Masamitsu ITOH

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reticle chuck cleaner and reticle chuck cleaning method
- Patent number 9,808,841
- Issue date Nov 7, 2017
- TOSHIBA MEMORY CORPORATION
- Yoshihito Kobayashi
- B08 - CLEANING
Information Patent Grant
Imprint mask, method for manufacturing the same, and method for man...
- Patent number 9,412,592
- Issue date Aug 9, 2016
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Template substrate, method for manufacturing same, and template
- Patent number 9,377,682
- Issue date Jun 28, 2016
- Kabushiki Kaisha Toshiba
- Shingo Kanamitsu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reticle chuck cleaner
- Patent number 9,034,467
- Issue date May 19, 2015
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B08 - CLEANING
Information Patent Grant
Exposure mask and method for manufacturing same and method for manu...
- Patent number 8,771,905
- Issue date Jul 8, 2014
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Imprint mask, method for manufacturing the same, and method for man...
- Patent number 8,758,005
- Issue date Jun 24, 2014
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask inspection apparatus and mask inspection method
- Patent number 8,669,522
- Issue date Mar 11, 2014
- Kabushiki Kaisha Toshiba
- Shinji Yamaguchi
- G01 - MEASURING TESTING
Information Patent Grant
Mask manufacturing method for nanoimprinting
- Patent number 8,658,537
- Issue date Feb 25, 2014
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask manufacturing device
- Patent number 8,653,483
- Issue date Feb 18, 2014
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photomask manufacturing method and semiconductor device manufacturi...
- Patent number 8,584,054
- Issue date Nov 12, 2013
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure mask manufacturing method, drawing apparatus, semiconducto...
- Patent number 8,533,634
- Issue date Sep 10, 2013
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask manufacturing device
- Patent number 8,502,171
- Issue date Aug 6, 2013
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Manufacturing method for exposure mask, generating method for mask...
- Patent number 8,465,907
- Issue date Jun 18, 2013
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern verification-test method, optical image intensity distribut...
- Patent number 8,407,629
- Issue date Mar 26, 2013
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask manufacturing method and semiconductor device manufacturi...
- Patent number 8,407,628
- Issue date Mar 26, 2013
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate surface inspection method and inspection apparatus
- Patent number 8,274,047
- Issue date Sep 25, 2012
- Ebara Corporation
- Yoshihiko Naito
- G01 - MEASURING TESTING
Information Patent Grant
Template inspection method and manufacturing method for semiconduct...
- Patent number 8,227,267
- Issue date Jul 24, 2012
- Kabushiki Kaisha Toshiba
- Ikuo Yoneda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Manufacturing method for exposure mask, generating method for mask...
- Patent number 8,222,051
- Issue date Jul 17, 2012
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Exposure mask and method for manufacturing same and method for manu...
- Patent number 8,216,744
- Issue date Jul 10, 2012
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern verification-test method, optical image intensity distribut...
- Patent number 8,219,942
- Issue date Jul 10, 2012
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure mask manufacturing method, drawing apparatus, semiconducto...
- Patent number 8,193,100
- Issue date Jun 5, 2012
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask evaluation based on lithographic simulation using sidewal...
- Patent number 8,189,903
- Issue date May 29, 2012
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask pattern verifying method
- Patent number 8,121,387
- Issue date Feb 21, 2012
- Kabushiki Kaisha Toshiba
- Mitsuyo Asano
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Imprint mask manufacturing method for nanoimprinting
- Patent number 8,097,539
- Issue date Jan 17, 2012
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask and manufacturing method for reflective mask
- Patent number 8,071,263
- Issue date Dec 6, 2011
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for processing a substrate
- Patent number 8,025,732
- Issue date Sep 27, 2011
- Kabushiki Kaisha Toshiba
- Hideaki Sakurai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Maunfacturing method for exposure mask, generating method for mask...
- Patent number 7,998,759
- Issue date Aug 16, 2011
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask unit, exposing method and method for manufacturing semico...
- Patent number 7,960,075
- Issue date Jun 14, 2011
- Kabushiki Kaisha Toshiba
- Satoshi Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of evaluating a photo mask and method of manufacturing a sem...
- Patent number 7,912,275
- Issue date Mar 22, 2011
- Kabushiki Kaisha Toshiba
- Hiroki Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask manufacturing method and semiconductor device manufacturi...
- Patent number 7,906,257
- Issue date Mar 15, 2011
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
RETICLE CHUCK CLEANER
- Publication number 20150190851
- Publication date Jul 9, 2015
- Kabushiki Kaisha Toshiba
- Masamitsu ITOH
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
RETICLE CHUCK CLEANER AND RETICLE CHUCK CLEANING METHOD
- Publication number 20140326278
- Publication date Nov 6, 2014
- Kabushiki Kaisha Toshiba
- Yoshihito Kobayashi
- B08 - CLEANING
Information Patent Application
IMPRINT MASK, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MAN...
- Publication number 20140256158
- Publication date Sep 11, 2014
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Application
PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURI...
- Publication number 20130179846
- Publication date Jul 11, 2013
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Mask Manufacturing Device
- Publication number 20130153791
- Publication date Jun 20, 2013
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask Manufacturing Device
- Publication number 20130157473
- Publication date Jun 20, 2013
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Application
TEMPLATE SUBSTRATE AND METHOD FOR MANUFACTURING SAME
- Publication number 20130001753
- Publication date Jan 3, 2013
- Shingo Kanamitsu
- B82 - NANO-TECHNOLOGY
Information Patent Application
MANUFACTURING METHOD FOR EXPOSURE MASK, GENERATING METHOD FOR MASK...
- Publication number 20120264067
- Publication date Oct 18, 2012
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN VERIFICATION-TEST METHOD, OPTICAL IMAGE INTENSITY DISTRIBUT...
- Publication number 20120250011
- Publication date Oct 4, 2012
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE MASK AND METHOD FOR MANUFACTURING SAME AND METHOD FOR MANU...
- Publication number 20120244714
- Publication date Sep 27, 2012
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Application
MASK INSPECTION APPARATUS AND MASK INSPECTION METHOD
- Publication number 20120241645
- Publication date Sep 27, 2012
- Shinji YAMAGUCHI
- G01 - MEASURING TESTING
Information Patent Application
IMPRINT MASK MANUFACTURING METHOD, IMPRINT MASK MANUFACTURING DEVIC...
- Publication number 20120091370
- Publication date Apr 19, 2012
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
REFLECTIVE MASK, MANUFACTURING METHOD FOR REFLECTIVE MASK, AND MANU...
- Publication number 20120040293
- Publication date Feb 16, 2012
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE CHUCK CLEANER
- Publication number 20120024318
- Publication date Feb 2, 2012
- Masamitsu ITOH
- B08 - CLEANING
Information Patent Application
IMPRINT MASK, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MAN...
- Publication number 20110290134
- Publication date Dec 1, 2011
- Masamitsu ITOH
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
MANUFACTURING METHOD FOR EXPOSURE MASK, GENERATING METHOD FOR MASK...
- Publication number 20110262848
- Publication date Oct 27, 2011
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING METHOD, PATTERNING APPARATUS, AND METHOD FOR MANUFACTURI...
- Publication number 20100276290
- Publication date Nov 4, 2010
- Masamitsu ITOH
- B82 - NANO-TECHNOLOGY
Information Patent Application
Exposure mask manufacturing method, drawing apparatus, semiconducto...
- Publication number 20100228379
- Publication date Sep 9, 2010
- KABUSIKI KAISHA TOSHIBA
- Masamitsu Itoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURI...
- Publication number 20100209829
- Publication date Aug 19, 2010
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXPOSURE MASK AND METHOD FOR MANUFACTURING SAME AND METHOD FOR MANU...
- Publication number 20100203432
- Publication date Aug 12, 2010
- Masamitsu ITOH
- B82 - NANO-TECHNOLOGY
Information Patent Application
TEMPLATE INSPECTION METHOD AND MANUFACTURING METHOD FOR SEMICONDUCT...
- Publication number 20100075443
- Publication date Mar 25, 2010
- Ikuo YONEDA
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE SURFACE INSPECTION METHOD AND INSPECTION APPARATUS
- Publication number 20100032566
- Publication date Feb 11, 2010
- EBARA CORPORATION
- Yoshihiko Naito
- G01 - MEASURING TESTING
Information Patent Application
REFLECTIVE MASK, MANUFACTURING METHOD FOR REFLECTIVE MASK, AND MANU...
- Publication number 20100021826
- Publication date Jan 28, 2010
- Ryoichi INANAMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT MASK MANUFACTURING METHOD, IMPRINT MASK MANUFACTURING DEVIC...
- Publication number 20100003830
- Publication date Jan 7, 2010
- Masamitsu Itoh
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PATTERN VERIFICATION-TEST METHOD, OPTICAL IMAGE INTENSITY DISTRIBUT...
- Publication number 20090317732
- Publication date Dec 24, 2009
- Masamitsu ITOH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND MASK MANUFACTURING METHOD
- Publication number 20090305153
- Publication date Dec 10, 2009
- Hideaki Sakurai
- B08 - CLEANING
Information Patent Application
DEVICE AND METHOD FOR OBTAINING EXPOSURE CORRECTION INFORMATION, AN...
- Publication number 20090233189
- Publication date Sep 17, 2009
- Kazuya FUKUHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE MASK MANUFACTURING METHOD, DRAWING APPARATUS, SEMICONDUCTO...
- Publication number 20090227112
- Publication date Sep 10, 2009
- Kabushiki Kaisha Toshiba
- MASAMITSU ITOH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF EVALUATING A PHOTO MASK AND METHOD OF MANUFACTURING A SEM...
- Publication number 20090202924
- Publication date Aug 13, 2009
- Hiroki YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Maunfacturing method for exposure mask, generating method for mask...
- Publication number 20090035880
- Publication date Feb 5, 2009
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masamitsu ITOH

Person

Patents Grantslast 30 patents

Reticle chuck cleaner and reticle chuck cleaning method

Imprint mask, method for manufacturing the same, and method for man...

Template substrate, method for manufacturing same, and template

Reticle chuck cleaner

Exposure mask and method for manufacturing same and method for manu...

Imprint mask, method for manufacturing the same, and method for man...

Mask inspection apparatus and mask inspection method

Mask manufacturing method for nanoimprinting

Mask manufacturing device

Photomask manufacturing method and semiconductor device manufacturi...

Exposure mask manufacturing method, drawing apparatus, semiconducto...

Mask manufacturing device

Manufacturing method for exposure mask, generating method for mask...

Pattern verification-test method, optical image intensity distribut...

Photomask manufacturing method and semiconductor device manufacturi...

Substrate surface inspection method and inspection apparatus

Template inspection method and manufacturing method for semiconduct...

Manufacturing method for exposure mask, generating method for mask...

Exposure mask and method for manufacturing same and method for manu...

Pattern verification-test method, optical image intensity distribut...

Exposure mask manufacturing method, drawing apparatus, semiconducto...

Photomask evaluation based on lithographic simulation using sidewal...

Mask pattern verifying method

Imprint mask manufacturing method for nanoimprinting

Reflective mask and manufacturing method for reflective mask

Apparatus for processing a substrate

Maunfacturing method for exposure mask, generating method for mask...

Photomask unit, exposing method and method for manufacturing semico...

Method of evaluating a photo mask and method of manufacturing a sem...

Photomask manufacturing method and semiconductor device manufacturi...

Patents Applicationslast 30 patents

RETICLE CHUCK CLEANER

RETICLE CHUCK CLEANER AND RETICLE CHUCK CLEANING METHOD

IMPRINT MASK, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MAN...

PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURI...

Mask Manufacturing Device

Mask Manufacturing Device

TEMPLATE SUBSTRATE AND METHOD FOR MANUFACTURING SAME

MANUFACTURING METHOD FOR EXPOSURE MASK, GENERATING METHOD FOR MASK...

PATTERN VERIFICATION-TEST METHOD, OPTICAL IMAGE INTENSITY DISTRIBUT...

EXPOSURE MASK AND METHOD FOR MANUFACTURING SAME AND METHOD FOR MANU...

MASK INSPECTION APPARATUS AND MASK INSPECTION METHOD

IMPRINT MASK MANUFACTURING METHOD, IMPRINT MASK MANUFACTURING DEVIC...

REFLECTIVE MASK, MANUFACTURING METHOD FOR REFLECTIVE MASK, AND MANU...

RETICLE CHUCK CLEANER

IMPRINT MASK, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MAN...

MANUFACTURING METHOD FOR EXPOSURE MASK, GENERATING METHOD FOR MASK...

PATTERNING METHOD, PATTERNING APPARATUS, AND METHOD FOR MANUFACTURI...

Exposure mask manufacturing method, drawing apparatus, semiconducto...

PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURI...

EXPOSURE MASK AND METHOD FOR MANUFACTURING SAME AND METHOD FOR MANU...

TEMPLATE INSPECTION METHOD AND MANUFACTURING METHOD FOR SEMICONDUCT...

SUBSTRATE SURFACE INSPECTION METHOD AND INSPECTION APPARATUS

REFLECTIVE MASK, MANUFACTURING METHOD FOR REFLECTIVE MASK, AND MANU...

IMPRINT MASK MANUFACTURING METHOD, IMPRINT MASK MANUFACTURING DEVIC...

PATTERN VERIFICATION-TEST METHOD, OPTICAL IMAGE INTENSITY DISTRIBUT...

SUBSTRATE PROCESSING METHOD AND MASK MANUFACTURING METHOD

DEVICE AND METHOD FOR OBTAINING EXPOSURE CORRECTION INFORMATION, AN...

EXPOSURE MASK MANUFACTURING METHOD, DRAWING APPARATUS, SEMICONDUCTO...

METHOD OF EVALUATING A PHOTO MASK AND METHOD OF MANUFACTURING A SEM...

Maunfacturing method for exposure mask, generating method for mask...