Masatoshi ARAI

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 11,829,068
- Issue date Nov 28, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Koshi Onishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alternating copolymer, method of producing alternating copolymer, m...
- Patent number 11,780,946
- Issue date Oct 10, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Akiyoshi Yamazaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,754,922
- Issue date Sep 12, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organically modified metal oxide nanoparticles, organically modifie...
- Patent number 11,747,724
- Issue date Sep 5, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Kiwamu Sue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,703,756
- Issue date Jul 18, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Koshi Onishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,693,316
- Issue date Jul 4, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- KhanhTin Nguyen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, compound, aci...
- Patent number 11,667,605
- Issue date Jun 6, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto Yamazaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,644,751
- Issue date May 9, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Miyakawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,635,687
- Issue date Apr 25, 2023
- TOKYO OHKA KOGYO, CO., LTD.
- Junichi Miyakawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,448,963
- Issue date Sep 20, 2022
- TOKYO OHKA KOG YO CO., LTD.
- Masatoshi Arai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, compound, aci...
- Patent number 11,281,099
- Issue date Mar 22, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto Yamazaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 11,275,307
- Issue date Mar 15, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, and method of forming resist pattern
- Patent number 11,256,169
- Issue date Feb 22, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 11,221,557
- Issue date Jan 11, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,181,822
- Issue date Nov 23, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Koshi Onishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 11,061,329
- Issue date Jul 13, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 10,908,502
- Issue date Feb 2, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 10,649,330
- Issue date May 12, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of preparing polymer compound
- Patent number 10,414,918
- Issue date Sep 17, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 10,324,377
- Issue date Jun 18, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method for forming resist pattern, and polymer...
- Patent number 10,295,905
- Issue date May 21, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for manufacturing polymer compound
- Patent number 10,100,134
- Issue date Oct 16, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Developer container and image forming apparatus
- Patent number 9,829,827
- Issue date Nov 28, 2017
- Fuji Xerox Co., Ltd.
- Masatoshi Arai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,778,567
- Issue date Oct 3, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-type resist composition, method for forming resist pattern...
- Patent number 9,766,541
- Issue date Sep 19, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 9,690,194
- Issue date Jun 27, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 9,639,002
- Issue date May 2, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,606,433
- Issue date Mar 28, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 9,411,227
- Issue date Aug 9, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymerization method of high-molecular weight compound, resist com...
- Patent number 9,383,642
- Issue date Jul 5, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, ACID...
- Publication number 20250004366
- Publication date Jan 2, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20230408917
- Publication date Dec 21, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Takatoshi Inari
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20230205084
- Publication date Jun 29, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Makoto SAKATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20220179314
- Publication date Jun 9, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Rin ODASHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20220179306
- Publication date Jun 9, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Rin ODASHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20220171286
- Publication date Jun 2, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takatoshi INARI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20220121116
- Publication date Apr 21, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Koshi ONISHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20220121117
- Publication date Apr 21, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Koshi ONISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20220019142
- Publication date Jan 20, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, ACI...
- Publication number 20210389668
- Publication date Dec 16, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto YAMAZAKI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ALTERNATING COPOLYMER, METHOD OF PRODUCING ALTERNATING COPOLYMER, M...
- Publication number 20210230332
- Publication date Jul 29, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Akiyoshi YAMAZAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210191268
- Publication date Jun 24, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- KhanhTin NGUYEN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ORGANICALLY MODIFIED METAL OXIDE NANOPARTICLES, ORGANICALLY MODIFIE...
- Publication number 20210191261
- Publication date Jun 24, 2021
- NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Kiwamu SUE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210181634
- Publication date Jun 17, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi MIYAKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210181633
- Publication date Jun 17, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi MIYAKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210141307
- Publication date May 13, 2021
- TOKYO OHKA KYGYO CO., LTD.
- Mari Murata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20210055656
- Publication date Feb 25, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Koshi ONISHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
- Publication number 20200183273
- Publication date Jun 11, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- KhanhTin NGUYEN
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20190384174
- Publication date Dec 19, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20190384175
- Publication date Dec 19, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20190361345
- Publication date Nov 28, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya IKEDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20190361343
- Publication date Nov 28, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Koshi ONISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
- Publication number 20190361346
- Publication date Nov 28, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya IKEDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, ACI...
- Publication number 20190361344
- Publication date Nov 28, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto YAMAZAKI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20190163057
- Publication date May 30, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya IKEDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20190107779
- Publication date Apr 11, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20180149973
- Publication date May 31, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER...
- Publication number 20180024433
- Publication date Jan 25, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka KOMURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PREPARING POLYMER COMPOUND
- Publication number 20180022916
- Publication date Jan 25, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka KOMURO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR MANUFACTURING POLYMER COMPOUND
- Publication number 20170166664
- Publication date Jun 15, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Masatoshi ARAI

Person

Patents Grantslast 30 patents

Resist composition, method of forming resist pattern, compound, and...

Alternating copolymer, method of producing alternating copolymer, m...

Resist composition and method of forming resist pattern

Organically modified metal oxide nanoparticles, organically modifie...

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, compound, aci...

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, compound, aci...

Resist composition, method of forming resist pattern, polymeric com...

Resist composition, and method of forming resist pattern

Resist composition, method of forming resist pattern, compound, and...

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, polymeric com...

Resist composition, method of forming resist pattern, polymeric com...

Resist composition, method of forming resist pattern, compound, and...

Method of preparing polymer compound

Resist composition and method of forming resist pattern

Resist composition, method for forming resist pattern, and polymer...

Method for manufacturing polymer compound

Developer container and image forming apparatus

Resist composition, method of forming resist pattern, polymeric com...

Positive-type resist composition, method for forming resist pattern...

Method of forming resist pattern

Method of forming resist pattern

Resist composition, method of forming resist pattern, polymeric com...

Resist composition, method of forming resist pattern, compound, and...

Polymerization method of high-molecular weight compound, resist com...

Patents Applicationslast 30 patents

RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, ACID...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, ACI...

ALTERNATING COPOLYMER, METHOD OF PRODUCING ALTERNATING COPOLYMER, M...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

ORGANICALLY MODIFIED METAL OXIDE NANOPARTICLES, ORGANICALLY MODIFIE...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, ACI...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER...

METHOD OF PREPARING POLYMER COMPOUND

METHOD FOR MANUFACTURING POLYMER COMPOUND