Masami Hayashida

Person

Atsugi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Illumination system and exposure apparatus having the same
- Patent number 5,848,119
- Issue date Dec 8, 1998
- Canon Kabushiki Kaisha
- Akira Miyake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic mask and exposure apparatus using the same
- Patent number 5,641,593
- Issue date Jun 24, 1997
- Canon Kabushiki Kaisha
- Yutaka Watanabe
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure apparatus and reflection type mask to be used in the same
- Patent number 5,549,994
- Issue date Aug 27, 1996
- Canon Kabushiki Kaisha
- Yutaka Watanabe
- B82 - NANO-TECHNOLOGY
Information Patent Grant
X-ray mirror, and x-ray exposure apparatus and device manufacturing...
- Patent number 5,461,657
- Issue date Oct 24, 1995
- Canon Kabushiki Kaisha
- Masami Hayashida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray lithography mask, light exposure apparatus and process therefore
- Patent number 5,444,753
- Issue date Aug 22, 1995
- Canon Kabushiki Kaisha
- Masami Hayashida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of and apparatus for stabilizing shapes of objects, such as...
- Patent number 5,390,228
- Issue date Feb 14, 1995
- Canon Kabushiki Kaisha
- Masahito Niibe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray exposure apparatus
- Patent number 5,335,259
- Issue date Aug 2, 1994
- Canon Kabushiki Kaisha
- Masami Hayashida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray microscope
- Patent number 5,204,887
- Issue date Apr 20, 1993
- Canon Kabushiki Kaisha
- Masami Hayashida
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus for cleaning an optical element for use with a radiation...
- Patent number 5,145,649
- Issue date Sep 8, 1992
- Canon Kabushiki Kaisha
- Takashi Iizuka
- B08 - CLEANING
Information Patent Grant
Reflection type mask
- Patent number 5,052,033
- Issue date Sep 24, 1991
- Canon Kabushiki Kaisha
- Tsutomu Ikeda
- B82 - NANO-TECHNOLOGY

Masami Hayashida

Person

Patents Grantslast 30 patents

Illumination system and exposure apparatus having the same

Lithographic mask and exposure apparatus using the same

Exposure apparatus and reflection type mask to be used in the same

X-ray mirror, and x-ray exposure apparatus and device manufacturing...

X-ray lithography mask, light exposure apparatus and process therefore

Method of and apparatus for stabilizing shapes of objects, such as...

X-ray exposure apparatus

X-ray microscope

Apparatus for cleaning an optical element for use with a radiation...

Reflection type mask