Masanori Tateyama

Person

Kikuchi-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Coater/developer, method of coating and developing resist film, and...
- Patent number 8,372,480
- Issue date Feb 12, 2013
- Tokyo Electron Limited
- Akira Miyata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coater/developer, method of coating and developing resist film, and...
- Patent number 8,015,940
- Issue date Sep 13, 2011
- Tokyo Electron Limited
- Akira Miyata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 6,834,210
- Issue date Dec 21, 2004
- Tokyo Electron Limited
- Masanori Tateyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 6,526,329
- Issue date Feb 25, 2003
- Tokyo Electron Limited
- Masanori Tateyama
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 6,507,770
- Issue date Jan 14, 2003
- Tokyo Electron Limited
- Masanori Tateyama
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 6,457,882
- Issue date Oct 1, 2002
- Tokyo Electron Limited
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Parts maintenance managing system
- Patent number 6,394,670
- Issue date May 28, 2002
- Tokyo Electron Limited
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number RE37470
- Issue date Dec 18, 2001
- Tokyo Electron Limited
- Jun Ohkura
- 396 - Photography
Information Patent Grant
Method of substrate processing to form a film on multiple target ob...
- Patent number 6,054,181
- Issue date Apr 25, 2000
- Tokyo Electron Limited
- Mitsuhiro Nanbu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer processing apparatus including localized humidi...
- Patent number 5,725,664
- Issue date Mar 10, 1998
- Tokyo Electron Limited
- Mitsuhiro Nanbu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 5,664,254
- Issue date Sep 2, 1997
- Tokyo Electron Limited
- Jun Ohkura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing substrates having a film formed on a surfa...
- Patent number 5,565,034
- Issue date Oct 15, 1996
- Tokyo Electron Limited
- Mitsuhiro Nanbu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist process apparatus
- Patent number 5,061,144
- Issue date Oct 29, 1991
- Tokyo Electron Limited
- Masami Akimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COATER/DEVELOPER, METHOD OF COATING AND DEVELOPING RESIST FILM, AND...
- Publication number 20110262623
- Publication date Oct 27, 2011
- TOKYO ELECTRON LIMITED
- Akira MIYATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATER/DEVELOPER, METHOD OF COATING AND DEVELOPING RESIST FILM, AND...
- Publication number 20090098298
- Publication date Apr 16, 2009
- TOKYO ELECTRON LIMITED
- Akira MIYATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing system and substrate processing method
- Publication number 20020076306
- Publication date Jun 20, 2002
- TOKYO ELECTRON LIMITED
- Masanori Tateyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing system and substrate processing method
- Publication number 20010051837
- Publication date Dec 13, 2001
- Masanori Tateyama
- G05 - CONTROLLING REGULATING
Information Patent Application
Substrate processing system and substrate processing method
- Publication number 20010048865
- Publication date Dec 6, 2001
- TOKYO ELECTRON LIMITED
- Masanori Tateyama
- G05 - CONTROLLING REGULATING
Information Patent Application
Parts maintenance managing system
- Publication number 20010041076
- Publication date Nov 15, 2001
- TOKYO ELECTRON LIMITED
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing method and substrate processing apparatus
- Publication number 20010022897
- Publication date Sep 20, 2001
- TOKYO ELECTRON LIMITED
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Coating film forming apparatus and coating film forming method
- Publication number 20010016225
- Publication date Aug 23, 2001
- Kunie Ogata
- H01 - BASIC ELECTRIC ELEMENTS

Masanori Tateyama

Person

Patents Grantslast 30 patents

Coater/developer, method of coating and developing resist film, and...

Coater/developer, method of coating and developing resist film, and...

Substrate processing system and substrate processing method

Substrate processing system and substrate processing method

Substrate processing system and substrate processing method

Substrate processing method and substrate processing apparatus

Parts maintenance managing system

Substrate processing apparatus and substrate processing method

Method of substrate processing to form a film on multiple target ob...

Semiconductor wafer processing apparatus including localized humidi...

Substrate processing apparatus and substrate processing method

Apparatus for processing substrates having a film formed on a surfa...

Resist process apparatus

Patents Applicationslast 30 patents

COATER/DEVELOPER, METHOD OF COATING AND DEVELOPING RESIST FILM, AND...

COATER/DEVELOPER, METHOD OF COATING AND DEVELOPING RESIST FILM, AND...

Substrate processing system and substrate processing method

Substrate processing system and substrate processing method

Substrate processing system and substrate processing method

Parts maintenance managing system

Substrate processing method and substrate processing apparatus

Coating film forming apparatus and coating film forming method