Masami Tsukamoto

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Scintillator panel and radiation imaging apparatus
- Patent number 11,774,607
- Issue date Oct 3, 2023
- Canon Kabushiki Kaisha
- Taiji Tomita
- G01 - MEASURING TESTING
Information Patent Grant
Photoelectric conversion device, and equipment
- Patent number 11,069,729
- Issue date Jul 20, 2021
- Canon Kabushiki Kaisha
- Satoshi Yamabi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method for piezoelectric ceramics
- Patent number 9,842,985
- Issue date Dec 12, 2017
- Canon Kabushiki Kaisha
- Tatsuya Suzuki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Piezoelectric ceramics, manufacturing method therefor, piezoelectri...
- Patent number 9,231,188
- Issue date Jan 5, 2016
- Canon Kabushiki Kaisha
- Tatsuya Suzuki
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Laminate film and composite structure with imaged recording medium
- Patent number 7,425,363
- Issue date Sep 16, 2008
- Canon Kabushiki Kaisha
- Noboru Kunimine
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
X-ray illumination optical system and X-ray reduction exposure appa...
- Patent number 7,133,489
- Issue date Nov 7, 2006
- Canon Kabushiki Kaisha
- Akira Miyake
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reflection type mask
- Patent number 7,072,438
- Issue date Jul 4, 2006
- Canon Kabushiki Kaisha
- Keiko Chiba
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Contamination prevention in optical system
- Patent number 7,061,573
- Issue date Jun 13, 2006
- Canon Kabushiki Kaisha
- Masami Tsukamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray projection exposure apparatus and a device manufacturing method
- Patent number 6,836,531
- Issue date Dec 28, 2004
- Canon Kabushiki Kaisha
- Shinichi Hara
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
X-ray illumination optical system and X-ray reduction exposure appa...
- Patent number 6,834,098
- Issue date Dec 21, 2004
- Canon Kabushiki Kaisha
- Akira Miyake
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Exposure apparatus, and device manufacturing method
- Patent number 6,819,396
- Issue date Nov 16, 2004
- Canon Kabushiki Kaisha
- Masayuki Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laminating film and lamination process using the same
- Patent number 6,802,925
- Issue date Oct 12, 2004
- Canon Kabushiki Kaisha
- Masaya Kobayashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
X-ray mask, and exposure method and apparatus using the same
- Patent number 6,728,332
- Issue date Apr 27, 2004
- Canon Kabushiki Kaisha
- Keiko Chiba
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflection-type mask for use in pattern exposure, manufacturing met...
- Patent number 6,723,475
- Issue date Apr 20, 2004
- Canon Kabushiki Kaisha
- Masami Tsukamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
X-ray projection exposure apparatus and a device manufacturing method
- Patent number 6,668,037
- Issue date Dec 23, 2003
- Canon Kabushiki Kaisha
- Shinichi Hara
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Alignment mark detection method, and alignment method, exposure met...
- Patent number 6,642,528
- Issue date Nov 4, 2003
- Canon Kabushiki Kaisha
- Mitsuaki Amemiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X-ray projection exposure apparatus and a device manufacturing method
- Patent number 6,584,168
- Issue date Jun 24, 2003
- Canon Kabushiki Kaisha
- Shinichi Hara
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
X-ray illumination optical system and x-ray reduction exposure appa...
- Patent number 6,504,896
- Issue date Jan 7, 2003
- Canon Kabushiki Kaisha
- Akira Miyake
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Alignment mark detection method, and alignment method, exposure met...
- Patent number 6,331,709
- Issue date Dec 18, 2001
- Canon Kabushiki Kaisha
- Mitsuaki Amemiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray mask, and exposure method and apparatus using the same
- Patent number 6,317,479
- Issue date Nov 13, 2001
- Canon Kabushiki Kaisha
- Keiko Chiba
- B82 - NANO-TECHNOLOGY
Information Patent Grant
X-ray projection exposure apparatus and a device manufacturing method
- Patent number 6,310,934
- Issue date Oct 30, 2001
- Canon Kabushiki Kaisha
- Shinichi Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray projection exposure apparatus and a device manufacturing method
- Patent number 6,084,938
- Issue date Jul 4, 2000
- Canon Kabushiki Kaisha
- Shinichi Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray generating device, and exposure apparatus and semiconductor d...
- Patent number 6,038,279
- Issue date Mar 14, 2000
- Canon Kabushiki Kaisha
- Akira Miyake
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radiation reduction exposure apparatus and method of manufacturing...
- Patent number 6,014,421
- Issue date Jan 11, 2000
- Canon Kabushiki Kaisha
- Yuji Chiba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray reduction exposure apparatus and device manufacturing method...
- Patent number 5,995,582
- Issue date Nov 30, 1999
- Canon Kabushiki Kaisha
- Shigeru Terashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray optical apparatus and device fabrication method
- Patent number 5,896,438
- Issue date Apr 20, 1999
- Canon Kabushiki Kaisha
- Akira Miyake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflection type mask structure and exposure apparatus using the same
- Patent number 5,889,758
- Issue date Mar 30, 1999
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
SCINTILLATOR PANEL AND RADIATION IMAGING APPARATUS
- Publication number 20230046099
- Publication date Feb 16, 2023
- Canon Kabushiki Kaisha
- Taiji Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOELECTRIC CONVERSION DEVICE, AND EQUIPMENT
- Publication number 20190341409
- Publication date Nov 7, 2019
- Canon Kabushiki Kaisha
- Satoshi Yamabi
- G02 - OPTICS
Information Patent Application
MANUFACTURING METHOD FOR PIEZOELECTRIC CERAMICS
- Publication number 20160104833
- Publication date Apr 14, 2016
- Canon Kabushiki Kaisha
- Tatsuya Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL ELEMENT
- Publication number 20150131139
- Publication date May 14, 2015
- CANON KABUSHIKIK KAISHA
- Masami Tsukamoto
- G02 - OPTICS
Information Patent Application
PIEZOELECTRIC CERAMICS, MANUFACTURING METHOD THEREFOR, PIEZOELECTRI...
- Publication number 20130241347
- Publication date Sep 19, 2013
- Canon Kabushiki Kaisha
- Tatsuya Suzuki
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20090226849
- Publication date Sep 10, 2009
- Canon Kabushiki Kaisha
- Masami Tsukamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Laminate film and image protection method using the same
- Publication number 20060156940
- Publication date Jul 20, 2006
- Canon Kabushiki Kaisha
- Noboru Kunimine
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
X-ray illumination optical system and x-ray reduction exposure appa...
- Publication number 20050031072
- Publication date Feb 10, 2005
- Canon Kabushiki Kaisha
- Akira Miyake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflection type mask
- Publication number 20040125911
- Publication date Jul 1, 2004
- Canon Kabushiki Kaisha
- Keiko Chiba
- B82 - NANO-TECHNOLOGY
Information Patent Application
X-ray projection exposure apparatus and a device manufacturing method
- Publication number 20040071260
- Publication date Apr 15, 2004
- Canon Kabushiki Kaisha
- Shinichi Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Laminating film and lamination process using the same
- Publication number 20030049422
- Publication date Mar 13, 2003
- Canon Kabushiki Kaisha
- Masaya Kobayashi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
X-ray illumination optical system and X-ray reduction exposure appa...
- Publication number 20020110217
- Publication date Aug 15, 2002
- AKIRA MIYAKE
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
X-ray projection exposure apparatus and a device manufacturing method
- Publication number 20020101956
- Publication date Aug 1, 2002
- Shinichi Hara
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Alignment mark detection method, and alignment method, exposure met...
- Publication number 20020079462
- Publication date Jun 27, 2002
- Mitsuaki Amemiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
X-ray mask, and exposure method and apparatus using the same
- Publication number 20020021781
- Publication date Feb 21, 2002
- Keiko Chiba
- B82 - NANO-TECHNOLOGY
Information Patent Application
X-ray projection exposure apparatus and a device manufacturing method
- Publication number 20020006180
- Publication date Jan 17, 2002
- Shinichi Hara
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
X-RAY ILLUMINATION OPTICAL SYSTEM AND X-RAY REDUCTION EXPOSURE APPA...
- Publication number 20020003855
- Publication date Jan 10, 2002
- AKIRA MIYAKE
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Contamination prevention in optical system
- Publication number 20020000519
- Publication date Jan 3, 2002
- Masami Tsukamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflection-type mask for use in pattern exposure, manufacturing met...
- Publication number 20010038953
- Publication date Nov 8, 2001
- Masami Tsukamoto
- B82 - NANO-TECHNOLOGY

Masami Tsukamoto

Person

Patents Grantslast 30 patents

Scintillator panel and radiation imaging apparatus

Photoelectric conversion device, and equipment

Manufacturing method for piezoelectric ceramics

Piezoelectric ceramics, manufacturing method therefor, piezoelectri...

Laminate film and composite structure with imaged recording medium

X-ray illumination optical system and X-ray reduction exposure appa...

Reflection type mask

Contamination prevention in optical system

X-ray projection exposure apparatus and a device manufacturing method

X-ray illumination optical system and X-ray reduction exposure appa...

Exposure apparatus, and device manufacturing method

Laminating film and lamination process using the same

X-ray mask, and exposure method and apparatus using the same

Reflection-type mask for use in pattern exposure, manufacturing met...

X-ray projection exposure apparatus and a device manufacturing method

Alignment mark detection method, and alignment method, exposure met...

X-ray projection exposure apparatus and a device manufacturing method

X-ray illumination optical system and x-ray reduction exposure appa...

Alignment mark detection method, and alignment method, exposure met...

X-ray mask, and exposure method and apparatus using the same

X-ray projection exposure apparatus and a device manufacturing method

X-ray projection exposure apparatus and a device manufacturing method

X-ray generating device, and exposure apparatus and semiconductor d...

Radiation reduction exposure apparatus and method of manufacturing...

X-ray reduction exposure apparatus and device manufacturing method...

X-ray optical apparatus and device fabrication method

Reflection type mask structure and exposure apparatus using the same

Patents Applicationslast 30 patents

SCINTILLATOR PANEL AND RADIATION IMAGING APPARATUS

PHOTOELECTRIC CONVERSION DEVICE, AND EQUIPMENT

MANUFACTURING METHOD FOR PIEZOELECTRIC CERAMICS

OPTICAL ELEMENT

PIEZOELECTRIC CERAMICS, MANUFACTURING METHOD THEREFOR, PIEZOELECTRI...

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

Laminate film and image protection method using the same

X-ray illumination optical system and x-ray reduction exposure appa...

Reflection type mask

X-ray projection exposure apparatus and a device manufacturing method

Laminating film and lamination process using the same

X-ray illumination optical system and X-ray reduction exposure appa...

X-ray projection exposure apparatus and a device manufacturing method

Alignment mark detection method, and alignment method, exposure met...

X-ray mask, and exposure method and apparatus using the same

X-ray projection exposure apparatus and a device manufacturing method

X-RAY ILLUMINATION OPTICAL SYSTEM AND X-RAY REDUCTION EXPOSURE APPA...

Contamination prevention in optical system

Reflection-type mask for use in pattern exposure, manufacturing met...