Masato Nishikawa

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Patents Grantslast 30 patents

Information Patent Grant
Protected polyvinyl alcohol auxiliary for forming fine pattern and...
- Patent number 7,598,320
- Issue date Oct 6, 2009
- AZ Electronic Materials USA Corp.
- Masato Nishikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positively photosensitive resin composition
- Patent number 6,475,693
- Issue date Nov 5, 2002
- Clariant Finance (BVI) Limited
- Kenji Susukida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positively photosensitive resin composition
- Patent number 6,391,513
- Issue date May 21, 2002
- Clariant Finance (BVI) Limited
- Kenji Susukida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Radiation-sensitive resin composition, process for producing the sa...
- Publication number 20070160927
- Publication date Jul 12, 2007
- Kenichi Murakami
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Auxiliary for forming fine pattern and process for producing the same
- Publication number 20060211814
- Publication date Sep 21, 2006
- Masato Nishikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...