Masako SUGIHARA

Person

Osaka-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 12,164,229
- Issue date Dec 10, 2024
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition
- Patent number 11,561,471
- Issue date Jan 24, 2023
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for producing resist pattern, and met...
- Patent number 11,543,749
- Issue date Jan 3, 2023
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition
- Patent number 10,969,685
- Issue date Apr 6, 2021
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 10,365,560
- Issue date Jul 30, 2019
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 10,101,657
- Issue date Oct 16, 2018
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 9,740,097
- Issue date Aug 22, 2017
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition
- Patent number 9,726,976
- Issue date Aug 8, 2017
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 9,346,750
- Issue date May 24, 2016
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 9,221,785
- Issue date Dec 29, 2015
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition
- Patent number 9,182,663
- Issue date Nov 10, 2015
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,765,351
- Issue date Jul 1, 2014
- Sumitomo Chemical Company, Limted
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,614,046
- Issue date Dec 24, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,609,317
- Issue date Dec 17, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,481,242
- Issue date Jul 9, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,367,298
- Issue date Feb 5, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,354,217
- Issue date Jan 15, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,318,404
- Issue date Nov 27, 2012
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,318,403
- Issue date Nov 27, 2012
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,278,023
- Issue date Oct 2, 2012
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND MET...
- Publication number 20210278765
- Publication date Sep 9, 2021
- Sumitomo Chemical Company, Limited
- Masako SUGIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20200209749
- Publication date Jul 2, 2020
- Sumitomo Chemical Company, Limited
- Masako SUGIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20170168393
- Publication date Jun 15, 2017
- Sumitomo Chemical Company, Limited
- Masako SUGIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160291467
- Publication date Oct 6, 2016
- Sumitomo Chemical Company, Limited
- Masako SUGIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160291465
- Publication date Oct 6, 2016
- Sumitomo Chemical Company, Limited
- Masako SUGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160291466
- Publication date Oct 6, 2016
- Sumitomo Chemical Company, Limited
- Masako SUGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20150086927
- Publication date Mar 26, 2015
- Sumitomo Chemical Company, Limited
- Masako SUGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20140017611
- Publication date Jan 16, 2014
- Sumitomo Chemical Company, Limited
- Masako SUGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20110117494
- Publication date May 19, 2011
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20110117493
- Publication date May 19, 2011
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20110117495
- Publication date May 19, 2011
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20110065041
- Publication date Mar 17, 2011
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20110014568
- Publication date Jan 20, 2011
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20110014566
- Publication date Jan 20, 2011
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20110014567
- Publication date Jan 20, 2011
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20100316952
- Publication date Dec 16, 2010
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20100316951
- Publication date Dec 16, 2010
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20100304294
- Publication date Dec 2, 2010
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20100304296
- Publication date Dec 2, 2010
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20100304292
- Publication date Dec 2, 2010
- SUMITOMO CHEMICAL COMMPANY, LIMITED
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20100230136
- Publication date Sep 16, 2010
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING...
- Publication number 20100203446
- Publication date Aug 12, 2010
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLARIZING FILM WITH ADHESIVE, OPTICAL LAMINATE, AND SET OF POLARIZ...
- Publication number 20090142517
- Publication date Jun 4, 2009
- SUMITOMO CHEMICAL COMPANY, LIMITED
- Ryu Takeko
- G02 - OPTICS

Masako SUGIHARA

Person

Patents Grantslast 30 patents

Resist composition and method for producing resist pattern

Photoresist composition

Resist composition and method for producing resist pattern, and met...

Photoresist composition

Resist composition and method for producing resist pattern

Resin, resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Photoresist composition

Salt and photoresist composition containing the same

Salt and photoresist composition containing the same

Photoresist composition

Salt and photoresist composition containing the same

Salt and photoresist composition containing the same

Salt and photoresist composition containing the same

Salt and photoresist composition containing the same

Salt and photoresist composition containing the same

Salt and photoresist composition containing the same

Salt and photoresist composition containing the same

Salt and photoresist composition containing the same

Salt and photoresist composition containing the same

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND MET...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

PHOTORESIST COMPOSITION

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

PHOTORESIST COMPOSITION

PHOTORESIST COMPOSITION

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

PHOTORESIST COMPOSITION

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

METHOD FOR PRODUCING RESIST PATTERN

CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING...

POLARIZING FILM WITH ADHESIVE, OPTICAL LAMINATE, AND SET OF POLARIZ...