Masataka GOSHO

Person

Koshi City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,276,455
- Issue date Apr 15, 2025
- Tokyo Electron Limited
- Masataka Gosho
- F26 - DRYING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,237,177
- Issue date Feb 25, 2025
- Tokyo Electron Limited
- Shogo Fukui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,237,178
- Issue date Feb 25, 2025
- Tokyo Electron Limited
- Masataka Gosho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,057,327
- Issue date Aug 6, 2024
- Tokyo Electron Limited
- Masataka Gosho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,901,197
- Issue date Feb 13, 2024
- Tokyo Electron Limited
- Masataka Gosho
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250167011
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Shogo Fukui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE STANDBY DEVICE, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRAT...
- Publication number 20250167022
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Keita Hirase
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240371661
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Masataka GOSHO
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240162053
- Publication date May 16, 2024
- TOKYO ELECTRON LIMITED
- Masataka GOSHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20230282493
- Publication date Sep 7, 2023
- TOKYO ELECTRON LIMITED
- Keita HIRASE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20230187233
- Publication date Jun 15, 2023
- TOKYO ELECTRON LIMITED
- Masataka GOSHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20220301895
- Publication date Sep 22, 2022
- TOKYO ELECTRON LIMITED
- Masataka GOSHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20220254658
- Publication date Aug 11, 2022
- TOKYO ELECTRON LIMITED
- Shogo Fukui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20220074660
- Publication date Mar 10, 2022
- TOKYO ELECTRON LIMITED
- Masataka GOSHO
- F26 - DRYING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20190206702
- Publication date Jul 4, 2019
- TOKYO ELECTRON LIMITED
- Masataka GOSHO
- B08 - CLEANING

Masataka GOSHO

Person

Patents Grantslast 30 patents

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE STANDBY DEVICE, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRAT...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD