TREA

Masato MORISHIMA

Follow

Person

  • Nirasaki City, JP
People

Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    METHOD FOR PROCESSING WORKPIECE
    • Publication number 20190189437
    • Publication date Jun 20, 2019
    • TOKYO ELECTRON LIMITED
    • Kenji OUCHI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA ELECTRODE AND PLASMA PROCESSING DEVICE
    • Publication number 20190108984
    • Publication date Apr 11, 2019
    • TOKYO ELECTRON LIMITED
    • Masato MORISHIMA
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Application

    FILM FORMING METHOD AND FILM FORMING APPARATUS
    • Publication number 20150368802
    • Publication date Dec 24, 2015
    • TOKYO ELECTRON LIMITED
    • Kazuki YAMADA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
    • Publication number 20150132960
    • Publication date May 14, 2015
    • TOKYO ELECTRON LIMITED
    • Eiichi Nishimura
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    FILM FORMING DEVICE
    • Publication number 20140373783
    • Publication date Dec 25, 2014
    • Ikuo SAWADA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    FILM FORMATION APPARATUS
    • Publication number 20120247390
    • Publication date Oct 4, 2012
    • TOKYO ELECTRON LIMITED
    • Ikuo Sawada
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
    • Publication number 20100206846
    • Publication date Aug 19, 2010
    • TOKYO ELECTRON LIMITED
    • Eiichi Nishimura
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Process gas introducing mechanism and plasma processing device
    • Publication number 20090260762
    • Publication date Oct 22, 2009
    • TOKYO ELECTRON LIMITED
    • Takayuki Kamaishi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Method for manufacturing a fin field effect transistor
    • Publication number 20080132077
    • Publication date Jun 5, 2008
    • TOKYO ELECTRON LIMITED
    • Masato Morishima
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Film formation method
    • Publication number 20060127601
    • Publication date Jun 15, 2006
    • TOKYO ELECTRON LIMITED
    • Seishi Murakami
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Process gas introducing mechanism and plasma processing device
    • Publication number 20060060141
    • Publication date Mar 23, 2006
    • TOKYO ELECTRON LIMITED
    • Takayuki Kamaishi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Worktable device, film formation apparatus, and film formation meth...
    • Publication number 20050257747
    • Publication date Nov 24, 2005
    • Satoshi Wakabayashi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    CVD method
    • Publication number 20010021414
    • Publication date Sep 13, 2001
    • Masato Morishima
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...