Masashi Sekikawa

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Chiba, JP

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Patents Applicationslast 30 patents

Information Patent Application
CYCLIC COMPOUND, PHOTORESIST BASE, PHOTORESIST COMPOSITION, MICROFA...
- Publication number 20100266952
- Publication date Oct 21, 2010
- Idemitsu Kosan Co., Ltd.
- Takashi Kashiwamura
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CYCLIC COMPOUND, PHOTORESIST BASE MATERIAL AND PHOTORESIST COMPOSITION
- Publication number 20100190107
- Publication date Jul 29, 2010
- Idemitsu Kosan Co. Ltd.
- Mitsuru Shibata
- C07 - ORGANIC CHEMISTRY