Masatoshi ECHIGO

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Compound, resin, composition, resist pattern formation method, circ...
- Patent number 12,134,596
- Issue date Nov 5, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Takashi Makinoshima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Material for lithography, production method therefor, composition f...
- Patent number 11,852,970
- Issue date Dec 26, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Hiroto Kudo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, composition, resist pattern formation method, circ...
- Patent number 11,747,728
- Issue date Sep 5, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Junya Horiuchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, resist composition or radiation-sensitive composit...
- Patent number 11,572,430
- Issue date Feb 7, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method for forming resist pattern, and polyphen...
- Patent number 11,480,877
- Issue date Oct 25, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resist composition, and method for forming resist pattern...
- Patent number 11,256,170
- Issue date Feb 22, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, resin, resist composition or radiation-sensitive composit...
- Patent number 11,243,467
- Issue date Feb 8, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Material for forming underlayer film for lithography, composition f...
- Patent number 11,143,962
- Issue date Oct 12, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for forming underlayer film for lithography, composition f...
- Patent number 11,137,686
- Issue date Oct 5, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, resin, composition, resist pattern formation method, and...
- Patent number 11,130,724
- Issue date Sep 28, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, composition, and method for producing same, underlayer fi...
- Patent number 11,067,889
- Issue date Jul 20, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compound, resin, resist composition or radiation-sensitive composit...
- Patent number 10,816,898
- Issue date Oct 27, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin, and purification method thereof, material for form...
- Patent number 10,747,112
- Issue date Aug 18, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compound, resin, material for forming underlayer film for lithograp...
- Patent number 10,745,372
- Issue date Aug 18, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
(Meth)acryloyl compound and method for producing same
- Patent number 10,723,690
- Issue date Jul 28, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist base material, resist composition and method for forming res...
- Patent number 10,642,156
- Issue date May 5, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, material for forming underlayer film for lithograp...
- Patent number 10,577,323
- Issue date Mar 3, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Kana Okada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound and method for producing same
- Patent number 10,550,068
- Issue date Feb 4, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, resin, material for forming underlayer film for lithograp...
- Patent number 10,494,358
- Issue date Dec 3, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist material, resist composition and method for forming resist p...
- Patent number 10,437,148
- Issue date Oct 8, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method for forming resist pattern, polyphenol d...
- Patent number 10,377,734
- Issue date Aug 13, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, material for forming underlayer film for lithograp...
- Patent number 10,364,314
- Issue date Jul 30, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Kana Okada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Material for forming underlayer film for lithography, composition f...
- Patent number 10,359,701
- Issue date Jul 23, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Kana Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming underlayer film for lithography, underlayer...
- Patent number 10,338,471
- Issue date Jul 2, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Kana Okada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Material for forming film for lithography, composition for forming...
- Patent number 10,310,377
- Issue date Jun 4, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Takashi Makinoshima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for forming resist pattern
- Patent number 10,303,055
- Issue date May 28, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Takashi Sato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, material for forming underlayer film for lithograp...
- Patent number 10,294,183
- Issue date May 21, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Takashi Makinoshima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for purifying compound or resin
- Patent number 9,920,024
- Issue date Mar 20, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method for forming resist pattern, polyphenolic...
- Patent number 9,908,831
- Issue date Mar 6, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition
- Patent number 9,897,913
- Issue date Feb 20, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR SPIN-ON CARBON FILM FORMATION, METHOD FOR PRODUCING...
- Publication number 20240369930
- Publication date Nov 7, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Takashi SATO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST AUXILIARY FILM COMPOSITION, AND PATTERN FORMING METHOD USING...
- Publication number 20240369925
- Publication date Nov 7, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Takumi OKADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME
- Publication number 20240369924
- Publication date Nov 7, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Takumi OKADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
THINNER COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICES...
- Publication number 20240361693
- Publication date Oct 31, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Takumi OKADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION, UNDERLAYER FILM...
- Publication number 20240319600
- Publication date Sep 26, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION FOR...
- Publication number 20240117102
- Publication date Apr 11, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Kodai MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSI...
- Publication number 20240117101
- Publication date Apr 11, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Hiroaki YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTER...
- Publication number 20240109997
- Publication date Apr 4, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PAT...
- Publication number 20230348351
- Publication date Nov 2, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Tadashi OMATSU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FILM FORMING COMPOSITION FOR LITHOGRAPHY, RESIST PATTERN FORMATION...
- Publication number 20230333469
- Publication date Oct 19, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Takashi SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FIL...
- Publication number 20230324801
- Publication date Oct 12, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Hiroaki YAMAMOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION, METHOD FOR PRODUCING PO...
- Publication number 20230314942
- Publication date Oct 5, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Kodai MATSUURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION, CO...
- Publication number 20230296982
- Publication date Sep 21, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUND, PRODUCTION METHOD THEREFOR, ACID GENERATOR, COMPOSITION,...
- Publication number 20230185191
- Publication date Jun 15, 2023
- THE SCHOOL CORPORATION KANSAI UNIVERSITY
- Hiroto KUDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING RESIST PATTE...
- Publication number 20230174688
- Publication date Jun 8, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Tadashi OMATSU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD
- Publication number 20230096137
- Publication date Mar 30, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Tadashi OMATSU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PAT...
- Publication number 20220348698
- Publication date Nov 3, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Tadashi OMATSU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FIL...
- Publication number 20220260910
- Publication date Aug 18, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Hiroaki YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20220155682
- Publication date May 19, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRC...
- Publication number 20220144738
- Publication date May 12, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takashi MAKINOSHIMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND...
- Publication number 20220119336
- Publication date Apr 21, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Tadashi OMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYCYCLIC POLYPHENOLIC RESIN AND METHOD FOR PRODUCING POLYCYCLIC P...
- Publication number 20220089810
- Publication date Mar 24, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Tadashi OMATSU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSI...
- Publication number 20220089811
- Publication date Mar 24, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Tadashi OMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRC...
- Publication number 20220064137
- Publication date Mar 3, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takashi SATO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20220019146
- Publication date Jan 20, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Masahiro YAMANE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20220010072
- Publication date Jan 13, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Kouichi YAMADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20210405529
- Publication date Dec 30, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIS...
- Publication number 20210331994
- Publication date Oct 28, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Takashi SATO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FORMING OPTICAL COMPONENT, OPTICAL COMPONENT, COMPO...
- Publication number 20210309595
- Publication date Oct 7, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Yu OKADA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
UNDERLAYER FILM FORMING COMPOSITION
- Publication number 20210294214
- Publication date Sep 23, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Yu OKADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Masatoshi ECHIGO

Person

Patents Grantslast 30 patents

Compound, resin, composition, resist pattern formation method, circ...

Material for lithography, production method therefor, composition f...

Compound, resin, composition, resist pattern formation method, circ...

Compound, resin, resist composition or radiation-sensitive composit...

Resist composition, method for forming resist pattern, and polyphen...

Compound, resist composition, and method for forming resist pattern...

Compound, resin, resist composition or radiation-sensitive composit...

Material for forming underlayer film for lithography, composition f...

Material for forming underlayer film for lithography, composition f...

Compound, resin, composition, resist pattern formation method, and...

Compound, composition, and method for producing same, underlayer fi...

Compound, resin, resist composition or radiation-sensitive composit...

Compound, resin, and purification method thereof, material for form...

Compound, resin, material for forming underlayer film for lithograp...

(Meth)acryloyl compound and method for producing same

Resist base material, resist composition and method for forming res...

Compound, resin, material for forming underlayer film for lithograp...

Compound and method for producing same

Compound, resin, material for forming underlayer film for lithograp...

Resist material, resist composition and method for forming resist p...

Resist composition, method for forming resist pattern, polyphenol d...

Compound, resin, material for forming underlayer film for lithograp...

Material for forming underlayer film for lithography, composition f...

Composition for forming underlayer film for lithography, underlayer...

Material for forming film for lithography, composition for forming...

Resist composition and method for forming resist pattern

Compound, resin, material for forming underlayer film for lithograp...

Method for purifying compound or resin

Resist composition, method for forming resist pattern, polyphenolic...

Radiation-sensitive composition

Patents Applicationslast 30 patents

COMPOSITION FOR SPIN-ON CARBON FILM FORMATION, METHOD FOR PRODUCING...

RESIST AUXILIARY FILM COMPOSITION, AND PATTERN FORMING METHOD USING...

RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME

THINNER COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICES...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION, UNDERLAYER FILM...

POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION FOR...

COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSI...

RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTER...

COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PAT...

FILM FORMING COMPOSITION FOR LITHOGRAPHY, RESIST PATTERN FORMATION...

UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FIL...

POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION, METHOD FOR PRODUCING PO...

POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION, CO...

COMPOUND, PRODUCTION METHOD THEREFOR, ACID GENERATOR, COMPOSITION,...

COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING RESIST PATTE...

COMPOSITION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD

COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PAT...

UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FIL...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRC...

COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND...

POLYCYCLIC POLYPHENOLIC RESIN AND METHOD FOR PRODUCING POLYCYCLIC P...

COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSI...

COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRC...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIS...

COMPOSITION FOR FORMING OPTICAL COMPONENT, OPTICAL COMPONENT, COMPO...

UNDERLAYER FILM FORMING COMPOSITION