Masamichi Sakaguchi

Person

Kudamatsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method
- Patent number 8,486,291
- Issue date Jul 16, 2013
- Hitachi High-Technologies Corporation
- Takeshi Ohmori
- B08 - CLEANING
Information Patent Grant
Plasma processing method
- Patent number 8,277,563
- Issue date Oct 2, 2012
- Hitachi High-Technologies Corporation
- Masunori Ishihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing method
- Patent number 8,262,801
- Issue date Sep 11, 2012
- Hitachi High-Technologies Corporation
- Ken Kitaoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,216,420
- Issue date Jul 10, 2012
- Hitachi High-Technologies Corporation
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 8,143,175
- Issue date Mar 27, 2012
- Hitachi High-Technologies Corporation
- Satoshi Une
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and vacuum processing method
- Patent number 7,913,646
- Issue date Mar 29, 2011
- Hitachi High-Technologies Corporation
- Ken Kitaoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method
- Patent number 7,909,933
- Issue date Mar 22, 2011
- Hitachi High-Technologies Corporation
- Masunori Ishihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for working the surface of semiconductor d...
- Patent number 7,098,138
- Issue date Aug 29, 2006
- Hitachi, Ltd.
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
LSI device etching method and apparatus thereof
- Patent number 6,919,274
- Issue date Jul 19, 2005
- Hitachi High-Technologies Corporation
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 6,709,984
- Issue date Mar 23, 2004
- Hitachi High-Technologies Corporation
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 6,620,737
- Issue date Sep 16, 2003
- Hitachi, Ltd.
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for working the surface of semiconductor d...
- Patent number 6,617,255
- Issue date Sep 9, 2003
- Hitachi, Ltd.
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20120125890
- Publication date May 24, 2012
- Hitachi High-Technologies Corporation
- Takeshi OHMORI
- B08 - CLEANING
Information Patent Application
DRY ETCHING METHOD OF HIGH-K FILM
- Publication number 20110171833
- Publication date Jul 14, 2011
- Koichi NAKAUNE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20110120495
- Publication date May 26, 2011
- Masunori Ishihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum Processing Method
- Publication number 20100300483
- Publication date Dec 2, 2010
- Ken Kitaoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR SEASONING PLASMA PROCESSING APPARATUS, AND METHOD FOR DE...
- Publication number 20100178415
- Publication date Jul 15, 2010
- Hitachi High-Technologies Corporation
- Yasuhiro NISHIMORI
- B08 - CLEANING
Information Patent Application
VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD
- Publication number 20090288684
- Publication date Nov 26, 2009
- Hitachi High-Technologies Corporation
- Ken Kitaoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRY ETCHING METHOD
- Publication number 20090280651
- Publication date Nov 12, 2009
- Satoshi Une
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20090214401
- Publication date Aug 27, 2009
- Masunori Ishihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD FOR ETCHING SAMPLE
- Publication number 20090081872
- Publication date Mar 26, 2009
- Hitoshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING METHOD OF HIGH-K FILM
- Publication number 20090065479
- Publication date Mar 12, 2009
- Koichi NAKAUNE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Method
- Publication number 20080216865
- Publication date Sep 11, 2008
- Masunori Ishihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PROCESSING APPARATUS
- Publication number 20080112780
- Publication date May 15, 2008
- KATSUJI MATANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry etching method
- Publication number 20070218696
- Publication date Sep 20, 2007
- Kenichi Kuwabara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry etching method
- Publication number 20070207618
- Publication date Sep 6, 2007
- Satoshi Une
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20060283550
- Publication date Dec 21, 2006
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method for working the surface of semiconductor d...
- Publication number 20060048892
- Publication date Mar 9, 2006
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LSI device etching method and apparatus thereof
- Publication number 20050026431
- Publication date Feb 3, 2005
- Hitachi High-Technologies Corporation
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method for working the surface of semiconductor d...
- Publication number 20040175940
- Publication date Sep 9, 2004
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor device
- Publication number 20040048477
- Publication date Mar 11, 2004
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20040033695
- Publication date Feb 19, 2004
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching method
- Publication number 20030022512
- Publication date Jan 30, 2003
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method for working the surface of semiconductor d...
- Publication number 20010055885
- Publication date Dec 27, 2001
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS

Masamichi Sakaguchi

Person

Patents Grantslast 30 patents

Plasma processing method

Plasma processing method

Vacuum processing method

Plasma processing apparatus

Dry etching method

Vacuum processing apparatus and vacuum processing method

Plasma processing method

Plasma processing method for working the surface of semiconductor d...

LSI device etching method and apparatus thereof

Method for manufacturing semiconductor device

Plasma etching method

Plasma processing method for working the surface of semiconductor d...

Patents Applicationslast 30 patents

PLASMA PROCESSING METHOD

DRY ETCHING METHOD OF HIGH-K FILM

PLASMA PROCESSING METHOD

Vacuum Processing Method

METHOD FOR SEASONING PLASMA PROCESSING APPARATUS, AND METHOD FOR DE...

VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD

DRY ETCHING METHOD

PLASMA PROCESSING METHOD

PLASMA ETCHING METHOD FOR ETCHING SAMPLE

DRY ETCHING METHOD OF HIGH-K FILM

Plasma Processing Method

VACUUM PROCESSING APPARATUS

Dry etching method

Dry etching method

Plasma processing apparatus

Plasma processing method for working the surface of semiconductor d...

LSI device etching method and apparatus thereof

Plasma processing method for working the surface of semiconductor d...

Method for manufacturing semiconductor device

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Plasma etching method

Plasma processing method for working the surface of semiconductor d...