Masanobu Matsunaga

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Vertical film formation apparatus and method for using same
- Patent number 8,563,096
- Issue date Oct 22, 2013
- Tokyo Electron Limited
- Masanobu Matsunaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature deposition of silicon-containing films
- Patent number 8,298,628
- Issue date Oct 30, 2012
- Air Products and Chemicals, Inc.
- Liu Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method in vertical batch CVD apparatus
- Patent number 8,257,789
- Issue date Sep 4, 2012
- Tokyo Electron Limited
- Masanobu Matsunaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method and apparatus
- Patent number 8,216,648
- Issue date Jul 10, 2012
- Tokyo Electron Limited
- Masanobu Matsunaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method and apparatus for semiconductor process
- Patent number 8,178,448
- Issue date May 15, 2012
- Tokyo Electron Limited
- Nobutake Nodera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation apparatus and method for using same
- Patent number 8,080,477
- Issue date Dec 20, 2011
- Tokyo Electron Limited
- Nobutake Nodera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method and apparatus for semiconductor process
- Patent number 8,080,290
- Issue date Dec 20, 2011
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230146375
- Publication date May 11, 2023
- Tokyo Electron Limited
- Hiroki MURAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICAL HEAT TREATMENT APPARATUS AND METHOD OF OPERATING VERTICAL...
- Publication number 20150376789
- Publication date Dec 31, 2015
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film Forming Apparatus Using Gas Nozzles
- Publication number 20150275368
- Publication date Oct 1, 2015
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL HEAT TREATMENT APPARATUS, METHOD OF OPERATING VERTICAL HEA...
- Publication number 20150259799
- Publication date Sep 17, 2015
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low Temperature Deposition of Silicon-Containing Films
- Publication number 20130189853
- Publication date Jul 25, 2013
- TOKYO ELECTRON LIMITED
- Liu Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING NITRIDE FILM
- Publication number 20120164848
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Motoki FUJII
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL FILM FORMATION APPARATUS AND METHOD FOR USING SAME
- Publication number 20110129618
- Publication date Jun 2, 2011
- TOKYO ELECTRON LIMITED
- Masanobu MATSUNAGA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION METHOD AND APPARATUS
- Publication number 20110129619
- Publication date Jun 2, 2011
- TOKYO ELECTRON LIMITED
- Masanobu Matsunaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low Temperature Deposition of Silicon-Containing Films
- Publication number 20100304047
- Publication date Dec 2, 2010
- Air Products and Chemicals, Inc.
- Liu Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESS
- Publication number 20100304574
- Publication date Dec 2, 2010
- TOKYO ELECTRON LIMITED
- Nobutake NODERA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION METHOD IN VERTICAL BATCH CVD APPARATUS
- Publication number 20100136260
- Publication date Jun 3, 2010
- TOKYO ELECTRON LIMITED
- Masanobu Matsunaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation method and apparatus for semiconductor process
- Publication number 20090191722
- Publication date Jul 30, 2009
- TOKYO ELECTRON LIMITED
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vertical plasma processing apparatus and method for using same
- Publication number 20090124087
- Publication date May 14, 2009
- Nobutake Nodera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation apparatus and method for using same
- Publication number 20090117743
- Publication date May 7, 2009
- Nobutake Nodera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation method and apparatus for semiconductor process
- Publication number 20080311760
- Publication date Dec 18, 2008
- Nobutake Nodera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Masanobu Matsunaga

Person

Patents Grantslast 30 patents

Vertical film formation apparatus and method for using same

Low temperature deposition of silicon-containing films

Film formation method in vertical batch CVD apparatus

Film formation method and apparatus

Film formation method and apparatus for semiconductor process

Film formation apparatus and method for using same

Film formation method and apparatus for semiconductor process

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

VERTICAL HEAT TREATMENT APPARATUS AND METHOD OF OPERATING VERTICAL...

Film Forming Apparatus Using Gas Nozzles

VERTICAL HEAT TREATMENT APPARATUS, METHOD OF OPERATING VERTICAL HEA...

Low Temperature Deposition of Silicon-Containing Films

METHOD FOR FORMING NITRIDE FILM

VERTICAL FILM FORMATION APPARATUS AND METHOD FOR USING SAME

FILM FORMATION METHOD AND APPARATUS

Low Temperature Deposition of Silicon-Containing Films

FILM FORMATION METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESS

FILM FORMATION METHOD IN VERTICAL BATCH CVD APPARATUS

Film formation method and apparatus for semiconductor process

Vertical plasma processing apparatus and method for using same

Film formation apparatus and method for using same

Film formation method and apparatus for semiconductor process