Masato KUSHIBIKI

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,660,182
- Issue date May 23, 2017
- Tokyo Electron Limited
- Takashi Sone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and substrate processing apparatus
- Patent number 9,419,211
- Issue date Aug 16, 2016
- Tokyo Electron Limited
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching copper layer and mask
- Patent number 9,208,997
- Issue date Dec 8, 2015
- Tokyo Electron Limited
- Eiichi Nishimura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and storage medium
- Patent number 9,165,784
- Issue date Oct 20, 2015
- Tokyo Electron Limited
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching film containing cobalt and palladium
- Patent number 8,962,489
- Issue date Feb 24, 2015
- Tokyo Electron Limited
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method and manufacturing method of semiconductor de...
- Patent number 8,815,495
- Issue date Aug 26, 2014
- Tokyo Electron Limited
- Masato Kushibiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device manufacturing method and plasma etching apparatus
- Patent number 8,772,172
- Issue date Jul 8, 2014
- Tokyo Electron Limited
- Masato Kushibiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus for...
- Patent number 8,642,136
- Issue date Feb 4, 2014
- Tokyo Electron Limited
- Masato Kushibiki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method
- Patent number 8,530,354
- Issue date Sep 10, 2013
- Tokyo Electron Limited
- Masato Kushibiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 8,491,804
- Issue date Jul 23, 2013
- Tokyo Electron Limited
- Masato Kushibiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method and plasma etching apparatus
- Patent number 8,491,805
- Issue date Jul 23, 2013
- Tokyo Electron Limited
- Masato Kushibiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 8,383,521
- Issue date Feb 26, 2013
- Tokyo Electron Limited
- Eiichi Nishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate processing method
- Patent number 8,252,698
- Issue date Aug 28, 2012
- Tokyo Electron Limited
- Masato Kushibiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 8,241,511
- Issue date Aug 14, 2012
- Tokyo Electron Limited
- Masato Kushibiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 8,202,805
- Issue date Jun 19, 2012
- Tokyo Electron Limited
- Masato Kushibiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 7,897,498
- Issue date Mar 1, 2011
- Tokyo Electron Limited
- Glenn Gale
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma etching method
- Patent number 7,811,939
- Issue date Oct 12, 2010
- Tokyo Electron Limited
- Masato Kushibiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fine pattern forming method
- Patent number 7,604,908
- Issue date Oct 20, 2009
- Tokyo Electron Limited
- Masato Kushibiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and computer storage medium storing program for cont...
- Patent number 7,256,135
- Issue date Aug 14, 2007
- Tokyo Electron Limited
- Masato Kushibiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 7,192,532
- Issue date Mar 20, 2007
- Tokyo Electron Limited
- Akiteru Koh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150050750
- Publication date Feb 19, 2015
- TOKYO ELECTRON LIMITED
- Takashi Sone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING FILM CONTAINING COBALT AND PALLADIUM
- Publication number 20140287591
- Publication date Sep 25, 2014
- TOKYO ELECTRON LIMITED
- Eiichi NISHIMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20140120635
- Publication date May 1, 2014
- TOKYO ELECTRON LIMITED
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING COPPER LAYER AND MASK
- Publication number 20140110373
- Publication date Apr 24, 2014
- Eiichi Nishimura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20130302993
- Publication date Nov 14, 2013
- TOKYO ELECTRON LIMITED
- Masato KUSHIBIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DE...
- Publication number 20130122429
- Publication date May 16, 2013
- TOKYO ELECTRON LIMITED
- Masato KUSHIBIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM
- Publication number 20120244718
- Publication date Sep 27, 2012
- TOKYO ELECTRON LIMITED
- Eiichi NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20120196387
- Publication date Aug 2, 2012
- TOKYO ELECTRON LIMITED
- Masato KUSHIBIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20110195577
- Publication date Aug 11, 2011
- TOKYO ELECTRON LIMITED
- Masato KUSHIBIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DE...
- Publication number 20110065049
- Publication date Mar 17, 2011
- TOKYO ELECTRON LIMITED
- Masato KUSHIBIKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20100240217
- Publication date Sep 23, 2010
- TOKYO ELECTRON LIMITED
- Masato KUSHIBIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20100233883
- Publication date Sep 16, 2010
- TOKYO ELECTON LIMITED
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20100233885
- Publication date Sep 16, 2010
- TOKYO ELECTRON LIMITED
- Masato KUSHIBIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20100173493
- Publication date Jul 8, 2010
- TOKYO ELECTRON LIMITED
- Masato KUSHIBIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...
- Publication number 20100086670
- Publication date Apr 8, 2010
- TOKYO ELECTRON LIMITED
- Masato Kushibiki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20100068892
- Publication date Mar 18, 2010
- TOKYO ELECTRON LIMITED
- Masato KUSHIBIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Manufacturing Semiconductor Device
- Publication number 20080268655
- Publication date Oct 30, 2008
- Glenn Gale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20070224828
- Publication date Sep 27, 2007
- TOKYO ELECTRON LIMITED
- Masato KUSHIBIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fine pattern forming method
- Publication number 20060204899
- Publication date Sep 14, 2006
- TOKYO ELECTRON LIMITED
- Masato Kushibiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Etching method and computer storage medium storing program for cont...
- Publication number 20050070111
- Publication date Mar 31, 2005
- TOKYO ELECTRON LIMITED
- Masato Kushibiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry etching method
- Publication number 20050045588
- Publication date Mar 3, 2005
- Akiteru Koh
- H01 - BASIC ELECTRIC ELEMENTS

Masato KUSHIBIKI

Person

Patents Grantslast 30 patents

Plasma processing method and plasma processing apparatus

Etching method and substrate processing apparatus

Method of etching copper layer and mask

Substrate processing method and storage medium

Method for etching film containing cobalt and palladium

Pattern forming method and manufacturing method of semiconductor de...

Semiconductor device manufacturing method and plasma etching apparatus

Substrate processing method and substrate processing apparatus for...

Substrate processing method

Substrate processing method

Semiconductor device manufacturing method and plasma etching apparatus

Substrate processing method

Substrate processing method

Substrate processing method

Substrate processing method

Method for manufacturing semiconductor device

Plasma etching method

Fine pattern forming method

Etching method and computer storage medium storing program for cont...

Dry etching method

Patents Applicationslast 30 patents

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD FOR ETCHING FILM CONTAINING COBALT AND PALLADIUM

ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD OF ETCHING COPPER LAYER AND MASK

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND PLASMA ETCHING APPARATUS

PATTERN FORMING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DE...

SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM

SUBSTRATE PROCESSING METHOD

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND PLASMA ETCHING APPARATUS

PATTERN FORMING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DE...

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...

SUBSTRATE PROCESSING METHOD

Method for Manufacturing Semiconductor Device

PLASMA ETCHING METHOD

Fine pattern forming method

Etching method and computer storage medium storing program for cont...

Dry etching method