Masato Fukasawa

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing liquid, polishing liquid set, and substrate polishing method
- Patent number 11,046,869
- Issue date Jun 29, 2021
- SHOWA DENKO MATERIALS CO., LTD.
- Toshiaki Akutsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing method
- Patent number 9,299,573
- Issue date Mar 29, 2016
- Hitachi Chemical Company, Ltd.
- Kouji Mishima
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Cmp polishing slurry and method of polishing substrate
- Patent number 9,293,344
- Issue date Mar 22, 2016
- Hitachi Chemical Company, Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing solution for CMP and polishing method using the polishing...
- Patent number 9,022,834
- Issue date May 5, 2015
- Hitachi Chemical Company, Ltd.
- Eiichi Satou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP polishing slurry and method of polishing substrate
- Patent number 8,900,335
- Issue date Dec 2, 2014
- Hitachi Chemical Company, Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing slurry for metal films and polishing method
- Patent number 8,901,002
- Issue date Dec 2, 2014
- Hitachi Chemical Company, Ltd.
- Takaaki Tanaka
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing solution for metal films and polishing method using the same
- Patent number 8,734,204
- Issue date May 27, 2014
- Hitachi Chemical Company, Ltd.
- Kouji Haga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing slurry for metal films and polishing method
- Patent number 8,609,541
- Issue date Dec 17, 2013
- Hitachi Chemical Co., Ltd.
- Takaaki Tanaka
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP abrasive slurry for polishing insulation film, polishing method...
- Patent number 8,524,111
- Issue date Sep 3, 2013
- Hitachi Chemical Company, Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing liquid for metal film and polishing method
- Patent number 8,501,625
- Issue date Aug 6, 2013
- Hitachi Chemical Co., Ltd.
- Kouji Haga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing slurry and polishing method
- Patent number 8,481,428
- Issue date Jul 9, 2013
- Hitachi Chemical Co., Ltd.
- Jin Amanokura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing liquid for metal and method of polishing
- Patent number 8,288,282
- Issue date Oct 16, 2012
- Hitachi Chemical Co., Ltd.
- Yutaka Nomura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP polishing slurry and polishing method
- Patent number 8,168,541
- Issue date May 1, 2012
- Hitachi Chemical Co., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing slurry and polishing method
- Patent number 8,084,363
- Issue date Dec 27, 2011
- Hitachi Chemical Co., Ltd.
- Jin Amanokura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing slurry and polishing method
- Patent number 8,084,362
- Issue date Dec 27, 2011
- Hitachi Chemical Co., Ltd.
- Jin Amanokura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing slurry and polishing method
- Patent number 8,075,800
- Issue date Dec 13, 2011
- Hitachi Chemical Co., Ltd.
- Naoyuki Koyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing slurry and polishing method
- Patent number 7,994,058
- Issue date Aug 9, 2011
- Hitachi Chemical Co., Ltd.
- Jin Amanokura
Information Patent Grant
CMP polishing compound and polishing method
- Patent number 7,838,482
- Issue date Nov 23, 2010
- Hitachi Chemical Co. Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP polishing slurry and polishing method
- Patent number 7,837,800
- Issue date Nov 23, 2010
- Hitachi Chemical Co., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Dry toner, dry developer and process for forming electrophotographi...
- Patent number 4,985,328
- Issue date Jan 15, 1991
- Hitachi Chemical Co., Ltd.
- Yuugo Kumagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electrophotographic plate including an undercoating layer having a...
- Patent number 4,954,406
- Issue date Sep 4, 1990
- Hitachi Chemical Company, Ltd.
- Keiichi Endo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POLISHING LIQUID, POLISHING LIQUID SET, AND SUBSTRATE POLISHING METHOD
- Publication number 20180258319
- Publication date Sep 13, 2018
- Hitachi Chemical Company, Ltd.
- Toshiaki AKUTSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING METHOD
- Publication number 20150031205
- Publication date Jan 29, 2015
- Hitachi Chemical Company, Ltd.
- Kouji Mishima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING SLURRY FOR METAL FILMS AND POLISHING METHOD
- Publication number 20140065826
- Publication date Mar 6, 2014
- HITACHI CHEMICAL CO., Ltd.
- Takaaki Tanaka
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING LIQUID FOR METAL FILM AND POLISHING METHOD
- Publication number 20130217229
- Publication date Aug 22, 2013
- HITACHI CHEMICAL CO., Ltd.
- Kouji Haga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING SLURRY AND POLISHING METHOD
- Publication number 20120064721
- Publication date Mar 15, 2012
- HITACHI CHEMICAL CO., Ltd.
- Jin Amanokura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING SOLUTION FOR CMP AND POLISHING METHOD USING THE POLISHING...
- Publication number 20110275285
- Publication date Nov 10, 2011
- Hitachi Chemical Company, Ltd.
- Eiichi Satou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING SOLUTION FOR METAL FILMS AND POLISHING METHOD USING THE SAME
- Publication number 20110104992
- Publication date May 5, 2011
- Kouji Haga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING SLURRY AND POLISHING METHOD
- Publication number 20110028073
- Publication date Feb 3, 2011
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING SLURRY FOR METAL FILMS AND POLISHING METHOD
- Publication number 20110009033
- Publication date Jan 13, 2011
- HITACHI CHEMICAL CO., Ltd.
- Takaaki Tanaka
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING LIQUID FOR METAL FILM AND POLISHING METHOD
- Publication number 20100323584
- Publication date Dec 23, 2010
- HITACHI CHEMICAL CO., Ltd.
- Kouji Haga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING SLURRY AND METHOD OF POLISHING SUBSTRATE
- Publication number 20100210109
- Publication date Aug 19, 2010
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING LIQUID FOR METAL AND METHOD OF POLISHING
- Publication number 20100197201
- Publication date Aug 5, 2010
- Yutaka Nomura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING SLURRY, ADDITIVE LIQUID FOR CMP POLISHING SLURRY, AND...
- Publication number 20100015806
- Publication date Jan 21, 2010
- Masato Fukasawa
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING SLURRY FOR CMP
- Publication number 20090283715
- Publication date Nov 19, 2009
- Shigeru Nobe
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing slurry and polishing method
- Publication number 20090156007
- Publication date Jun 18, 2009
- HITACHI CHEMICAL CO., Ltd.
- Jin Amanokura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP Abrasive Slurry for Polishing Insulation Film, Polishing Method...
- Publication number 20090047786
- Publication date Feb 19, 2009
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Cmp Polishing Slurry and Method of Polishing Substrate
- Publication number 20080254717
- Publication date Oct 16, 2008
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP polishing slurry and polishing method
- Publication number 20080214093
- Publication date Sep 4, 2008
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Cmp Polishing Slurry and Method of Polishing Substrate
- Publication number 20080003925
- Publication date Jan 3, 2008
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing slurry and polishing method
- Publication number 20070232197
- Publication date Oct 4, 2007
- HITACHI CHEMICAL CO., Ltd.
- Jin Amanokura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING SLURRY AND METHOD OF POLISHING SUBSTRATE
- Publication number 20070218811
- Publication date Sep 20, 2007
- HITACHI CHEMICAL CO., Ltd.
- Yasushi Kurata
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing slurry for silicon oxide, additive liquid and polishing m...
- Publication number 20070175104
- Publication date Aug 2, 2007
- HITACHI CHEMICAL CO., Ltd.
- Masaya Nishiyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Hazardous substance decomposer and process for producing the same
- Publication number 20060289826
- Publication date Dec 28, 2006
- Naoyuki Koyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Cmp polishing compound and polishing method
- Publication number 20060148667
- Publication date Jul 6, 2006
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing fluid and polishing method
- Publication number 20050050803
- Publication date Mar 10, 2005
- Jin Amanokura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Masato Fukasawa

Person

Patents Grantslast 30 patents

Polishing liquid, polishing liquid set, and substrate polishing method

Polishing method

Cmp polishing slurry and method of polishing substrate

Polishing solution for CMP and polishing method using the polishing...

CMP polishing slurry and method of polishing substrate

Polishing slurry for metal films and polishing method

Polishing solution for metal films and polishing method using the same

Polishing slurry for metal films and polishing method

CMP abrasive slurry for polishing insulation film, polishing method...

Polishing liquid for metal film and polishing method

Polishing slurry and polishing method

Polishing liquid for metal and method of polishing

CMP polishing slurry and polishing method

Polishing slurry and polishing method

Polishing slurry and polishing method

Polishing slurry and polishing method

Polishing slurry and polishing method

CMP polishing compound and polishing method

CMP polishing slurry and polishing method

Dry toner, dry developer and process for forming electrophotographi...

Electrophotographic plate including an undercoating layer having a...

Patents Applicationslast 30 patents

POLISHING LIQUID, POLISHING LIQUID SET, AND SUBSTRATE POLISHING METHOD

POLISHING METHOD

POLISHING SLURRY FOR METAL FILMS AND POLISHING METHOD

POLISHING LIQUID FOR METAL FILM AND POLISHING METHOD

POLISHING SLURRY AND POLISHING METHOD

POLISHING SOLUTION FOR CMP AND POLISHING METHOD USING THE POLISHING...

POLISHING SOLUTION FOR METAL FILMS AND POLISHING METHOD USING THE SAME

CMP POLISHING SLURRY AND POLISHING METHOD

POLISHING SLURRY FOR METAL FILMS AND POLISHING METHOD

POLISHING LIQUID FOR METAL FILM AND POLISHING METHOD

CMP POLISHING SLURRY AND METHOD OF POLISHING SUBSTRATE

POLISHING LIQUID FOR METAL AND METHOD OF POLISHING

CMP POLISHING SLURRY, ADDITIVE LIQUID FOR CMP POLISHING SLURRY, AND...

POLISHING SLURRY FOR CMP

Polishing slurry and polishing method

CMP Abrasive Slurry for Polishing Insulation Film, Polishing Method...

Cmp Polishing Slurry and Method of Polishing Substrate

CMP polishing slurry and polishing method

Cmp Polishing Slurry and Method of Polishing Substrate

Polishing slurry and polishing method

CMP POLISHING SLURRY AND METHOD OF POLISHING SUBSTRATE

Polishing slurry for silicon oxide, additive liquid and polishing m...

Hazardous substance decomposer and process for producing the same

Cmp polishing compound and polishing method

Polishing fluid and polishing method