Masashi SAITO

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,854,431
- Issue date Dec 1, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,804,076
- Issue date Oct 13, 2020
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,546,727
- Issue date Jan 28, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,529,539
- Issue date Jan 7, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,997,332
- Issue date Jun 12, 2018
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,941,097
- Issue date Apr 10, 2018
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,899,191
- Issue date Feb 20, 2018
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 9,490,105
- Issue date Nov 8, 2016
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,313,872
- Issue date Apr 12, 2016
- Tokyo Electron Limited
- Yohei Yamazawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,253,867
- Issue date Feb 2, 2016
- Tokyo Electron Limited
- Yohei Yamazawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and processing gas supply structure the...
- Patent number 9,082,592
- Issue date Jul 14, 2015
- Tokyo Electron Limited
- Masashi Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, and maintenance method and assembling...
- Patent number 8,945,340
- Issue date Feb 3, 2015
- Tokyo Electron Limited
- Masashi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring heating method, plasma etching apparatus, and plasma etc...
- Patent number 8,858,753
- Issue date Oct 14, 2014
- Tokyo Electron Limited
- Chishio Koshimizu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,790,490
- Issue date Jul 29, 2014
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,741,097
- Issue date Jun 3, 2014
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning substrate and cleaning method
- Patent number 8,647,442
- Issue date Feb 11, 2014
- Tokyo Electron Limited
- Yohei Yamazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,608,903
- Issue date Dec 17, 2013
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,603,293
- Issue date Dec 10, 2013
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Focus ring heating method, plasma etching apparatus, and plasma etc...
- Patent number 8,486,221
- Issue date Jul 16, 2013
- Tokyo Electron Limited
- Chishio Koshimizu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,137,471
- Issue date Mar 20, 2012
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,988,816
- Issue date Aug 2, 2011
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,951,262
- Issue date May 31, 2011
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,740,737
- Issue date Jun 22, 2010
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method for conservation of processing gases
- Patent number 7,628,931
- Issue date Dec 8, 2009
- Tokyo Electron Limited
- Masashi Saito
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20210082669
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200357606
- Publication date Nov 12, 2020
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20200111645
- Publication date Apr 9, 2020
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180308662
- Publication date Oct 25, 2018
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20170032936
- Publication date Feb 2, 2017
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20160379805
- Publication date Dec 29, 2016
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20160358753
- Publication date Dec 8, 2016
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160203951
- Publication date Jul 14, 2016
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160172160
- Publication date Jun 16, 2016
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20140326409
- Publication date Nov 6, 2014
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140216345
- Publication date Aug 7, 2014
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140216346
- Publication date Aug 7, 2014
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20140124139
- Publication date May 8, 2014
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING HEATING METHOD, PLASMA ETCHING APPARATUS, AND PLASMA ETC...
- Publication number 20130299455
- Publication date Nov 14, 2013
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING SUBSTRATE AND CLEANING METHOD
- Publication number 20120204904
- Publication date Aug 16, 2012
- TOKYO ELECTRON LIMITED
- Yohei Yamazawa
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20120145324
- Publication date Jun 14, 2012
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PROCESSING GAS SUPPLY STRUCTURE THE...
- Publication number 20110303362
- Publication date Dec 15, 2011
- TOKYO ELECTRON LIMITED
- Masashi SAITO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20110272097
- Publication date Nov 10, 2011
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20110214815
- Publication date Sep 8, 2011
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20110104902
- Publication date May 5, 2011
- TOKYO ELECTRON LIMITED
- Yohei Yamazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20110094997
- Publication date Apr 28, 2011
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20110094995
- Publication date Apr 28, 2011
- TOKYO ELECTRON LIMITED
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20110094996
- Publication date Apr 28, 2011
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING HEATING METHOD, PLASMA ETCHING APPARATUS, AND PLASMA ETC...
- Publication number 20100213171
- Publication date Aug 26, 2010
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS, AND MAINTENANCE METHOD AND ASSEMBLING...
- Publication number 20100204810
- Publication date Aug 12, 2010
- TOKYO ELECTRON LIMITED
- Masashi SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20100126668
- Publication date May 27, 2010
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING SUBSTRATE AND CLEANING METHOD
- Publication number 20090241992
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Yohei Yamazawa
- B08 - CLEANING
Information Patent Application
Plasma processing apparatus and method
- Publication number 20060066247
- Publication date Mar 30, 2006
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20060037701
- Publication date Feb 23, 2006
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20060037703
- Publication date Feb 23, 2006
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS

Masashi SAITO

Person

Patents Grantslast 30 patents

Plasma processing apparatus and method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus and method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and processing gas supply structure the...

Plasma processing apparatus, and maintenance method and assembling...

Focus ring heating method, plasma etching apparatus, and plasma etc...

Plasma processing apparatus and method

Plasma processing apparatus and plasma processing method

Cleaning substrate and cleaning method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and method

Focus ring heating method, plasma etching apparatus, and plasma etc...

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processing apparatus and method

Processing method for conservation of processing gases

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD

FOCUS RING HEATING METHOD, PLASMA ETCHING APPARATUS, AND PLASMA ETC...

CLEANING SUBSTRATE AND CLEANING METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND PROCESSING GAS SUPPLY STRUCTURE THE...

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

FOCUS RING HEATING METHOD, PLASMA ETCHING APPARATUS, AND PLASMA ETC...

PLASMA PROCESSING APPARATUS, AND MAINTENANCE METHOD AND ASSEMBLING...

PLASMA PROCESSING APPARATUS AND METHOD

CLEANING SUBSTRATE AND CLEANING METHOD

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processing apparatus and method