Masanori NAKAGAWA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank, reflective mask, and method for manufacturin...
- Patent number 12,072,619
- Issue date Aug 27, 2024
- Hoya Corporation
- Masanori Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, and method for manufacturin...
- Patent number 12,019,366
- Issue date Jun 25, 2024
- Hoya Corporation
- Masanori Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with a multilayer reflective film, reflective mask blank,...
- Patent number 11,650,494
- Issue date May 16, 2023
- Hoya Corporation
- Masanori Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with conductive film, substrate with multilayer reflectiv...
- Patent number 11,561,463
- Issue date Jan 24, 2023
- Hoya Corporation
- Masanori Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate with a multilayer reflective film, reflective mask blank,...
- Patent number 11,256,167
- Issue date Feb 22, 2022
- Hoya Corporation
- Masanori Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MULTILAYER REFLECTIVE FILM-ATTACHED SUBSTRATE, REFLECTIVE MASK BLAN...
- Publication number 20240411220
- Publication date Dec 12, 2024
- HOYA CORPORATION
- Masanori NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
- Publication number 20240319578
- Publication date Sep 26, 2024
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTION-TYPE MASK BLANK, REFLECTION-TYPE MASK, METHOD FOR MANUFA...
- Publication number 20240160095
- Publication date May 16, 2024
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR MANUFACTURING RE...
- Publication number 20240142866
- Publication date May 2, 2024
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER REFLECTIVE FILM-EQUIPPED SUBSTRATE, REFLECTIVE MASK BLAN...
- Publication number 20230418148
- Publication date Dec 28, 2023
- HOYA CORPORATION
- Ikuya FUKASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER REFLECTIVE FILM-EQUIPPED SUBSTRATE, REFLECTIVE MASK BLAN...
- Publication number 20230314928
- Publication date Oct 5, 2023
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER REFLECTIVE FILM-EQUIPPED SUBSTRATE, REFLECTIVE MASK BLAN...
- Publication number 20230133304
- Publication date May 4, 2023
- HOYA CORPORATION
- Kota SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER-REFLECTIVE-FILM-EQUIPPED SUBSTRATE, REFLECTIVE MASK BLAN...
- Publication number 20230072220
- Publication date Mar 9, 2023
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...
- Publication number 20220342293
- Publication date Oct 27, 2022
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH ELECTROCONDUCTIVE FILM, REFLECTIVE MASK BLANK, REFLE...
- Publication number 20220283490
- Publication date Sep 8, 2022
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THIN FILM-ATTACHED SUBSTRATE, MULTILAYERED REFLECTIVE FILM-ATTACHED...
- Publication number 20220244630
- Publication date Aug 4, 2022
- HOYA CORPORATION
- Masanori NAKAGAWA
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
- Publication number 20220229357
- Publication date Jul 21, 2022
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
- Publication number 20220206379
- Publication date Jun 30, 2022
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH A MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK,...
- Publication number 20220137501
- Publication date May 5, 2022
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH CONDUCTIVE FILM, SUBSTRATE WITH MULTILAYER REFLECTIV...
- Publication number 20210103209
- Publication date Apr 8, 2021
- HOYA CORPORATION
- Masanori NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE WITH A MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK,...
- Publication number 20200310244
- Publication date Oct 1, 2020
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masanori NAKAGAWA

Person

Patents Grantslast 30 patents

Reflective mask blank, reflective mask, and method for manufacturin...

Reflective mask blank, reflective mask, and method for manufacturin...

Substrate with a multilayer reflective film, reflective mask blank,...

Substrate with conductive film, substrate with multilayer reflectiv...

Substrate with a multilayer reflective film, reflective mask blank,...

Patents Applicationslast 30 patents

MULTILAYER REFLECTIVE FILM-ATTACHED SUBSTRATE, REFLECTIVE MASK BLAN...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...

REFLECTION-TYPE MASK BLANK, REFLECTION-TYPE MASK, METHOD FOR MANUFA...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR MANUFACTURING RE...

MULTILAYER REFLECTIVE FILM-EQUIPPED SUBSTRATE, REFLECTIVE MASK BLAN...

MULTILAYER REFLECTIVE FILM-EQUIPPED SUBSTRATE, REFLECTIVE MASK BLAN...

MULTILAYER REFLECTIVE FILM-EQUIPPED SUBSTRATE, REFLECTIVE MASK BLAN...

MULTILAYER-REFLECTIVE-FILM-EQUIPPED SUBSTRATE, REFLECTIVE MASK BLAN...

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...

SUBSTRATE WITH ELECTROCONDUCTIVE FILM, REFLECTIVE MASK BLANK, REFLE...

THIN FILM-ATTACHED SUBSTRATE, MULTILAYERED REFLECTIVE FILM-ATTACHED...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...

SUBSTRATE WITH A MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK,...

SUBSTRATE WITH CONDUCTIVE FILM, SUBSTRATE WITH MULTILAYER REFLECTIV...

SUBSTRATE WITH A MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK,...