 20020155727
- Publication date Oct 24, 2002
- Masaki Narita
- H01 - BASIC ELECTRIC ELEMENTS

Masaki Narita

Person

Patents Grantslast 30 patents

Method of fabricating semiconductor device with reduced pitch

Method of manufacturing a semiconductor device including a dielectr...

Semiconductor device manufacturing system for etching a semiconduct...

Semiconductor device manufacturing system for etching a semiconduct...

Method of sequentially processing a plurality of lots each includin...

Method of manufacturing semiconductor device and semiconductor device

Semiconductor device manufacturing system for etching a semiconduct...

Dry etching method

Method of making gate wiring layer over semiconductor substrate

Semiconductor device manufacturing method

Semiconductor device manufacturing method using electrostatic chuck...

Wiring layer of a semiconductor integrated circuit

Plasma processing apparatus and method

Method of forming pattern

Method of forming a pattern using polysilane

Low pressure and low power C1.sub.2 /HC1 process for sub-micron met...

Pattern forming method

Methods for metal etching with reduced sidewall build up during int...

Plasma generating apparatus and surface processing apparatus

Plasma generating device and surface processing device and method f...

Patents Applicationslast 30 patents

METHOD OF FABRICATING SEMICONDUCTOR DEVICE

Semiconductor manufacturing apparatus and manufacturing method of s...

Method of manufacturing semiconductor device

Method of manufacturing semiconductor device

Method of manufacturing semiconductor device

Semiconductor device and method of manufacturing the same

Semiconductor device including trench capacitor and manufacturing m...

Semiconductor device manufacturing system for etching a semiconduct...

Semiconductor device manufacturing system for etching a semiconduct...

Semiconductor device manufacturing system for etching a semiconduct...

Semiconductor device manufacturing system for etching a semiconduct...

Method of manufacturing semiconductor device and semiconductor device

Semiconductor device manufacturing system for etching a semiconduct...

Plasma processing

Method of making semiconductor device