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Masaru Sakamoto
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Kitaibaraki-shi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Cu—Ga target, method of producing same, light-absorbing layer forme...
Patent number
10,050,160
Issue date
Aug 14, 2018
JX Nippon Mining & Metals Corporation
Tomoya Tamura
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Grant
Indium sputtering target and method for manufacturing same
Patent number
9,758,860
Issue date
Sep 12, 2017
JX Nippon Mining & Metals Corporation
Yousuke Endo
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Cu—In—Ga—Se quaternary alloy sputtering target
Patent number
9,273,389
Issue date
Mar 1, 2016
JX Nippon Mining & Metals Corporation
Tomoya Tamura
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Indium target and manufacturing method thereof
Patent number
9,139,900
Issue date
Sep 22, 2015
JX Nippon Mining Metals Corporation
Yousuke Endo
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Laminated structure and method for producing the same
Patent number
9,023,487
Issue date
May 5, 2015
JX Nippon Mining & Metals Corporation
Yousuke Endo
B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Copper clad laminate
Patent number
6,833,198
Issue date
Dec 21, 2004
Nikko Materials Company, Limited
Masaru Sakamoto
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Patents Applications
last 30 patents
Information
Patent Application
Cu-Ga Alloy Sputtering Target and Method for Producing Same
Publication number
20140001039
Publication date
Jan 2, 2014
JX NIPPON MINING & METALS CORPORATION
Tomoya Tamura
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
Cu-Ga Target, Method of Producing Same, Light-absorbing Layer Forme...
Publication number
20130319527
Publication date
Dec 5, 2013
JX NIPPON MINING & METALS CORPORATION
Tomoya Tamura
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
Indium Sputtering Target And Method For Manufacturing Same
Publication number
20130270108
Publication date
Oct 17, 2013
JX NIPPON MINING & METALS CORPORATION
Yousuke Endo
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Cu-In-Ga-Se QUATERNARY ALLOY SPUTTERING TARGET
Publication number
20130168241
Publication date
Jul 4, 2013
JX NIPPON MINING & METALS CORPORATION
Tomoya Tamura
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Laminated Structure And Method For Producing The Same
Publication number
20130143069
Publication date
Jun 6, 2013
JX NIPPON MINING & METALS CORPORATION
Yousuke Endo
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Indium Target And Manufacturing Method Thereof
Publication number
20130037408
Publication date
Feb 14, 2013
JX NIPPON MINING & METALS CORPORATION
Yousuke Endo
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Indium Target And Manufacturing Method Thereof
Publication number
20120273348
Publication date
Nov 1, 2012
JX NIPPON MINING & METALS CORPORATION
Yousuke Endo
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Cu-In-Ga-Se QUATERNARY ALLOY SPUTTERING TARGET
Publication number
20120205242
Publication date
Aug 16, 2012
JX NIPPON MINING & METALS CORPORATION
Tomoya Tamura
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Copper-clad laminated sheet
Publication number
20030093899
Publication date
May 22, 2003
Masaru Sakamoto
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Application
Laser hole drilling copper foil
Publication number
20020182432
Publication date
Dec 5, 2002
Masaru Sakamoto
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR