Masanori HOSOYA

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 12,014,930
- Issue date Jun 18, 2024
- Tokyo Electron Limited
- Mitsuhiro Iwano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching and apparatus for plasma processing
- Patent number 11,955,342
- Issue date Apr 9, 2024
- Tokyo Electron Limited
- Masanori Hosoya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching and plasma processing apparatus
- Patent number 11,710,643
- Issue date Jul 25, 2023
- Tokyo Electron Limited
- Mitsuhiro Iwano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 11,710,644
- Issue date Jul 25, 2023
- Tokyo Electron Limited
- Takahiro Yokoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,957,515
- Issue date Mar 23, 2021
- Tokyo Electron Limited
- Masanori Hosoya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 10,734,205
- Issue date Aug 4, 2020
- Tokyo Electron Limited
- Mitsuhiro Iwano
- B08 - CLEANING
Information Patent Grant
Etching method
- Patent number 10,529,583
- Issue date Jan 7, 2020
- Tokyo Electron Limited
- Mitsuhiro Iwano
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240290625
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Mitsuhiro Iwano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220102159
- Publication date Mar 31, 2022
- TOKYO ELECTRON LIMITED
- Takahiro YOKOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210366718
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Mitsuhiro Iwano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING AND PLASMA PROCESSING APPARATUS
- Publication number 20210335623
- Publication date Oct 28, 2021
- TOKYO ELECTRON LIMITED
- Mitsuhiro Iwano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING AND APPARATUS FOR PLASMA PROCESSING
- Publication number 20210296134
- Publication date Sep 23, 2021
- TOKYO ELECTRON LIMITED
- Masanori Hosoya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200135436
- Publication date Apr 30, 2020
- TOKYO ELECTRON LIMITED
- Mitsuhiro IWANO
- B08 - CLEANING
Information Patent Application
ETCHING METHOD
- Publication number 20190139780
- Publication date May 9, 2019
- TOKYO ELECTRON LIMITED
- Mitsuhiro Iwano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20180233331
- Publication date Aug 16, 2018
- TOKYO ELECTRON LIMITED
- Masanori HOSOYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Masanori HOSOYA

Person

Patents Grantslast 30 patents

Etching method and plasma processing apparatus

Method of etching and apparatus for plasma processing

Method of etching and plasma processing apparatus

Etching method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Cleaning method and plasma processing apparatus

Etching method

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

METHOD OF ETCHING AND PLASMA PROCESSING APPARATUS

METHOD OF ETCHING AND APPARATUS FOR PLASMA PROCESSING

CLEANING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS