Masato Satomura

Person

Asaka, JA

People

Patents Grantslast 30 patents

Information Patent Grant
Functional group containing polymer and method of preparing the same
- Patent number 4,065,430
- Issue date Dec 27, 1977
- Fuji Photo Film Co., Ltd.
- Masato Satomura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Furanacroyl esters
- Patent number 4,060,685
- Issue date Nov 29, 1977
- Fuji Photo Film Co., Ltd.
- Yukio Maekawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Unsaturated polyester ether having a photocrosslinkable moiety
- Patent number 4,053,415
- Issue date Oct 11, 1977
- Fuji Photo Film Co., Ltd.
- Masato Satomura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Reactive light-sensitive high polymer compound containing furyl pen...
- Patent number 4,041,017
- Issue date Aug 9, 1977
- Fuji Photo Film Co., Ltd.
- Yukio Maekawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Liquid developer for electrophotography
- Patent number 4,033,890
- Issue date Jul 5, 1977
- Fuji Photo Film Co., Ltd.
- Yasuo Tamai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light-sensitive high molecular weight compound capable of being cro...
- Patent number 3,993,624
- Issue date Nov 23, 1976
- Fuji Photo Film Co., Ltd.
- Yukio Maekawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Dry stabilization of a silver halide photographic material
- Patent number 3,957,517
- Issue date May 18, 1976
- Fuji Photo Film Co., Ltd.
- Shinpei Ikenoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resins containing a thienylacrylic acid ester or ami...
- Patent number 3,945,831
- Issue date Mar 23, 1976
- Fuji Photo Film Co., Ltd.
- Masato Satomura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Reactive polymer
- Patent number 3,936,429
- Issue date Feb 3, 1976
- Fuji Photo Film Co., Ltd.
- Yoshio Seoka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Cinnamylideneacetic acid esters
- Patent number 3,933,885
- Issue date Jan 20, 1976
- Fuji Photo Film Co., Ltd.
- Masato Satomura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Reactive high polymer compound
- Patent number 3,931,248
- Issue date Jan 6, 1976
- Fuji Photo Film Co., Ltd.
- Yukio Maekawa
- C07 - ORGANIC CHEMISTRY

Masato Satomura

Person

Patents Grantslast 30 patents

Functional group containing polymer and method of preparing the same

Furanacroyl esters

Unsaturated polyester ether having a photocrosslinkable moiety

Reactive light-sensitive high polymer compound containing furyl pen...

Liquid developer for electrophotography

Light-sensitive high molecular weight compound capable of being cro...

Dry stabilization of a silver halide photographic material

Photosensitive resins containing a thienylacrylic acid ester or ami...

Reactive polymer

Cinnamylideneacetic acid esters

Reactive high polymer compound