Masayoshi IMAI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Cleaning apparatus for cleaning member, substrate cleaning apparatu...
- Patent number 11,848,216
- Issue date Dec 19, 2023
- Ebara Corporation
- Takayuki Kajikawa
- B08 - CLEANING
Information Patent Grant
Method of cleaning a substrate
- Patent number 11,495,475
- Issue date Nov 8, 2022
- Ebara Corporation
- Koji Maeda
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate cleaning apparatus, substrate cleaning method, and contro...
- Patent number 10,985,037
- Issue date Apr 20, 2021
- Ebara Corporation
- Daisuke Minoshima
- B08 - CLEANING
Information Patent Grant
Substrate cleaning apparatus
- Patent number 10,607,862
- Issue date Mar 31, 2020
- Ebara Corporation
- Masayoshi Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,500,691
- Issue date Dec 10, 2019
- Ebara Corporation
- Masayoshi Imai
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus and pipe cleaning method for substra...
- Patent number 10,438,818
- Issue date Oct 8, 2019
- Ebara Corporation
- Junji Kunisawa
- B08 - CLEANING
Information Patent Grant
Wafer drying apparatus and wafer drying method
- Patent number 10,229,841
- Issue date Mar 12, 2019
- Ebara Corporation
- Masayoshi Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning apparatus
- Patent number 9,666,455
- Issue date May 30, 2017
- Ebara Corporation
- Masayoshi Imai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, COMPUTER-READABLE STORAGE MEDIUM ST...
- Publication number 20230230857
- Publication date Jul 20, 2023
- EBARA CORPORATION
- Masayoshi IMAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING APPARATUS FOR CLEANING MEMBER, SUBSTRATE CLEANING APPARATU...
- Publication number 20210305069
- Publication date Sep 30, 2021
- EBARA CORPORATION
- Takayuki KAJIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING A SUBSTRATE
- Publication number 20200176281
- Publication date Jun 4, 2020
- EBARA CORPORATION
- Koji Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD, AND CONTRO...
- Publication number 20180294171
- Publication date Oct 11, 2018
- EBARA CORPORATION
- Daisuke MINOSHIMA
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20180056470
- Publication date Mar 1, 2018
- EBARA CORPORATION
- Masayoshi IMAI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SUBSTRATE CLEANING APPARATUS
- Publication number 20170263471
- Publication date Sep 14, 2017
- EBARA CORPORATION
- Masayoshi Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND PIPE CLEANING METHOD FOR SUBSTRA...
- Publication number 20170117165
- Publication date Apr 27, 2017
- EBARA CORPORATION
- Junji KUNISAWA
- B08 - CLEANING
Information Patent Application
WAFER DRYING APPARATUS AND WAFER DRYING METHOD
- Publication number 20160372344
- Publication date Dec 22, 2016
- EBARA CORPORATION
- Masayoshi IMAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING APPARATUS AND POLISHING APPARATUS
- Publication number 20140190633
- Publication date Jul 10, 2014
- EBARA CORPORATION
- Koji Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING APPARATUS
- Publication number 20130306116
- Publication date Nov 21, 2013
- EBARA CORPORATION
- Masayoshi Imai
- H01 - BASIC ELECTRIC ELEMENTS

Masayoshi IMAI

Person

Patents Grantslast 30 patents

Cleaning apparatus for cleaning member, substrate cleaning apparatu...

Method of cleaning a substrate

Substrate cleaning apparatus, substrate cleaning method, and contro...

Substrate cleaning apparatus

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and pipe cleaning method for substra...

Wafer drying apparatus and wafer drying method

Substrate cleaning apparatus

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, COMPUTER-READABLE STORAGE MEDIUM ST...

CLEANING APPARATUS FOR CLEANING MEMBER, SUBSTRATE CLEANING APPARATU...

METHOD OF CLEANING A SUBSTRATE

SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD, AND CONTRO...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE CLEANING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND PIPE CLEANING METHOD FOR SUBSTRA...

WAFER DRYING APPARATUS AND WAFER DRYING METHOD

SUBSTRATE CLEANING APPARATUS AND POLISHING APPARATUS

SUBSTRATE CLEANING APPARATUS