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MASARU IZAWA

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  • HINO-SHI, JP
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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20240331974
    • Publication date Oct 3, 2024
    • HITACHI HIGH-TECH CORPORATION
    • Isao Mori
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20230058692
    • Publication date Feb 23, 2023
    • HITACHI HIGH-TECH CORPORATION
    • Isao Mori
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
    • Publication number 20210366721
    • Publication date Nov 25, 2021
    • Hitachi High-Technologies Corporation
    • Hiroyuki KOBAYASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD AND PLASMA PROCESSING APPARATUS
    • Publication number 20210358760
    • Publication date Nov 18, 2021
    • Hitachi High-Technologies Corporation
    • Sumiko FUJISAKI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD AND ETCHING APPARATUS
    • Publication number 20210242030
    • Publication date Aug 5, 2021
    • Hitachi High-Technologies Corporation
    • Kazunori SHINODA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DETECTING METHOD AND DETECTING DEVICE OF GAS COMPONENTS AND PROCESS...
    • Publication number 20210231571
    • Publication date Jul 29, 2021
    • Hitachi High-Technologies Corporation
    • Yoshifumi OGAWA
    • G01 - MEASURING TESTING
  • Information Patent Application

    PLASMA PROCESSING DEVICE
    • Publication number 20210159055
    • Publication date May 27, 2021
    • HITACHI HIGH-TECH CORPORATION
    • Tooru ARAMAKI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    VACUUM PROCESSING APPARATUS
    • Publication number 20210151298
    • Publication date May 20, 2021
    • HITACHI HIGH-TECH CORPORATION
    • Hiroyuki KOBAYASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20210043424
    • Publication date Feb 11, 2021
    • Isao Mori
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    • Publication number 20200411291
    • Publication date Dec 31, 2020
    • HITACHI HIGH-TECH CORPORATION
    • Tooru ARAMAKI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD
    • Publication number 20200328099
    • Publication date Oct 15, 2020
    • HITACHI HIGH-TECH CORPORATION
    • Hiroyuki KOBAYASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
    • Publication number 20200006079
    • Publication date Jan 2, 2020
    • Hitachi High-Technologies Corporation
    • Nobuya MIYOSHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    VACUUM PROCESSING APPARATUS
    • Publication number 20190237302
    • Publication date Aug 1, 2019
    • Hitachi High-Technologies Corporation
    • Hiroyuki KOBAYASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
    • Publication number 20190237337
    • Publication date Aug 1, 2019
    • Hitachi High-Technologies Corporation
    • Miyako MATSUI
    • G01 - MEASURING TESTING
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    • Publication number 20190122864
    • Publication date Apr 25, 2019
    • Hitachi High-Technologies Corporation
    • Tooru ARAMAKI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD AND ETCHING APPARATUS
    • Publication number 20190067032
    • Publication date Feb 28, 2019
    • Hitachi High-Technologies Corporation
    • Kazunori SHINODA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD AND PLASMA PROCESSING APPARATUS
    • Publication number 20180269118
    • Publication date Sep 20, 2018
    • Hitachi High-Technologies Corporation
    • Miyako MATSUI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20180122665
    • Publication date May 3, 2018
    • Hitachi High-Technologies Corporation
    • Hiroyuki KOBAYASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD AND ETCHING APPARATUS
    • Publication number 20180076051
    • Publication date Mar 15, 2018
    • Hitachi High-Technologies Corporation
    • Kazunori SHINODA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    VACUUM PROCESSING APPARATUS
    • Publication number 20170229290
    • Publication date Aug 10, 2017
    • Hitachi High-Technologies Corporation
    • Hiroyuki KOBAYASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20170018405
    • Publication date Jan 19, 2017
    • Hitachi High-Technologies Corporation
    • Hiroyuki KOBAYASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING DEVICE
    • Publication number 20170011890
    • Publication date Jan 12, 2017
    • Hitachi High-Technologies Corporation
    • Tooru ARAMAKI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    • Publication number 20160351404
    • Publication date Dec 1, 2016
    • Hitachi High-Technologies Corporation
    • Tooru ARAMAKI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DRY ETCHING APPARATUS AND METHOD
    • Publication number 20160141183
    • Publication date May 19, 2016
    • Hitachi High-Technologies Corporation
    • Masahito MORI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    • Publication number 20150031213
    • Publication date Jan 29, 2015
    • Hitachi High-Technologies Corporation
    • Go MIYA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    • Publication number 20140283534
    • Publication date Sep 25, 2014
    • Hitachi High-Technologies Corporation
    • Takumi Tandou
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20140231015
    • Publication date Aug 21, 2014
    • Hiroyuki Kobayashi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    • Publication number 20140004706
    • Publication date Jan 2, 2014
    • Go MIYA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD AND APPARATUS FOR PLASMA HEAT TREATMENT
    • Publication number 20130277354
    • Publication date Oct 24, 2013
    • Hitachi High-Technologies Corporation
    • Masatoshi Miyake
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DRY ETCHING APPARATUS AND METHOD
    • Publication number 20130228550
    • Publication date Sep 5, 2013
    • Hitachi High-Technologies Corporation
    • Masahito MORI
    • H01 - BASIC ELECTRIC ELEMENTS