Masami OIKAWA

Person

Iwate, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Processing apparatus and cleaning processing method
- Patent number 12,017,261
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Tomoya Hasegawa
- B08 - CLEANING
Information Patent Grant
Cleaning method and processing apparatus
- Patent number 11,926,891
- Issue date Mar 12, 2024
- Tokyo Electron Limited
- Masami Oikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control device, processing apparatus, and control method
- Patent number 11,894,249
- Issue date Feb 6, 2024
- Tokyo Electron Limited
- Masami Oikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method and processing apparatus
- Patent number 11,745,231
- Issue date Sep 5, 2023
- Tokyo Electron Limited
- Masami Oikawa
- B08 - CLEANING
Information Patent Grant
Deposition method
- Patent number 11,538,678
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Masami Oikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method and processing apparatus
- Patent number 11,534,805
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Masami Oikawa
- B08 - CLEANING
Information Patent Grant
Film forming apparatus, control device, and pressure gauge adjustme...
- Patent number 11,486,041
- Issue date Nov 1, 2022
- Tokyo Electron Limited
- Masami Oikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing system, control device, and substrate processi...
- Patent number 10,256,162
- Issue date Apr 9, 2019
- Tokyo Electron Limited
- Masami Oikawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20240175127
- Publication date May 30, 2024
- TOKYO ELECTRON LIMITED
- Masami OIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230326762
- Publication date Oct 12, 2023
- TOKYO ELECTRON LIMITED
- Masami OIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING APPARATUS AND CLEANING PROCESSING METHOD
- Publication number 20230124143
- Publication date Apr 20, 2023
- TOKYO ELECTRON LIMITED
- Tomoya HASEGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230096299
- Publication date Mar 30, 2023
- TOKYO ELECTRON LIMITED
- Yuya TAKAMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD AND PROCESSING APPARATUS
- Publication number 20230047426
- Publication date Feb 16, 2023
- TOKYO ELECTRON LIMITED
- Masami OIKAWA
- B08 - CLEANING
Information Patent Application
CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220364228
- Publication date Nov 17, 2022
- Tokyo Electron Limited
- Yoshihiro TAKEZAWA
- B08 - CLEANING
Information Patent Application
CLEANING METHOD AND PROCESSING APPARATUS
- Publication number 20220223404
- Publication date Jul 14, 2022
- TOKYO ELECTRON LIMITED
- Masami OIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD AND PROCESSING APPARATUS
- Publication number 20220062958
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Masami OIKAWA
- B08 - CLEANING
Information Patent Application
DEPOSITION METHOD
- Publication number 20210193455
- Publication date Jun 24, 2021
- TOKYO ELECTRON LIMITED
- Masami OIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS, CONTROL DEVICE, AND PRESSURE GAUGE ADJUSTME...
- Publication number 20210115562
- Publication date Apr 22, 2021
- TOKYO ELECTRON LIMITED
- Masami OIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTROL DEVICE, PROCESSING APPARATUS, AND CONTROL METHOD
- Publication number 20210104421
- Publication date Apr 8, 2021
- TOKYO ELECTRON LIMITED
- Masami OIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus and Substrate Processing Method
- Publication number 20190309420
- Publication date Oct 10, 2019
- TOKYO ELECTRON LIMITED
- Masami OIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20190228992
- Publication date Jul 25, 2019
- TOKYO ELECTRON LIMITED
- Masami OIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, CONTROL DEVICE, AND SUBSTRATE PROCESSI...
- Publication number 20180254222
- Publication date Sep 6, 2018
- TOKYO ELECTRON LIMITED
- Masami Oikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film Forming Apparatus, Film Forming Method, and Computer-Readable...
- Publication number 20170233866
- Publication date Aug 17, 2017
- TOKYO ELECTRON LIMITED
- Masami OIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE HOLDER AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20160265107
- Publication date Sep 15, 2016
- TOKYO ELECTRON LIMITED
- Masami OIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Masami OIKAWA

Person

Patents Grantslast 30 patents

Processing apparatus and cleaning processing method

Cleaning method and processing apparatus

Control device, processing apparatus, and control method

Cleaning method and processing apparatus

Deposition method

Cleaning method and processing apparatus

Film forming apparatus, control device, and pressure gauge adjustme...

Substrate processing system, control device, and substrate processi...

Patents Applicationslast 30 patents

PROCESSING APPARATUS AND PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PROCESSING APPARATUS AND CLEANING PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

CLEANING METHOD AND PROCESSING APPARATUS

CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS

CLEANING METHOD AND PROCESSING APPARATUS

CLEANING METHOD AND PROCESSING APPARATUS

DEPOSITION METHOD

FILM FORMING APPARATUS, CONTROL DEVICE, AND PRESSURE GAUGE ADJUSTME...

CONTROL DEVICE, PROCESSING APPARATUS, AND CONTROL METHOD

Substrate Processing Apparatus and Substrate Processing Method

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING SYSTEM, CONTROL DEVICE, AND SUBSTRATE PROCESSI...

Film Forming Apparatus, Film Forming Method, and Computer-Readable...

SUBSTRATE HOLDER AND SUBSTRATE PROCESSING APPARATUS