Masaki Takakuwa

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electron beam exposure apparatus and electron beam measurement module
- Patent number 7,034,321
- Issue date Apr 25, 2006
- Advantest Corporation
- Masaki Takakuwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam writing equipment using plural beams and method
- Patent number 7,015,482
- Issue date Mar 21, 2006
- Hitachi, Ltd.
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam exposure apparatus and method of controlling...
- Patent number 6,969,862
- Issue date Nov 29, 2005
- Canon Kabushiki Kaisha
- Masato Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged beam lens, charged-particle beam exposure apparatus u...
- Patent number 6,946,662
- Issue date Sep 20, 2005
- Canon Kabushiki Kaisha
- Haruhito Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multibeam generating apparatus and electron beam drawing apparatus
- Patent number 6,870,310
- Issue date Mar 22, 2005
- Canon Kabushiki Kaisha
- Masahiko Okunuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam monitoring sensor and electron beam monitoring method
- Patent number 6,768,118
- Issue date Jul 27, 2004
- Hitachi, Ltd.
- Yoshinori Nakayama
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR APPARATUS AND MANUFACTURING METHOD
- Publication number 20240290741
- Publication date Aug 29, 2024
- Advantest Corporation
- Shinji SUGATANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam exposure apparatus and electron beam measurement module
- Publication number 20050023486
- Publication date Feb 3, 2005
- Advantest Corporation
- Masaki Takakuwa
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-particle-beam exposure apparatus and method of controlling...
- Publication number 20040135102
- Publication date Jul 15, 2004
- Masato Muraki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multi-charged beam lens, charged-particle beam exposure apparatus u...
- Publication number 20040061064
- Publication date Apr 1, 2004
- Canon Kabushiki Kaisha
- Haruhito Ono
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multibeam generating apparatus and electron beam drawing apparatus
- Publication number 20040056578
- Publication date Mar 25, 2004
- Canon Kabushiki Kaisha
- Masahiko Okunuki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam monitoring sensor and electron beam monitoring method
- Publication number 20040026627
- Publication date Feb 12, 2004
- Yoshinori Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam writing equipment
- Publication number 20040021095
- Publication date Feb 5, 2004
- Yasunari Sohda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Target mark member, method for manufacturing, and electron beam exp...
- Publication number 20010052573
- Publication date Dec 20, 2001
- Advantest Corporation
- Masaki Takakuwa
- H01 - BASIC ELECTRIC ELEMENTS

Masaki Takakuwa

Person

Patents Grantslast 30 patents

Electron beam exposure apparatus and electron beam measurement module

Electron beam writing equipment using plural beams and method

Charged-particle-beam exposure apparatus and method of controlling...

Multi-charged beam lens, charged-particle beam exposure apparatus u...

Multibeam generating apparatus and electron beam drawing apparatus

Electron beam monitoring sensor and electron beam monitoring method

Patents Applicationslast 30 patents

SEMICONDUCTOR APPARATUS AND MANUFACTURING METHOD

Electron beam exposure apparatus and electron beam measurement module

Charged-particle-beam exposure apparatus and method of controlling...

Multi-charged beam lens, charged-particle beam exposure apparatus u...

Multibeam generating apparatus and electron beam drawing apparatus

Electron beam monitoring sensor and electron beam monitoring method

Electron beam writing equipment

Target mark member, method for manufacturing, and electron beam exp...