Masato Ishimaru

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method
- Patent number 9,972,776
- Issue date May 15, 2018
- Hitachi High-Technologies Corporations
- Makoto Suyama
- B08 - CLEANING
Information Patent Grant
Plasma etching method
- Patent number 9,680,090
- Issue date Jun 13, 2017
- Hitachi High-Technologies Corporation
- Daisuke Fujita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method
- Patent number 9,506,154
- Issue date Nov 29, 2016
- Hitachi High-Technologies Corporation
- Masato Ishimaru
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method
- Patent number 9,449,842
- Issue date Sep 20, 2016
- Hitachi High-Technologies Corporation
- Masato Ishimaru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 9,281,470
- Issue date Mar 8, 2016
- Hitachi High-Technologies Corporation
- Takahiro Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 9,269,892
- Issue date Feb 23, 2016
- Hitachi High-Technologies Corporation
- Daisuke Fujita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20170194561
- Publication date Jul 6, 2017
- Hitachi High-Technologies Corporation
- Makoto SUYAMA
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20160138170
- Publication date May 19, 2016
- Hitachi High-Technologies Corporation
- Masato ISHIMARU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20160133834
- Publication date May 12, 2016
- Hitachi High-Technologies Corporation
- Daisuke Fujita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20150349245
- Publication date Dec 3, 2015
- Hitachi High-Technologies Corporation
- Takahiro Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20150194315
- Publication date Jul 9, 2015
- Hitachi High-Technologies Corporation
- Masato Ishimaru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20150017741
- Publication date Jan 15, 2015
- Hitachi High-Technologies Corporation
- Daisuke Fujita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20130048599
- Publication date Feb 28, 2013
- Makoto SATAKE
- H01 - BASIC ELECTRIC ELEMENTS