Masaru TANABE

Person

Koto-ku, Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing a mask blank substrate, method for manufac...
- Patent number 10,983,427
- Issue date Apr 20, 2021
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank substrate, multi-layer reflective film coated substrate,...
- Patent number 10,578,961
- Issue date Mar 3, 2020
- Hoya Corporation
- Yohei Ikebe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank substrate, mask blank, transfer mask, and method of manu...
- Patent number 10,168,613
- Issue date Jan 1, 2019
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank substrate, mask blank, transfer mask, and method of manu...
- Patent number 9,690,189
- Issue date Jun 27, 2017
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a mask blank substrate, method of manufactu...
- Patent number 8,785,085
- Issue date Jul 22, 2014
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, photomask blank manufacturing method, and photomas...
- Patent number 8,709,683
- Issue date Apr 29, 2014
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thin film evaluation method, mask blank, and transfer mask
- Patent number 8,609,307
- Issue date Dec 17, 2013
- Hoya Corporation
- Kazuya Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a transfer mask and method of manufacturing...
- Patent number 8,609,304
- Issue date Dec 17, 2013
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of manufacturing a mask blank substrate, a mask blank, a ph...
- Patent number 8,592,106
- Issue date Nov 26, 2013
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a substrate for a mask blank, method of man...
- Patent number 8,455,158
- Issue date Jun 4, 2013
- Hoya Corporation
- Masaru Tanabe
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Thin film evaluation method, mask blank, and transfer mask
- Patent number 8,450,030
- Issue date May 28, 2013
- Hoya Corporation
- Kazuya Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank substrate, mask blank, photomask, and methods of manufac...
- Patent number 8,440,373
- Issue date May 14, 2013
- Hoya Corporation
- Masaru Tanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Mask blank substrate set and mask blank set
- Patent number 8,318,387
- Issue date Nov 27, 2012
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank providing system, mask blank providing method, mask blan...
- Patent number 8,318,388
- Issue date Nov 27, 2012
- Hoya Corporation
- Osamu Suzuki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank, photomask blank manufacturing method, and photomas...
- Patent number 8,197,992
- Issue date Jun 12, 2012
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of manufacturing a mask blank substrate, a mask blank, a ph...
- Patent number 8,142,963
- Issue date Mar 27, 2012
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transparent article
- Patent number 8,107,063
- Issue date Jan 31, 2012
- Hoya Corporation
- Masaru Tanabe
- G01 - MEASURING TESTING
Information Patent Grant
Mask blank substrate, mask blank, photomask, and methods of manufac...
- Patent number 8,048,593
- Issue date Nov 1, 2011
- Hoya Corporation
- Masaru Tanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Manufacturing method of transparent substrate for mask blanks, manu...
- Patent number 8,039,178
- Issue date Oct 18, 2011
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank transparent substrate manufacturing method, mask blank m...
- Patent number 8,026,025
- Issue date Sep 27, 2011
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank substrate set and mask blank set
- Patent number 8,007,961
- Issue date Aug 30, 2011
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank providing system, mask blank providing method, mask blan...
- Patent number 7,998,644
- Issue date Aug 16, 2011
- Hoya Corporation
- Osamu Suzuki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Defect inspection method for a glass substrate for a mask blank, gl...
- Patent number 7,972,702
- Issue date Jul 5, 2011
- Hoya Corporation
- Masaru Tanabe
- G01 - MEASURING TESTING
Information Patent Grant
Mask blank transparent substrate manufacturing method, mask blank m...
- Patent number 7,901,840
- Issue date Mar 8, 2011
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method for transparent article
- Patent number 7,898,650
- Issue date Mar 1, 2011
- Hoya Corporation
- Masaru Tanabe
- G01 - MEASURING TESTING
Information Patent Grant
Mask blank substrate, mask blank, exposure mask, mask blank substra...
- Patent number 7,892,708
- Issue date Feb 22, 2011
- Hoya Corporation
- Masaru Tanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Manufacturing method of transparent substrate for mask blanks, manu...
- Patent number 7,862,960
- Issue date Jan 4, 2011
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank substrate, mask blank, exposure mask, mask blank substra...
- Patent number 7,745,074
- Issue date Jun 29, 2010
- Hoya Corporation
- Masaru Tanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Mask blank providing system, mask blank providing method, mask blan...
- Patent number 7,700,244
- Issue date Apr 20, 2010
- Hoya Corporation
- Osamu Suzuki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Mask blank substrate, mask blank, exposure mask, mask blank substra...
- Patent number 7,592,104
- Issue date Sep 22, 2009
- Hoya Corporation
- Masaru Tanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, RE...
- Publication number 20230132780
- Publication date May 4, 2023
- HOYA CORPORATION
- Tatsuya SASAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING A MASK BLANK SUBSTRATE, METHOD FOR MANUFAC...
- Publication number 20190227428
- Publication date Jul 25, 2019
- HOYA CORPORATION
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK SUBSTRATE, MULTI-LAYER REFLECTIVE FILM COATED SUBSTRATE,...
- Publication number 20180157166
- Publication date Jun 7, 2018
- HOYA CORPORATION
- Yohei IKEBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK SUBSTRATE, MASK BLANK, AND METHODS FOR MANUFACTURING THE...
- Publication number 20170363952
- Publication date Dec 21, 2017
- HOYA CORPORATION
- Yohei IKEBE
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
MASK BLANK SUBSTRATE, MASK BLANK, TRANSFER MASK, AND METHOD OF MAN...
- Publication number 20170248841
- Publication date Aug 31, 2017
- HOYA CORPORATION
- Masaru TANABE
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
MASK BLANK SUBSTRATE, MASK BLANK, TRANSFER MASK, AND METHOD OF MANU...
- Publication number 20160109797
- Publication date Apr 21, 2016
- HOYA CORPORATION
- Masaru TANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOLAR BATTERY-SEALING SHEET, SOLAR BATTERY MODULE AND METHOD FOR MA...
- Publication number 20150372158
- Publication date Dec 24, 2015
- MITSUI CHEMICALS TOHCELLO, INC.
- Masaru TANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE INSPECTION METHOD, SUBSTRATE MANUFACTURING METHOD AND SUB...
- Publication number 20150029324
- Publication date Jan 29, 2015
- HOYA CORPORATION
- Masaru TANABE
- G02 - OPTICS
Information Patent Application
SUBSTRATE INSPECTION METHOD, SUBSTRATE MANUFACTURING METHOD AND SUB...
- Publication number 20150030230
- Publication date Jan 29, 2015
- HOYA CORPORATION
- Masaru TANABE
- G01 - MEASURING TESTING
Information Patent Application
THIN FILM EVALUATION METHOD, MASK BLANK, AND TRANSFER MASK
- Publication number 20130236819
- Publication date Sep 12, 2013
- HOYA CORPORATION
- Kazuya SAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A MASK BLANK SUBSTRATE, METHOD OF MANUFACTU...
- Publication number 20130022900
- Publication date Jan 24, 2013
- HOYA CORPORATION
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A TRANSFER MASK AND METHOD OF MANUFACTURING...
- Publication number 20120251928
- Publication date Oct 4, 2012
- HOYA CORPORATION
- Masaru TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, PHOTOMASK BLANK MANUFACTURING METHOD, AND PHOTOMAS...
- Publication number 20120214093
- Publication date Aug 23, 2012
- HOYA CORPORATION
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF MANUFACTURING A MASK BLANK SUBSTRATE, A MASK BLANK, A PH...
- Publication number 20120208112
- Publication date Aug 16, 2012
- HOYA CORPORATION
- Masaru TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK SUBSTRATE, MASK BLANK, PHOTOMASK, AND METHODS OF MANUFAC...
- Publication number 20120015286
- Publication date Jan 19, 2012
- HOYA CORPORATION
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THIN FILM EVALUATION METHOD, MASK BLANK, AND TRANSFER MASK
- Publication number 20110287347
- Publication date Nov 24, 2011
- HOYA CORPORATION
- Kazuya SAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF MANUFACTURING A MASK BLANK SUBSTRATE, A MASK BLANK, A PH...
- Publication number 20110262846
- Publication date Oct 27, 2011
- HOYA CORPORATION
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK PROVIDING SYSTEM, MASK BLANK PROVIDING METHOD, MASK BLAN...
- Publication number 20110262847
- Publication date Oct 27, 2011
- HOYA CORPORATION
- Osamu Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK SUBSTRATE SET AND MASK BLANK SET
- Publication number 20110256473
- Publication date Oct 20, 2011
- HOYA CORPORATION
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SUBSTRATE FOR A MASK BLANK, METHOD OF MAN...
- Publication number 20110189595
- Publication date Aug 4, 2011
- HOYA CORPORATION
- Masaru TANABE
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
MANUFACTURING METHOD OF TRANSPARENT SUBSTRATE FOR MASK BLANKS, MANU...
- Publication number 20110123912
- Publication date May 26, 2011
- HOYA CORPORATION
- Masaru TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRANSPARENT ARTICLE
- Publication number 20110097652
- Publication date Apr 28, 2011
- HOYA CORPORATION
- Masaru Tanabe
- G01 - MEASURING TESTING
Information Patent Application
MASK BLANK TRANSPARENT SUBSTRATE MANUFACTURING METHOD, MASK BLANK M...
- Publication number 20110027701
- Publication date Feb 3, 2011
- HOYA CORPORATION
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK SUBSTRATE, MASK BLANK, EXPOSURE MASK, MASK BLANK SUBSTRA...
- Publication number 20100248092
- Publication date Sep 30, 2010
- HOYA CORPORATION
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK PROVIDING SYSTEM, MASK BLANK PROVIDING METHOD, MASK BLAN...
- Publication number 20100173232
- Publication date Jul 8, 2010
- HOYA CORPORATION
- Osamu Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, PHOTOMASK BLANK MANUFACTURING METHOD, AND PHOTOMAS...
- Publication number 20100124711
- Publication date May 20, 2010
- HOYA CORPORATION
- Masaru TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK SUBSTRATE SET AND MASK BLANK SET
- Publication number 20100081067
- Publication date Apr 1, 2010
- HOYA CORPORATION
- Masaru TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK SUBSTRATE, MASK BLANK, PHOTOMASK, AND METHODS OF MANUFAC...
- Publication number 20100035028
- Publication date Feb 11, 2010
- HOYA CORPORATION
- Masaru TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK SUBSTRATE, MASK BLANK, EXPOSURE MASK, MASK BLANK SUBSTRA...
- Publication number 20100035164
- Publication date Feb 11, 2010
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION METHOD FOR TRANSPARENT ARTICLE
- Publication number 20090220864
- Publication date Sep 3, 2009
- HOYA CORPORATION
- Masaru Tanabe
- G01 - MEASURING TESTING

Masaru TANABE

Person

Patents Grantslast 30 patents

Method for manufacturing a mask blank substrate, method for manufac...

Mask blank substrate, multi-layer reflective film coated substrate,...

Mask blank substrate, mask blank, transfer mask, and method of manu...

Mask blank substrate, mask blank, transfer mask, and method of manu...

Method of manufacturing a mask blank substrate, method of manufactu...

Photomask blank, photomask blank manufacturing method, and photomas...

Thin film evaluation method, mask blank, and transfer mask

Method of manufacturing a transfer mask and method of manufacturing...

Methods of manufacturing a mask blank substrate, a mask blank, a ph...

Method of manufacturing a substrate for a mask blank, method of man...

Thin film evaluation method, mask blank, and transfer mask

Mask blank substrate, mask blank, photomask, and methods of manufac...

Mask blank substrate set and mask blank set

Mask blank providing system, mask blank providing method, mask blan...

Photomask blank, photomask blank manufacturing method, and photomas...

Methods of manufacturing a mask blank substrate, a mask blank, a ph...

Transparent article

Mask blank substrate, mask blank, photomask, and methods of manufac...

Manufacturing method of transparent substrate for mask blanks, manu...

Mask blank transparent substrate manufacturing method, mask blank m...

Mask blank substrate set and mask blank set

Mask blank providing system, mask blank providing method, mask blan...

Defect inspection method for a glass substrate for a mask blank, gl...

Mask blank transparent substrate manufacturing method, mask blank m...

Inspection method for transparent article

Mask blank substrate, mask blank, exposure mask, mask blank substra...

Manufacturing method of transparent substrate for mask blanks, manu...

Mask blank substrate, mask blank, exposure mask, mask blank substra...

Mask blank providing system, mask blank providing method, mask blan...

Mask blank substrate, mask blank, exposure mask, mask blank substra...

Patents Applicationslast 30 patents

MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, RE...

METHOD FOR MANUFACTURING A MASK BLANK SUBSTRATE, METHOD FOR MANUFAC...

MASK BLANK SUBSTRATE, MULTI-LAYER REFLECTIVE FILM COATED SUBSTRATE,...

MASK BLANK SUBSTRATE, MASK BLANK, AND METHODS FOR MANUFACTURING THE...

MASK BLANK SUBSTRATE, MASK BLANK, TRANSFER MASK, AND METHOD OF MAN...

MASK BLANK SUBSTRATE, MASK BLANK, TRANSFER MASK, AND METHOD OF MANU...

SOLAR BATTERY-SEALING SHEET, SOLAR BATTERY MODULE AND METHOD FOR MA...

SUBSTRATE INSPECTION METHOD, SUBSTRATE MANUFACTURING METHOD AND SUB...

SUBSTRATE INSPECTION METHOD, SUBSTRATE MANUFACTURING METHOD AND SUB...

THIN FILM EVALUATION METHOD, MASK BLANK, AND TRANSFER MASK

METHOD OF MANUFACTURING A MASK BLANK SUBSTRATE, METHOD OF MANUFACTU...

METHOD OF MANUFACTURING A TRANSFER MASK AND METHOD OF MANUFACTURING...

PHOTOMASK BLANK, PHOTOMASK BLANK MANUFACTURING METHOD, AND PHOTOMAS...

METHODS OF MANUFACTURING A MASK BLANK SUBSTRATE, A MASK BLANK, A PH...

MASK BLANK SUBSTRATE, MASK BLANK, PHOTOMASK, AND METHODS OF MANUFAC...

THIN FILM EVALUATION METHOD, MASK BLANK, AND TRANSFER MASK

METHODS OF MANUFACTURING A MASK BLANK SUBSTRATE, A MASK BLANK, A PH...

MASK BLANK PROVIDING SYSTEM, MASK BLANK PROVIDING METHOD, MASK BLAN...

MASK BLANK SUBSTRATE SET AND MASK BLANK SET

METHOD OF MANUFACTURING A SUBSTRATE FOR A MASK BLANK, METHOD OF MAN...

MANUFACTURING METHOD OF TRANSPARENT SUBSTRATE FOR MASK BLANKS, MANU...

TRANSPARENT ARTICLE

MASK BLANK TRANSPARENT SUBSTRATE MANUFACTURING METHOD, MASK BLANK M...

MASK BLANK SUBSTRATE, MASK BLANK, EXPOSURE MASK, MASK BLANK SUBSTRA...

MASK BLANK PROVIDING SYSTEM, MASK BLANK PROVIDING METHOD, MASK BLAN...

PHOTOMASK BLANK, PHOTOMASK BLANK MANUFACTURING METHOD, AND PHOTOMAS...

MASK BLANK SUBSTRATE SET AND MASK BLANK SET

MASK BLANK SUBSTRATE, MASK BLANK, PHOTOMASK, AND METHODS OF MANUFAC...

MASK BLANK SUBSTRATE, MASK BLANK, EXPOSURE MASK, MASK BLANK SUBSTRA...

INSPECTION METHOD FOR TRANSPARENT ARTICLE