Masamichi Hayakawa

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Chiba, JP

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Patents Grantslast 30 patents

Information Patent Grant
Metal-containing onium salt compound, photodegradable base, resist...
- Patent number 11,347,147
- Issue date May 31, 2022
- Toyo Gosei Co., Ltd.
- Michiya Naito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive compound, photoacid generator and resist composition...
- Patent number 11,048,166
- Issue date Jun 29, 2021
- Toyo Gosei Co., Ltd.
- Michiya Naito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin, and photosensitive composition
- Patent number 7,858,287
- Issue date Dec 28, 2010
- Hyogo Prefecture
- Takeo Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing 1,2-naphthoquinonediazide photosensitive agent
- Patent number 6,448,383
- Issue date Sep 10, 2002
- Toyo Gosei Kogyo Co., Ltd.
- Tomotaka Yamanaka
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE COMPOUND, PHOTOACID GENERATOR AND RESIST COMPOSITION...
- Publication number 20190243238
- Publication date Aug 8, 2019
- TOYO GOSEI CO., LTD.
- Michiya NAITO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METAL-CONTAINING ONIUM SALT COMPOUND, PHOTODEGRADABLE BASE, RESIST...
- Publication number 20190243243
- Publication date Aug 8, 2019
- TOYO GOSEI CO., LTD.
- Michiya NAITO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE RESIN, AND PHOTOSENSITIVE COMPOSITION
- Publication number 20090142697
- Publication date Jun 4, 2009
- Takeo Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing 1,2-naphthoquinonediazide photosensitive agent
- Publication number 20010049433
- Publication date Dec 6, 2001
- Tomotaka Yamanaka
- C07 - ORGANIC CHEMISTRY