Masamichi Nishimura

Person

Himeji-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Monomer having N-acyl carbamoyl group and lactone skeleton, and pol...
- Patent number 9,862,695
- Issue date Jan 9, 2018
- Daicel Corporation
- Hiroshi Koyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer compound, resin composition for photoresists, and method fo...
- Patent number 9,261,785
- Issue date Feb 16, 2016
- Daicel Corporation
- Masamichi Nishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing resin solution for photoresist, photoresist co...
- Patent number 8,753,793
- Issue date Jun 17, 2014
- Daicel Chemical Industries, Ltd.
- Akira Eguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polycyclic ester containing cyano group and lactone skeleton
- Patent number 8,236,971
- Issue date Aug 7, 2012
- Daicel Chemical Industries, Ltd.
- Keizo Inoue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polycyclic ester containing cyano group and lactone skeleton
- Patent number 7,834,114
- Issue date Nov 16, 2010
- Daicel Chemical Industries, Ltd.
- Keizo Inoue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polycyclic ester containing cyano group and lactone skeleton
- Patent number 7,750,101
- Issue date Jul 6, 2010
- Daicel Chemical Industries, Ltd.
- Keizo Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist polymeric compound and photoresist resin composition
- Patent number 7,033,726
- Issue date Apr 25, 2006
- Daicel Chemical Industries, Ltd.
- Masamichi Nishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
MONOMER HAVING N-ACYL CARBAMOYL GROUP AND LACTONE SKELETON, AND POL...
- Publication number 20160060374
- Publication date Mar 3, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroshi KOYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER COMPOUND, RESIN COMPOSITION FOR PHOTORESISTS, AND METHOD FO...
- Publication number 20150168831
- Publication date Jun 18, 2015
- DAICEL CORPORATION
- Masamichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING POLYMER COMPOUND, POLYMER COMPOUND, AND PHOTOR...
- Publication number 20150147696
- Publication date May 28, 2015
- DAICEL CORPORATION
- Akira Eguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING RESIN SOLUTION FOR PHOTORESIST, PHOTORESIST CO...
- Publication number 20110244394
- Publication date Oct 6, 2011
- Daicel Chemical Industries, Ltd.
- Akira Eguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYCYCLIC ESTER CONTAINING CYANO GROUP AND LACTONE SKELETON
- Publication number 20110028743
- Publication date Feb 3, 2011
- Keizo Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYCYCLIC ESTER CONTAINING CYANO GROUP AND LACTONE SKELETON
- Publication number 20100081778
- Publication date Apr 1, 2010
- Keizo Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polycyclic Ester Containing Cyano Group and Lactone Skeleton
- Publication number 20080319160
- Publication date Dec 25, 2008
- Keizo Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresist polymeric compound and photoresist resin composition
- Publication number 20050014087
- Publication date Jan 20, 2005
- Masamichi Nishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Masamichi Nishimura

Person

Patents Grantslast 30 patents

Monomer having N-acyl carbamoyl group and lactone skeleton, and pol...

Polymer compound, resin composition for photoresists, and method fo...

Method for producing resin solution for photoresist, photoresist co...

Polycyclic ester containing cyano group and lactone skeleton

Polycyclic ester containing cyano group and lactone skeleton

Polycyclic ester containing cyano group and lactone skeleton

Photoresist polymeric compound and photoresist resin composition

Patents Applicationslast 30 patents

MONOMER HAVING N-ACYL CARBAMOYL GROUP AND LACTONE SKELETON, AND POL...

POLYMER COMPOUND, RESIN COMPOSITION FOR PHOTORESISTS, AND METHOD FO...

METHOD FOR PRODUCING POLYMER COMPOUND, POLYMER COMPOUND, AND PHOTOR...

METHOD FOR PRODUCING RESIN SOLUTION FOR PHOTORESIST, PHOTORESIST CO...

POLYCYCLIC ESTER CONTAINING CYANO GROUP AND LACTONE SKELETON

POLYCYCLIC ESTER CONTAINING CYANO GROUP AND LACTONE SKELETON

Polycyclic Ester Containing Cyano Group and Lactone Skeleton

Photoresist polymeric compound and photoresist resin composition