Masashi MATSUMOTO

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Beaverton, OR, US

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Patents Grantslast 30 patents

Information Patent Grant
Gas phase etch with controllable etch selectivity of silicon-german...
- Patent number 10,923,356
- Issue date Feb 16, 2021
- Tokyo Electron Limited
- Subhadeep Kal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and storage medium
- Patent number 9,607,855
- Issue date Mar 28, 2017
- Tokyo Electron Limited
- Nobuhiro Takahashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SELECTIVE GAS PHASE ETCH OF SILICON GERMANIUM ALLOYS
- Publication number 20240128088
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Toshiki KANAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS PHASE ETCH WITH CONTROLLABLE ETCH SELECTIVITY OF SILICON-GERMAN...
- Publication number 20200027741
- Publication date Jan 23, 2020
- TOKYO ELECTRON LIMITED
- Subhadeep Kal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND STORAGE MEDIUM
- Publication number 20160225637
- Publication date Aug 4, 2016
- TOKYO ELECTRON LIMITED
- Nobuhiro TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS