Masaru Nishino

Person

Cambridge, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Etching apparatus
- Patent number 8,986,493
- Issue date Mar 24, 2015
- Tokyo Electron Limited
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus
- Patent number 8,361,275
- Issue date Jan 29, 2013
- Tokyo Electron Limited
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of pattern etching a dielectric film while removing a mask l...
- Patent number 8,252,192
- Issue date Aug 28, 2012
- Tokyo Electron Limited
- Yao-Sheng Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching a silicon-containing ARC layer to reduce roughne...
- Patent number 7,998,872
- Issue date Aug 16, 2011
- Tokyo Electron Limited
- Vinh Hoang Luong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and apparatus
- Patent number 7,674,393
- Issue date Mar 9, 2010
- Tokyo Electron Limited
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Damage-free ashing process and system for post low-k etch
- Patent number 7,279,427
- Issue date Oct 9, 2007
- Tokyo Electron, Ltd.
- Masaru Nishino
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING APPARATUS
- Publication number 20130118688
- Publication date May 16, 2013
- TOKYO ELECTRON LIMITED
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS
- Publication number 20120160416
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of pattern etching a dielectric film while removing a mask l...
- Publication number 20100243604
- Publication date Sep 30, 2010
- TOKYO ELECTRON LIMITED
- Yao-Sheng LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for etching anti-reflective coating to improve roughness, s...
- Publication number 20100216310
- Publication date Aug 26, 2010
- TOKYO ELECTRON LIMITED
- Andrew W. METZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND APPARATUS
- Publication number 20100116786
- Publication date May 13, 2010
- TOKYO ELECTRON LIMITED
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND APPARATUS
- Publication number 20100116787
- Publication date May 13, 2010
- TOKYO ELECTRON LIMITED
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXYGEN-CONTAINING PLASMA FLASH PROCESS FOR REDUCED MICRO-LOADING EF...
- Publication number 20090246713
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Kelvin Zin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING A SILICON-CONTAINING ARC LAYER TO REDUCE ROUGHNE...
- Publication number 20090197420
- Publication date Aug 6, 2009
- TOKYO ELECTRON LIMITED
- Vinh Hoang Luong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20070111529
- Publication date May 17, 2007
- Tokyo Electron Limited
- Masaru NISHINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Damage-free ashing process and system for post low-k etch
- Publication number 20070032087
- Publication date Feb 8, 2007
- Masaru Nishino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method and apparatus
- Publication number 20060213864
- Publication date Sep 28, 2006
- TOKYO ELECTRON LIMITED
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS

Masaru Nishino

Person

Patents Grantslast 30 patents

Etching apparatus

Etching apparatus

Method of pattern etching a dielectric film while removing a mask l...

Method for etching a silicon-containing ARC layer to reduce roughne...

Etching method and apparatus

Damage-free ashing process and system for post low-k etch

Patents Applicationslast 30 patents

ETCHING APPARATUS

ETCHING APPARATUS

Method of pattern etching a dielectric film while removing a mask l...

Process for etching anti-reflective coating to improve roughness, s...

ETCHING METHOD AND APPARATUS

ETCHING METHOD AND APPARATUS

OXYGEN-CONTAINING PLASMA FLASH PROCESS FOR REDUCED MICRO-LOADING EF...

METHOD FOR ETCHING A SILICON-CONTAINING ARC LAYER TO REDUCE ROUGHNE...

PLASMA ETCHING METHOD

Damage-free ashing process and system for post low-k etch

Etching method and apparatus