Masaru Takeshita

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 12,099,298
- Issue date Sep 24, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 9,411,224
- Issue date Aug 9, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,023,577
- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 8,975,010
- Issue date Mar 10, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern and resist composition
- Patent number 8,877,432
- Issue date Nov 4, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,614,049
- Issue date Dec 24, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist polymer and resist composition
- Patent number 8,580,481
- Issue date Nov 12, 2013
- Mitsubishi Rayon Co., Ltd.
- Hikaru Momose
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,535,868
- Issue date Sep 17, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,530,598
- Issue date Sep 10, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound
- Patent number 8,497,395
- Issue date Jul 30, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,486,605
- Issue date Jul 16, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,338,075
- Issue date Dec 25, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition, method of forming resist pattern using...
- Patent number 8,268,529
- Issue date Sep 18, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,247,161
- Issue date Aug 21, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,247,159
- Issue date Aug 21, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,216,764
- Issue date Jul 10, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method for forming resist pattern
- Patent number 8,097,396
- Issue date Jan 17, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist polymer and resist composition
- Patent number 8,092,979
- Issue date Jan 10, 2012
- Mitsubishi Rayon Co., Ltd.
- Hikaru Momose
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,972,762
- Issue date Jul 5, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Masaaki Muroi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,968,276
- Issue date Jun 28, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,964,331
- Issue date Jun 21, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, resist composition and method of forming resist pattern
- Patent number 7,939,243
- Issue date May 10, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,855,044
- Issue date Dec 21, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin for photoresist composition, photoresist composition and meth...
- Patent number 7,829,259
- Issue date Nov 9, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,776,511
- Issue date Aug 17, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing resist composition and resist composition
- Patent number 7,767,378
- Issue date Aug 3, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, positive resist composition and method for forming resist...
- Patent number 7,763,412
- Issue date Jul 27, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymer for semiconductor lithography and process for production...
- Patent number 7,695,889
- Issue date Apr 13, 2010
- Maruzen Petrochemical Co., LTD
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for forming resist pattern
- Patent number 7,682,770
- Issue date Mar 23, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,645,559
- Issue date Jan 12, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Ryoji Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
NEGATIVE-TONE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20230314945
- Publication date Oct 5, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi IBATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20220107565
- Publication date Apr 7, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru TAKESHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20130164693
- Publication date Jun 27, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20130017500
- Publication date Jan 17, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120183899
- Publication date Jul 19, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL COMPOUND
- Publication number 20120149916
- Publication date Jun 14, 2012
- Central Glass Co., Ltd.
- Yoshiyuki UTSUMI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120148956
- Publication date Jun 14, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki UTSUMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...
- Publication number 20120116038
- Publication date May 10, 2012
- Masaru Takeshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST POLYMER AND RESIST COMPOSITION
- Publication number 20120034561
- Publication date Feb 9, 2012
- Mitsubishi Rayon Co., Ltd.
- Hikaru MOMOSE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120009520
- Publication date Jan 12, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN AND RESIST COMPOSITION
- Publication number 20110262872
- Publication date Oct 27, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20110008728
- Publication date Jan 13, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi NAKAMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100248133
- Publication date Sep 30, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING...
- Publication number 20100196821
- Publication date Aug 5, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100190108
- Publication date Jul 29, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100159389
- Publication date Jun 24, 2010
- Masaru Takeshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition for immersion exposure, method of forming resist...
- Publication number 20100143844
- Publication date Jun 10, 2010
- Masaru Takeshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100047724
- Publication date Feb 25, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100015548
- Publication date Jan 21, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090286179
- Publication date Nov 19, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST POLYMER AND RESIST COMPOSITION
- Publication number 20090263743
- Publication date Oct 22, 2009
- Mitsubishi Rayon Co., Ltd.
- Hikaru MOMOSE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090246683
- Publication date Oct 1, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Ryoji Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090233220
- Publication date Sep 17, 2009
- Masaaki Muroi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090181325
- Publication date Jul 16, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN FOR PHOTORESIST COMPOSITION, PHOTORESIST COMPOSITION AND METH...
- Publication number 20090142700
- Publication date Jun 4, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090075204
- Publication date Mar 19, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090068592
- Publication date Mar 12, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION
- Publication number 20090042129
- Publication date Feb 12, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING RESIST COMPOSITION AND RESIST COMPOSITION
- Publication number 20090029288
- Publication date Jan 29, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20080292988
- Publication date Nov 27, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- C07 - ORGANIC CHEMISTRY

Masaru Takeshita

Person

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Method of forming resist pattern

Resist composition and method of forming resist pattern

Method of forming resist pattern

Method of forming resist pattern and resist composition

Resist composition and method of forming resist pattern

Resist polymer and resist composition

Positive resist composition and method of forming resist pattern

Resist composition for immersion exposure, method of forming resist...

Compound

Positive resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

Positive resist composition, method of forming resist pattern using...

Resist composition for immersion exposure, method of forming resist...

Positive resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

Positive resist composition and method for forming resist pattern

Resist polymer and resist composition

Positive resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

Resin, resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

Resin for photoresist composition, photoresist composition and meth...

Positive resist composition and method of forming resist pattern

Method for producing resist composition and resist composition

Polymer, positive resist composition and method for forming resist...

Copolymer for semiconductor lithography and process for production...

Resist composition and method for forming resist pattern

Positive resist composition and method of forming resist pattern

Patents Applicationslast 30 patents

NEGATIVE-TONE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

NOVEL COMPOUND

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...

RESIST POLYMER AND RESIST COMPOSITION

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN AND RESIST COMPOSITION

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIN, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Resist composition for immersion exposure, method of forming resist...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST POLYMER AND RESIST COMPOSITION

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIN FOR PHOTORESIST COMPOSITION, PHOTORESIST COMPOSITION AND METH...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION

METHOD FOR PRODUCING RESIST COMPOSITION AND RESIST COMPOSITION

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN