Masato Horiguchi

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pin control method and substrate processing apparatus
- Patent number 10,910,251
- Issue date Feb 2, 2021
- Tokyo Electron Limited
- Shin Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pin control method
- Patent number 10,438,834
- Issue date Oct 8, 2019
- Tokyo Electron Limited
- Shin Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching layer to be etched
- Patent number 10,347,499
- Issue date Jul 9, 2019
- Tokyo Electron Limited
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,685,305
- Issue date Jun 20, 2017
- Tokyo Electron Limited
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode assembly and plasma processing apparatus
- Patent number 9,520,276
- Issue date Dec 13, 2016
- Tokyo Electron Limited
- Chikako Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 9,455,125
- Issue date Sep 27, 2016
- Tokyo Electron Limited
- Akihiro Yoshimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,858,754
- Issue date Oct 14, 2014
- Tokyo Electron Limited
- Masato Horiguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Focus ring, plasma etching apparatus and plasma etching method
- Patent number 8,192,577
- Issue date Jun 5, 2012
- Tokyo Electron Limited
- Daiki Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring, plasma etching apparatus and plasma etching method
- Patent number 7,618,515
- Issue date Nov 17, 2009
- Tokyo Electron Limited
- Daiki Satoh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PIN CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190287844
- Publication date Sep 19, 2019
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PIN CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20180301369
- Publication date Oct 18, 2018
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING LAYER TO BE ETCHED
- Publication number 20180144948
- Publication date May 24, 2018
- TOKYO ELECTRON LIMITED
- Koji MARUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160163515
- Publication date Jun 9, 2016
- TOKYO ELECTRON LIMITED
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE ASSEMBLY AND PLASMA PROCESSING APPARATUS
- Publication number 20120247678
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Chikako TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110290419
- Publication date Dec 1, 2011
- TOKYO ELECTRON LIMITED
- Masato Horiguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20110240224
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- Akihiro YOSHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING, PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD
- Publication number 20090255902
- Publication date Oct 15, 2009
- TOKYO ELECTRON LIMITED
- Daiki Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrode assembly and plasma processing apparatus
- Publication number 20060288934
- Publication date Dec 28, 2006
- TOKYO ELECTRON LIMITED
- Chikako Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Focus ring, plasma etching apparatus and plasma etching method
- Publication number 20060102288
- Publication date May 18, 2006
- TOKYO ELECTRON LIMITED
- Daiki Satoh
- H01 - BASIC ELECTRIC ELEMENTS

Masato Horiguchi

Person

Patents Grantslast 30 patents

Pin control method and substrate processing apparatus

Pin control method

Method for etching layer to be etched

Plasma processing apparatus and plasma processing method

Electrode assembly and plasma processing apparatus

Substrate processing apparatus

Plasma processing apparatus

Focus ring, plasma etching apparatus and plasma etching method

Focus ring, plasma etching apparatus and plasma etching method

Patents Applicationslast 30 patents

PIN CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS

PIN CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD FOR ETCHING LAYER TO BE ETCHED

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

ELECTRODE ASSEMBLY AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

FOCUS RING, PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD

Electrode assembly and plasma processing apparatus

Focus ring, plasma etching apparatus and plasma etching method