Masanori Miyabe

Person

Fujisawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive-working photoresist containing o-naphthoquinone diazide su...
- Patent number 5,281,508
- Issue date Jan 25, 1994
- Tokyo Ohka Kogyo Co., Ltd.
- Hidekatsu Kohara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Electron beam-curable resist composition and method for fine patter...
- Patent number 5,180,653
- Issue date Jan 19, 1993
- Tokyo Ohka Kogyo Co., Ltd.
- Masanori Miyabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Electron beam-curable resist composition and method for fine patter...
- Patent number 5,057,397
- Issue date Oct 15, 1991
- Tokyo Ohka Kogyo Co., Ltd.
- Masanori Miyabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive-working photoresist composition with quinone diazide sulfo...
- Patent number 4,906,549
- Issue date Mar 6, 1990
- Tokyo Ohka Kogyo Co., Ltd.
- Shingo Asaumi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive-working photosensitive quinone diazide composition with al...
- Patent number 4,882,260
- Issue date Nov 21, 1989
- Tokyo Ohka Kogyo Co., Ltd.
- Hidekatsu Kohara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working naphthoquinone diazide photoresist composition wit...
- Patent number 4,731,319
- Issue date Mar 15, 1988
- Tokyo Ohka Kogy Co., Ltd.
- Hidekatsu Kohara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masanori Miyabe

Person

Patents Grantslast 30 patents

Positive-working photoresist containing o-naphthoquinone diazide su...

Electron beam-curable resist composition and method for fine patter...

Electron beam-curable resist composition and method for fine patter...

Positive-working photoresist composition with quinone diazide sulfo...

Positive-working photosensitive quinone diazide composition with al...

Positive-working naphthoquinone diazide photoresist composition wit...