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Masato Yonezawa

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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    DEPOSITION METHOD
    • Publication number 20200312621
    • Publication date Oct 1, 2020
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Film Forming Apparatus
    • Publication number 20190276935
    • Publication date Sep 12, 2019
    • TOKYO ELECTRON LIMITED
    • Masato YONEZAWA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PARTICLE REMOVAL METHOD AND SUBSTRATE PROCESSING METHOD
    • Publication number 20180169716
    • Publication date Jun 21, 2018
    • TOKYO ELECTRON LIMITED
    • Jun SATO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Film Forming Apparatus
    • Publication number 20170051403
    • Publication date Feb 23, 2017
    • TOKYO ELECTRON LIMITED
    • Masato YONEZAWA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING DEVICE AND OPERATION METHOD
    • Publication number 20160268105
    • Publication date Sep 15, 2016
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING DEVICE AND OPERATION METHOD
    • Publication number 20150235813
    • Publication date Aug 20, 2015
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
    • Publication number 20150126044
    • Publication date May 7, 2015
    • TOKYO ELECTRON LIMITED
    • Hitoshi KATO
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Low Temperature Deposition of Silicon-Containing Films
    • Publication number 20130189853
    • Publication date Jul 25, 2013
    • TOKYO ELECTRON LIMITED
    • Liu Yang
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    VERTICAL FILM FORMATION APPARATUS AND METHOD FOR USING SAME
    • Publication number 20110129618
    • Publication date Jun 2, 2011
    • TOKYO ELECTRON LIMITED
    • Masanobu MATSUNAGA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    FILM FORMATION METHOD AND APPARATUS
    • Publication number 20110129619
    • Publication date Jun 2, 2011
    • TOKYO ELECTRON LIMITED
    • Masanobu Matsunaga
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PHOTOVOLTAIC DEVICE AND MANUFACTURING METHOD THEREOF
    • Publication number 20110053310
    • Publication date Mar 3, 2011
    • MITSUBISHI ELECTRIC CORPORATION
    • Masato Yonezawa
    • Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
  • Information Patent Application

    Low Temperature Deposition of Silicon-Containing Films
    • Publication number 20100304047
    • Publication date Dec 2, 2010
    • Air Products and Chemicals, Inc.
    • Liu Yang
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Substrate processing system, control method for substrate processin...
    • Publication number 20090078197
    • Publication date Mar 26, 2009
    • TOKYO ELECTRON LIMITED
    • Yuichi Takenaga
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Cvd method for forming silicon nitride film
    • Publication number 20060286817
    • Publication date Dec 21, 2006
    • Hitoshi Kato
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...