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Masayuki Kohno
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Hyogo, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Plasma etching method
Patent number
9,412,607
Issue date
Aug 9, 2016
Tokyo Electron Limited
Tomiko Kamada
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma CVD method, method for forming silicon nitride film and meth...
Patent number
8,569,186
Issue date
Oct 29, 2013
Tokyo Electron Limited
Masayuki Kohno
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma cleaning method and plasma CVD method
Patent number
8,366,953
Issue date
Feb 5, 2013
Tokyo Electron Limited
Masayuki Kohno
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma CVD method, method for forming silicon nitride film and meth...
Patent number
8,329,596
Issue date
Dec 11, 2012
Tokyo Electron Limited
Masayuki Kohno
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method for forming silicon nitride film, method for manufacturing n...
Patent number
8,318,614
Issue date
Nov 27, 2012
Tokyo Electron Limited
Masayuki Kohno
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
MOS semiconductor memory device having charge storage region formed...
Patent number
8,258,571
Issue date
Sep 4, 2012
Tokyo Electron Limited
Tetsuo Endoh
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma CVD method, method for forming silicon nitride film and meth...
Patent number
8,138,103
Issue date
Mar 20, 2012
Tokyo Electron Limited
Masayuki Kohno
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Forming a MOS memory device having a dielectric film laminate as a...
Patent number
8,124,484
Issue date
Feb 28, 2012
Tohoku University
Tetsuo Endoh
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Forming a silicon nitride film by plasma CVD
Patent number
8,119,545
Issue date
Feb 21, 2012
Tokyo Electron Limited
Minoru Honda
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma CVD method, silicon nitride film formation method, semicondu...
Patent number
8,114,790
Issue date
Feb 14, 2012
Tokyo Electron Limited
Masayuki Kohno
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processing method and film forming method
Patent number
7,771,796
Issue date
Aug 10, 2010
Tokyo Electron Limited
Masayuki Kohno
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
RLSA CVD deposition control using halogen gas for hydrogen scavenging
Patent number
7,763,551
Issue date
Jul 27, 2010
Tokyo Electron Limited
Jozef Brcka
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
Information
Patent Application
PLASMA ETCHING METHOD
Publication number
20140332372
Publication date
Nov 13, 2014
TOKYO ELECTRON LIMITED
Tomiko Kamada
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA CVD METHOD, METHOD FOR FORMING SILICON NITRIDE FILM AND METH...
Publication number
20130072033
Publication date
Mar 21, 2013
TOKYO ELECTRON LIMITED
Masayuki KOHNO
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
CRYSTALLINE SILICON FILM FORMING METHOD AND PLASMA CVD APPARATUS
Publication number
20120315745
Publication date
Dec 13, 2012
TOKYO ELECTRON LIMITED
Daisuke Katayama
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD OF FORMING SILICON NITRIDE FILM AND METHOD OF MANUFACTURING...
Publication number
20120208376
Publication date
Aug 16, 2012
TOKYO ELECTRON LIMITED
Minoru Honda
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PLASMA CVD METHOD, METHOD FOR FORMING SILICON NITRIDE FILM AND METH...
Publication number
20120178268
Publication date
Jul 12, 2012
TOKYO ELECTRON LIMITED
Masayuki KOHNO
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SILICON NITRIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTER-R...
Publication number
20120153442
Publication date
Jun 21, 2012
TOKYO ELECTRON LIMITED
Minoru HONDA
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SILICON DIOXIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTER-R...
Publication number
20120126376
Publication date
May 24, 2012
TOKYO ELECTRON LIMITED
Minoru Honda
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD FOR DEPOSITING SILICON NITRIDE FILM, COMPUTER-READABLE STORA...
Publication number
20110254078
Publication date
Oct 20, 2011
TOKYO ELECTRON LIMITED
Minoru HONDA
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SILICON OXIDE FILM, METHOD FOR FORMING SILICON OXIDE FILM, AND PLAS...
Publication number
20110206590
Publication date
Aug 25, 2011
TOKYO ELECTRON LIMITED
Minoru Honda
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SILICON OXYNITRIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTE...
Publication number
20110189862
Publication date
Aug 4, 2011
TOKYO ELECTRON LIMITED
Minoru Honda
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD FOR MANUFACTURING A MOS SEMICONDUCTOR MEMORY DEVICE, AND PLA...
Publication number
20110086485
Publication date
Apr 14, 2011
TOKYO ELECTRON LIMITED
Tetsuo Endoh
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PROCESS FOR PRODUCING SILICON NITRIDE FILM, PROCESS FOR PRODUCING S...
Publication number
20110086517
Publication date
Apr 14, 2011
TOKYO ELECTRON LIMITED
Minoru Honda
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
MOS SEMICONDUCTOR MEMORY DEVICE
Publication number
20100283097
Publication date
Nov 11, 2010
TOKYO ELECTRON LIMITED
Tetsuo Endoh
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SILICON NITRIDE FILM AND NONVOLATILE SEMICONDUCTOR MEMORY DEVICE
Publication number
20100140683
Publication date
Jun 10, 2010
TOKYO ELECTRON LIMITED
Seiichi Miyazaki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD FOR FORMING SILICON NITRIDE FILM, METHOD FOR MANUFACTURING N...
Publication number
20100052040
Publication date
Mar 4, 2010
TOKYO ELECTRON LIMITED
Masayuki Kohno
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PLASMA CLEANING METHOD AND PLASMA CVD METHOD
Publication number
20090308840
Publication date
Dec 17, 2009
TOKYO ELECTRON LIMITED
Masayuki Kohno
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
RLSA CVD DEPOSITION CONTROL USING HALOGEN GAS FOR HYDROGEN SCAVENGING
Publication number
20090241310
Publication date
Oct 1, 2009
TOKYO ELECTRON LIMITED
Jozef Brcka
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PLASMA CVD METHOD, METHOD FOR FORMING SILICON NITRIDE FILM, METHOD...
Publication number
20090203228
Publication date
Aug 13, 2009
TOKYO ELECTRON LIMITED
Masayuki Kohno
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PLASMA CVD METHOD, METHOD FOR FORMING SILICON NITRIDE FILM AND METH...
Publication number
20090197376
Publication date
Aug 6, 2009
TOKYO ELECTRON LIMITED
Masayuki Kohno
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Plasma processing method and film forming method
Publication number
20060099799
Publication date
May 11, 2006
TOKYO ELECTRON LIMITED
Masayuki Kohno
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...