Masaki Ohashi

Person

Joetsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and pattern forming process
- Patent number 12,174,536
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified negative resist composition and resist pattern...
- Patent number 12,164,227
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition and resist pattern...
- Patent number 12,164,231
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaaki Kotake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,072,627
- Issue date Aug 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,050,402
- Issue date Jul 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Molecular resist composition and patterning process
- Patent number 11,953,827
- Issue date Apr 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Molecular resist composition and patterning process
- Patent number 11,940,728
- Issue date Mar 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,822,239
- Issue date Nov 21, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,774,853
- Issue date Oct 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,693,314
- Issue date Jul 4, 2023
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium compound, chemically amplified resist composition, and pa...
- Patent number 11,687,000
- Issue date Jun 27, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 11,635,690
- Issue date Apr 25, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,604,411
- Issue date Mar 14, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,579,526
- Issue date Feb 14, 2023
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Onium salt, chemically amplified resist composition, and patterning...
- Patent number 11,560,355
- Issue date Jan 24, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 11,506,977
- Issue date Nov 22, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,460,773
- Issue date Oct 4, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and patterning process
- Patent number 11,460,772
- Issue date Oct 4, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,448,962
- Issue date Sep 20, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Iodonium salt, resist composition, and pattern forming process
- Patent number 11,448,961
- Issue date Sep 20, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,435,665
- Issue date Sep 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Onium salt, negative resist composition, and resist pattern forming...
- Patent number 11,429,023
- Issue date Aug 30, 2022
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,415,887
- Issue date Aug 16, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,409,194
- Issue date Aug 9, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,392,034
- Issue date Jul 19, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 11,385,544
- Issue date Jul 12, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,340,527
- Issue date May 24, 2022
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,281,101
- Issue date Mar 22, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,269,253
- Issue date Mar 8, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,269,251
- Issue date Mar 8, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240377730
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240361692
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20240345480
- Publication date Oct 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240272550
- Publication date Aug 15, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240210830
- Publication date Jun 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240176238
- Publication date May 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPO...
- Publication number 20240126168
- Publication date Apr 18, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230367211
- Publication date Nov 16, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230280651
- Publication date Sep 7, 2023
- Shin-Etsu Chemical Co., Ltd.
- Teppei ADACHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230137472
- Publication date May 4, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230132653
- Publication date May 4, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTER...
- Publication number 20230134822
- Publication date May 4, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230116120
- Publication date Apr 13, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20220350243
- Publication date Nov 3, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20220276557
- Publication date Sep 1, 2022
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20220269174
- Publication date Aug 25, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masaaki Kotake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20220236643
- Publication date Jul 28, 2022
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20220155687
- Publication date May 19, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20220100089
- Publication date Mar 31, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210200083
- Publication date Jul 1, 2021
- Shin-Etsu Chemical Co., Ltd.
- Teppei ADACHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210141306
- Publication date May 13, 2021
- Shin-Etsu Chemical Co., Ltd.
- Teppei ADACHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210048746
- Publication date Feb 18, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210003916
- Publication date Jan 7, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200393760
- Publication date Dec 17, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200379345
- Publication date Dec 3, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING...
- Publication number 20200369605
- Publication date Nov 26, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PA...
- Publication number 20200319550
- Publication date Oct 8, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200301274
- Publication date Sep 24, 2020
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke TANIGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200285149
- Publication date Sep 10, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200272048
- Publication date Aug 27, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masaki Ohashi

Person

Patents Grantslast 30 patents

Resist composition and pattern forming process

Chemically amplified negative resist composition and resist pattern...

Chemically amplified positive resist composition and resist pattern...

Resist composition and patterning process

Resist composition and patterning process

Molecular resist composition and patterning process

Molecular resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Sulfonium compound, chemically amplified resist composition, and pa...

Positive resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Onium salt, chemically amplified resist composition, and patterning...

Positive resist composition and patterning process

Resist composition and patterning process

Positive resist composition and patterning process

Resist composition and patterning process

Iodonium salt, resist composition, and pattern forming process

Resist composition and patterning process

Onium salt, negative resist composition, and resist pattern forming...

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Composition for forming silicon-containing resist underlayer film a...

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Patents Applicationslast 30 patents

RESIST COMPOSITION AND PATTERN FORMING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS

ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPO...

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS

MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS

AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTER...

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING...

SULFONIUM COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PA...

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS