Masatoshi Oyama

Person

Kudamatsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Dry etching method of insulating film
- Patent number 7,585,776
- Issue date Sep 8, 2009
- Hitachi High-Technologies Corporation
- Nobuyuki Negishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Specimen surface processing apparatus and surface processing method
- Patent number 7,354,525
- Issue date Apr 8, 2008
- Hitachi High-Technologies Corporation
- Masatoshi Oyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing a sample surface having a masking material and...
- Patent number 6,960,533
- Issue date Nov 1, 2005
- Hitachi, Ltd.
- Koichi Nakaune
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DRY ETCHING METHOD OF HIGH-K FILM
- Publication number 20110171833
- Publication date Jul 14, 2011
- Koichi NAKAUNE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD FOR ETCHING AN OBJECT
- Publication number 20100297849
- Publication date Nov 25, 2010
- Masatoshi Miyake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING METHOD OF HIGH-K FILM
- Publication number 20090065479
- Publication date Mar 12, 2009
- Koichi NAKAUNE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING METHOD OF INSULATING FILM
- Publication number 20080085605
- Publication date Apr 10, 2008
- Nobuyuki Negishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Specimen surface processing apparatus and surface processing method
- Publication number 20060000804
- Publication date Jan 5, 2006
- Masatoshi Oyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050126711
- Publication date Jun 16, 2005
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Specimen surface processing apparatus and surface processing method
- Publication number 20040171273
- Publication date Sep 2, 2004
- Masatoshi Oyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of processing a sample surface having a masking material and...
- Publication number 20030080091
- Publication date May 1, 2003
- Koichi Nakaune
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus of processing a sample surface and method thereof
- Publication number 20010017190
- Publication date Aug 30, 2001
- Koichi Nakaune
- H01 - BASIC ELECTRIC ELEMENTS

Masatoshi Oyama

Person

Patents Grantslast 30 patents

Dry etching method of insulating film

Specimen surface processing apparatus and surface processing method

Method of processing a sample surface having a masking material and...

Patents Applicationslast 30 patents

DRY ETCHING METHOD OF HIGH-K FILM

PLASMA ETCHING METHOD FOR ETCHING AN OBJECT

DRY ETCHING METHOD OF HIGH-K FILM

DRY ETCHING METHOD OF INSULATING FILM

Specimen surface processing apparatus and surface processing method

Plasma processing apparatus

Specimen surface processing apparatus and surface processing method

Method of processing a sample surface having a masking material and...

Apparatus of processing a sample surface and method thereof