Masayoshi Murata

Person

Nagasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Discharge plasma generating method, discharge plasma generating app...
- Patent number 6,456,010
- Issue date Sep 24, 2002
- Mitsubishi Heavy Industries, Ltd.
- Hideo Yamakoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma chemical vapor deposition apparatus
- Patent number 6,363,881
- Issue date Apr 2, 2002
- Mitsubishi Heavy Industries, Ltd.
- Masayoshi Murata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Discharge electrode, RF plasma generation apparatus using the same,...
- Patent number 6,353,201
- Issue date Mar 5, 2002
- Mitsubishi Heavy Industries, Ltd.
- Hideo Yamakoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulse generator for treating exhaust gas
- Patent number 6,344,701
- Issue date Feb 5, 2002
- Mitsubishi Heavy Industries, Ltd.
- Keisuke Kawamura
- F01 - MACHINES OR ENGINES IN GENERAL ENGINE PLANTS IN GENERAL STEAM ENGINES
Information Patent Grant
Amorphous silicon solar cell
- Patent number 6,307,146
- Issue date Oct 23, 2001
- Mitsubishi Heavy Industries, Ltd.
- Yoshiaki Takeuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for treating exhaust gas and pulse generator u...
- Patent number 6,274,006
- Issue date Aug 14, 2001
- Mitsubishi Heavy Industries, Ltd.
- Keisuke Kawamura
- F01 - MACHINES OR ENGINES IN GENERAL ENGINE PLANTS IN GENERAL STEAM ENGINES
Information Patent Grant
Apparatus and method for treating exhaust gas and pulse generator u...
- Patent number 6,007,681
- Issue date Dec 28, 1999
- Mitsubishi Heavy Industries, Ltd.
- Keisuke Kawamura
- F01 - MACHINES OR ENGINES IN GENERAL ENGINE PLANTS IN GENERAL STEAM ENGINES
Information Patent Grant
Plasma CVD apparatus including rotating magnetic field generation m...
- Patent number 5,423,915
- Issue date Jun 13, 1995
- Mitsubishi Jukogyo Kagushiki Kaisha
- Masayoshi Murata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma CVD apparatus
- Patent number 5,405,447
- Issue date Apr 11, 1995
- Mitsubishi Jukogyo Kabushiki Kaisha
- Masayoshi Murata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-chemical vapor-phase epitaxy system comprising a planar antenna
- Patent number 5,261,962
- Issue date Nov 16, 1993
- Mitsubishi Jukogyo Kabushiki Kaisha
- Kazutoshi Hamamoto
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method and apparatus for forming thin film
- Patent number 4,901,669
- Issue date Feb 20, 1990
- Mitsubishi Jukogyo Kabushiki Kaisha
- Takashi Yamamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
INTEGRATED TANDEM-TYPE THIN FILM SOLAR CELL MODULE AND METHOD FOR...
- Publication number 20110041889
- Publication date Feb 24, 2011
- Masayoshi Murata
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
HIGH FREQUENCY PLASMA CVD APPARATUS, HIGH FREQUENCY PLASMA CVD METH...
- Publication number 20100239757
- Publication date Sep 23, 2010
- Masayoshi Murata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CHEMICAL VAPOR DEPOSITION APPARATUS
- Publication number 20020000201
- Publication date Jan 3, 2002
- MASAYOSHI MURATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Discharge plasma generating method, discharge plasma generating app...
- Publication number 20010021422
- Publication date Sep 13, 2001
- Mitsubishi Heavy Industries, Ltd.
- Hideo Yamakoshi
- H01 - BASIC ELECTRIC ELEMENTS

Masayoshi Murata

Person

Patents Grantslast 30 patents

Discharge plasma generating method, discharge plasma generating app...

Plasma chemical vapor deposition apparatus

Discharge electrode, RF plasma generation apparatus using the same,...

Pulse generator for treating exhaust gas

Amorphous silicon solar cell

Apparatus and method for treating exhaust gas and pulse generator u...

Apparatus and method for treating exhaust gas and pulse generator u...

Plasma CVD apparatus including rotating magnetic field generation m...

Plasma CVD apparatus

Plasma-chemical vapor-phase epitaxy system comprising a planar antenna

Method and apparatus for forming thin film

Patents Applicationslast 30 patents

INTEGRATED TANDEM-TYPE THIN FILM SOLAR CELL MODULE AND METHOD FOR...

HIGH FREQUENCY PLASMA CVD APPARATUS, HIGH FREQUENCY PLASMA CVD METH...

PLASMA CHEMICAL VAPOR DEPOSITION APPARATUS

Discharge plasma generating method, discharge plasma generating app...